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Class Information
Number: 438/727
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > By creating electric field (e.g., plasma, glow discharge, etc.) > Having microwave gas energizing > Producing energized gas remotely located from substrate
Description: Processes wherein the etching gas is energized in a region spaced apart from the region in which the semiconductor substrate is located.










Sub-classes under this class:

Class Number Class Name Patents
438/728 Using magnet (e.g., electron cyclotron resonance, etc.) 73


Patents under this class:
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Patent Number Title Of Patent Date Issued
8624210 Ozone plenum as UV shutter or tunable UV filter for cleaning semiconductor substrates Jan. 7, 2014
8507386 Lateral uniformity in silicon recess etch Aug. 13, 2013
8492736 Ozone plenum as UV shutter or tunable UV filter for cleaning semiconductor substrates Jul. 23, 2013
8470095 Process and installation for surface preparation by dielectric barrier discharge Jun. 25, 2013
8318605 Plasma treatment method for preventing defects in doped silicon oxide surfaces during exposure to atmosphere Nov. 27, 2012
8133325 Dry cleaning method for plasma processing apparatus Mar. 13, 2012
8025736 Semiconductor device fabrication equipment for performing PEOX process and method including cleaning the equipment with remotely produced plasma Sep. 27, 2011
7928014 Method for manufacturing a semiconductor device including a silicon film Apr. 19, 2011
7829463 Plasma processing method and plasma processing apparatus Nov. 9, 2010
7759249 Method of removing residue from a substrate Jul. 20, 2010
7718539 Method for photomask fabrication utilizing a carbon hard mask May. 18, 2010
7709398 Process and apparatus for depositing semiconductor layers using two process gases, one of which is preconditioned May. 4, 2010
7699935 Method and system for supplying a cleaning gas into a process chamber Apr. 20, 2010
7582571 Substrate processing method and recording medium Sep. 1, 2009
7572686 System for thin film deposition utilizing compensating forces Aug. 11, 2009
7485580 Method for removing organic electroluminescent residues from a substrate Feb. 3, 2009
7479457 Gas mixture for removing photoresist and post etch residue from low-k dielectric material and method of use thereof Jan. 20, 2009
7456109 Method for cleaning substrate processing chamber Nov. 25, 2008
7452795 Semiconductor device and method for fabricating the same Nov. 18, 2008
7449353 Co-doping for fermi level control in semi-insulating Group III nitrides Nov. 11, 2008
7344993 Low-pressure removal of photoresist and etch residue Mar. 18, 2008
7329609 Substrate processing method and substrate processing apparatus Feb. 12, 2008
7316783 Method of wiring formation and method for manufacturing electronic components Jan. 8, 2008
7312157 Methods and apparatus for cleaning semiconductor devices Dec. 25, 2007
7122478 Method of manufacturing a semiconductor device using a polysilicon etching mask Oct. 17, 2006
7037842 Method and apparatus for dissolving a gas into a liquid for single wet wafer processing May. 2, 2006
6991739 Method of photoresist removal in the presence of a dielectric layer having a low k-value Jan. 31, 2006
6930041 Photo-assisted method for semiconductor fabrication Aug. 16, 2005
6921695 Etching method for forming a square cornered polysilicon wordline electrode Jul. 26, 2005
6852243 Confinement device for use in dry etching of substrate surface and method of dry etching a wafer surface Feb. 8, 2005
6849559 Method for removing photoresist and etch residues Feb. 1, 2005
6808641 Method of wiring formation and method for manufacturing electronic components Oct. 26, 2004
6727185 Dry process for post oxide etch residue removal Apr. 27, 2004
6673722 Microwave enhanced CVD system under magnetic field Jan. 6, 2004
6647994 Method of resist stripping over low-k dielectric material Nov. 18, 2003
6527968 Two-stage self-cleaning silicon etch process Mar. 4, 2003
6509275 Method of manufacturing thin film and pretreating method thereof Jan. 21, 2003
6465363 Vacuum processing method and vacuum processing apparatus Oct. 15, 2002
6458602 Method for fabricating semiconductor integrated circuit device Oct. 1, 2002
6452400 Method of measuring negative ion density of plasma and plasma processing method and apparatus for carrying out the same Sep. 17, 2002
6451217 Wafer etching method Sep. 17, 2002
6436303 Film removal employing a remote plasma source Aug. 20, 2002
6426304 Post etch photoresist strip with hydrogen for organosilicate glass low-.kappa. etch applications Jul. 30, 2002
6413876 Method for plasma processing high-speed semiconductor circuits with increased yield Jul. 2, 2002
6379575 Treatment of etching chambers using activated cleaning gas Apr. 30, 2002
6376384 Multiple etch contact etching method incorporating post contact etch etching Apr. 23, 2002
6372657 Method for selective etching of oxides Apr. 16, 2002
6329297 Dilute remote plasma clean Dec. 11, 2001
6271148 Method for improved remote microwave plasma source for use with substrate processing system Aug. 7, 2001
6230650 Microwave enhanced CVD system under magnetic field May. 15, 2001

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