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Class Information
Number: 438/729
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > By creating electric field (e.g., plasma, glow discharge, etc.) > Using specified electrode/susceptor configuration (e.g., of multiple substrates using barrel-type susceptor, planar reactor configuration, etc.) to generate plasma
Description: Processes having a specified physical arrangement of electrode(s) and/or susceptor.

Sub-classes under this class:

Class Number Class Name Patents
438/730 Producing energized gas remotely located from substrate 71

Patents under this class:
1 2 3 4 5 6

Patent Number Title Of Patent Date Issued
8691702 Method and apparatus for plasma dicing a semi-conductor wafer Apr. 8, 2014
8614150 Methods of manufacturing semiconductor structures using RIE process Dec. 24, 2013
8568606 Substrate processing apparatus and substrate processing method using same Oct. 29, 2013
8569180 Method and structure of wafer level encapsulation of integrated circuits with cavity Oct. 29, 2013
8546266 Plasma processing method and plasma processing apparatus Oct. 1, 2013
8501631 Plasma processing system control based on RF voltage Aug. 6, 2013
8486841 Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof Jul. 16, 2013
8484846 Method of joining components for a composite showerhead electrode assembly for a plasma processing apparatus Jul. 16, 2013
8470095 Process and installation for surface preparation by dielectric barrier discharge Jun. 25, 2013
8444870 Inductive plasma source with high coupling efficiency May. 21, 2013
8420547 Plasma processing method Apr. 16, 2013
8337623 Methods for plasma cleaning an internal peripheral region of a plasma processing chamber Dec. 25, 2012
8328981 Method for heating a focus ring in a plasma apparatus by high frequency power while no plasma being generated Dec. 11, 2012
8329590 Plasma processing apparatus and methods for removing extraneous material from selected areas on a substrate Dec. 11, 2012
8231800 Plasma processing apparatus and method Jul. 31, 2012
8222157 Hybrid RF capacitively and inductively coupled plasma source using multifrequency RF powers and methods of use thereof Jul. 17, 2012
8129283 Plasma processing method and plasma processing apparatus Mar. 6, 2012
8124539 Plasma processing apparatus, focus ring, and susceptor Feb. 28, 2012
8119532 Inductively coupled dual zone processing chamber with single planar antenna Feb. 21, 2012
8110435 Method and apparatus for manufacturing semiconductor device Feb. 7, 2012
8105953 Method of manufacturing a semiconductor device Jan. 31, 2012
8043971 Plasma processing apparatus, ring member and plasma processing method Oct. 25, 2011
7943523 Plasma etching method and computer readable storage medium May. 17, 2011
7943524 Method of etching and etching apparatus May. 17, 2011
7915062 Method of manufacturing a TFT array substrate Mar. 29, 2011
7858155 Plasma processing method and plasma processing apparatus Dec. 28, 2010
7829463 Plasma processing method and plasma processing apparatus Nov. 9, 2010
7772123 Through substrate via semiconductor components Aug. 10, 2010
7763863 Charged particle beam application apparatus Jul. 27, 2010
7758762 Method for manufacturing an electron-emitting device with first and second carbon films Jul. 20, 2010
7759214 Semiconductor including STI and method for manufacturing the same Jul. 20, 2010
7759249 Method of removing residue from a substrate Jul. 20, 2010
7754615 Method and apparatus for detecting endpoint in a dry etching system by monitoring a superimposed DC current Jul. 13, 2010
7678705 Plasma semiconductor processing system and method Mar. 16, 2010
7655565 Electroprocessing profile control Feb. 2, 2010
7618515 Focus ring, plasma etching apparatus and plasma etching method Nov. 17, 2009
7608544 Etching method and storage medium Oct. 27, 2009
7557049 Producing method of wired circuit board Jul. 7, 2009
7541292 Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones Jun. 2, 2009
7517803 Silicon parts having reduced metallic impurity concentration for plasma reaction chambers Apr. 14, 2009
7485580 Method for removing organic electroluminescent residues from a substrate Feb. 3, 2009
7479457 Gas mixture for removing photoresist and post etch residue from low-k dielectric material and method of use thereof Jan. 20, 2009
7473646 Dry etching method and production method of magnetic memory device Jan. 6, 2009
7442650 Methods of manufacturing semiconductor structures using RIE process Oct. 28, 2008
7422982 Method and apparatus for electroprocessing a substrate with edge profile control Sep. 9, 2008
7413673 Method for adjusting voltage on a powered Faraday shield Aug. 19, 2008
7384873 Manufacturing process of semiconductor device Jun. 10, 2008
7375036 Anisotropic etch method May. 20, 2008
7329365 Etchant composition for indium oxide layer and etching method using the same Feb. 12, 2008
7311852 Method of plasma etching low-k dielectric materials Dec. 25, 2007

1 2 3 4 5 6

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