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Class Information
Number: 438/728
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > By creating electric field (e.g., plasma, glow discharge, etc.) > Having microwave gas energizing > Producing energized gas remotely located from substrate > Using magnet (e.g., electron cyclotron resonance, etc.)
Description: Processes wherein the a magnet is utilized in producing or confining the energized gas.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8685757 Method for fabricating magnetic tunnel junction Apr. 1, 2014
8674497 Stacked half-bridge package with a current carrying layer Mar. 18, 2014
8580689 Plasma processing method Nov. 12, 2013
8470095 Process and installation for surface preparation by dielectric barrier discharge Jun. 25, 2013
8461763 Electron cyclotron ion source and manufacturing method thereof Jun. 11, 2013
8288287 Etching method and etching equipment Oct. 16, 2012
8278191 Methods and systems for metal-assisted chemical etching of substrates Oct. 2, 2012
8143169 Methods for multi-stage molding of integrated circuit package Mar. 27, 2012
8133325 Dry cleaning method for plasma processing apparatus Mar. 13, 2012
8124490 Semiconductor device and method of forming passive devices Feb. 28, 2012
7922865 Magnetic field generator for magnetron plasma, and plasma etching apparatus and method comprising the magnetic field generator Apr. 12, 2011
7867787 Forming inductor and transformer structures with magnetic materials using damascene processing for integrated circuits Jan. 11, 2011
7709398 Process and apparatus for depositing semiconductor layers using two process gases, one of which is preconditioned May. 4, 2010
7618896 Semiconductor die package including multiple dies and a common node structure Nov. 17, 2009
7582569 Distributor and distributing method, plasma processing system and method, and process for fabricating LCD Sep. 1, 2009
7482262 Method of manufacturing semiconductor device Jan. 27, 2009
7473646 Dry etching method and production method of magnetic memory device Jan. 6, 2009
7341922 Dry etching method, fabrication method for semiconductor device, and dry etching apparatus Mar. 11, 2008
7329609 Substrate processing method and substrate processing apparatus Feb. 12, 2008
7312157 Methods and apparatus for cleaning semiconductor devices Dec. 25, 2007
7288485 Device and method for anisotropic plasma etching of a substrate, particularly a silicon element Oct. 30, 2007
RE39895 Semiconductor integrated circuit arrangement fabrication method Oct. 23, 2007
7189653 Etching method and etching apparatus Mar. 13, 2007
7183130 Magnetic random access memory and method of fabricating thereof Feb. 27, 2007
7183214 High-density plasma (HDP) chemical vapor deposition (CVD) methods and methods of fabricating semiconductor devices employing the same Feb. 27, 2007
7112536 Plasma processing system and method Sep. 26, 2006
7109123 Silicon etching method Sep. 19, 2006
7094706 Device and method for etching a substrate by using an inductively coupled plasma Aug. 22, 2006
6924239 Method for removal of hydrocarbon contamination on gate oxide prior to non-thermal nitridation using "spike" radical oxidation Aug. 2, 2005
6713969 Method and apparatus for determination and control of plasma state Mar. 30, 2004
6673199 Shaping a plasma with a magnetic field to control etch rate uniformity Jan. 6, 2004
6673722 Microwave enhanced CVD system under magnetic field Jan. 6, 2004
6649514 EEPROM device having improved data retention and process for fabricating the device Nov. 18, 2003
6573190 Dry etching device and dry etching method Jun. 3, 2003
6562722 Method and apparatus for dry etching May. 13, 2003
6563148 Semiconductor device with dummy patterns May. 13, 2003
6506687 Dry etching device and method of producing semiconductor devices Jan. 14, 2003
6403491 Etch method using a dielectric etch chamber with expanded process window Jun. 11, 2002
6376388 Dry etching with reduced damage to MOS device Apr. 23, 2002
6333269 Plasma treatment system and method Dec. 25, 2001
6333273 Method and apparatus for dry etching Dec. 25, 2001
6287980 Plasma processing method and plasma processing apparatus Sep. 11, 2001
6136721 Method and apparatus for dry etching Oct. 24, 2000
6066568 Plasma treatment method and system May. 23, 2000
6022805 Method of fabricating semiconductor device with a multi-layered interconnection structure having a low contact resistance Feb. 8, 2000
6010930 Vertically oriented structure with sloped opening and method for etching Jan. 4, 2000
6008132 Dry etching suppressing formation of notch Dec. 28, 1999
5994236 Plasma source with process nonuniformity improved using ferromagnetic cores Nov. 30, 1999
5985091 Microwave plasma processing apparatus and microwave plasma processing method Nov. 16, 1999
5975014 Coaxial resonant multi-port microwave applicator for an ECR plasma source Nov. 2, 1999

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