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Class Information
Number: 438/730
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > By creating electric field (e.g., plasma, glow discharge, etc.) > Using specified electrode/susceptor configuration (e.g., of multiple substrates using barrel-type susceptor, planar reactor configuration, etc.) to generate plasma > Producing energized gas remotely located from substrate
Description: Processes wherein the etching gas is energized in a region spaced apart from the region in which the semiconductor substrate is located.










Sub-classes under this class:

Class Number Class Name Patents
438/731 Using intervening shield structure 64


Patents under this class:
1 2

Patent Number Title Of Patent Date Issued
8642481 Dry-etch for silicon-and-nitrogen-containing films Feb. 4, 2014
8513134 Semiconductor device producing method Aug. 20, 2013
8470095 Process and installation for surface preparation by dielectric barrier discharge Jun. 25, 2013
8444869 Simultaneous front side ash and backside clean May. 21, 2013
8318605 Plasma treatment method for preventing defects in doped silicon oxide surfaces during exposure to atmosphere Nov. 27, 2012
8273259 Ashing method Sep. 25, 2012
8216922 Plasma doping method Jul. 10, 2012
8187484 Down-stream plasma etching with deflectable radical stream May. 29, 2012
8025736 Semiconductor device fabrication equipment for performing PEOX process and method including cleaning the equipment with remotely produced plasma Sep. 27, 2011
7967996 Process for wafer backside polymer removal and wafer front side photoresist removal Jun. 28, 2011
7928014 Method for manufacturing a semiconductor device including a silicon film Apr. 19, 2011
7829463 Plasma processing method and plasma processing apparatus Nov. 9, 2010
7699935 Method and system for supplying a cleaning gas into a process chamber Apr. 20, 2010
7497964 Plasma igniting method and substrate processing method Mar. 3, 2009
7485580 Method for removing organic electroluminescent residues from a substrate Feb. 3, 2009
7329609 Substrate processing method and substrate processing apparatus Feb. 12, 2008
7312157 Methods and apparatus for cleaning semiconductor devices Dec. 25, 2007
7253079 Coplanar mounting member for a MEM sensor Aug. 7, 2007
7247575 Multi-step EBR process for photoresist removal Jul. 24, 2007
7232762 Method for forming an improved low power SRAM contact Jun. 19, 2007
7166534 Method of dry cleaning photoresist strips after via contact etching Jan. 23, 2007
7125786 Method of forming vias in silicon carbide and resulting devices and circuits Oct. 24, 2006
7033952 Apparatus and method using a remote RF energized plasma for processing semiconductor wafers Apr. 25, 2006
7005032 Wafer table for local dry etching apparatus Feb. 28, 2006
6955991 Atmospheric process and system for controlled and rapid removal of polymers from high depth to width aspect ratio holes Oct. 18, 2005
6936546 Apparatus for shaping thin films in the near-edge regions of in-process semiconductor substrates Aug. 30, 2005
6921695 Etching method for forming a square cornered polysilicon wordline electrode Jul. 26, 2005
6875698 Dry etching method Apr. 5, 2005
6849555 Wafer processing apparatus and wafer processing method using the same Feb. 1, 2005
6822311 DC or AC electric field assisted anneal Nov. 23, 2004
6800559 Method and apparatus for generating H20 to be used in a wet oxidation process to form SiO2 on a silicon surface Oct. 5, 2004
6770540 Method of fabricating semiconductor device having L-shaped spacer Aug. 3, 2004
6762136 Method for rapid thermal processing of substrates Jul. 13, 2004
6689685 Process for forming a diffusion barrier material nitride film Feb. 10, 2004
6620735 Method for processing substrates Sep. 16, 2003
6607987 Method for improving uniformity in batch processing of semiconductor wafers Aug. 19, 2003
6579805 In situ chemical generator and method Jun. 17, 2003
6566272 Method for providing pulsed plasma during a portion of a semiconductor wafer process May. 20, 2003
6509275 Method of manufacturing thin film and pretreating method thereof Jan. 21, 2003
6475889 Method of forming vias in silicon carbide and resulting devices and circuits Nov. 5, 2002
6461972 Integrated circuit fabrication dual plasma process with separate introduction of different gases into gas flow Oct. 8, 2002
6395643 Gas manifold for uniform gas distribution and photochemistry May. 28, 2002
6348158 Plasma processing with energy supplied Feb. 19, 2002
6329297 Dilute remote plasma clean Dec. 11, 2001
6299788 Silicon etching process Oct. 9, 2001
6245192 Gas distribution apparatus for semiconductor processing Jun. 12, 2001
6245686 Process for forming a semiconductor device and a process for operating an apparatus Jun. 12, 2001
6153529 Photo-assisted remote plasma apparatus and method Nov. 28, 2000
6056848 Thin film electrostatic shield for inductive plasma processing May. 2, 2000
6008139 Method of etching polycide structures Dec. 28, 1999

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