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Class Information
Number: 438/726
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > By creating electric field (e.g., plasma, glow discharge, etc.) > Having microwave gas energizing
Description: Processes wherein the ionized etching gas is produced using a microwave source.

Sub-classes under this class:

Class Number Class Name Patents
438/727 Producing energized gas remotely located from substrate 83

Patents under this class:
1 2

Patent Number Title Of Patent Date Issued
8658532 Method and material for forming a double exposure lithography pattern Feb. 25, 2014
8652342 Semiconductor fabrication apparatuses to perform semiconductor etching and deposition processes and methods of forming semiconductor device using the same Feb. 18, 2014
8513134 Semiconductor device producing method Aug. 20, 2013
8513137 Plasma processing apparatus and plasma processing method Aug. 20, 2013
8497214 Semiconductor device manufacturing method Jul. 30, 2013
8470095 Process and installation for surface preparation by dielectric barrier discharge Jun. 25, 2013
8461047 Method for processing amorphous carbon film, and semiconductor device manufacturing method using the method Jun. 11, 2013
8338959 Simplified pitch doubling process flow Dec. 25, 2012
8258056 Method and material for forming a double exposure lithography pattern Sep. 4, 2012
8252193 Plasma processing apparatus of substrate and plasma processing method thereof Aug. 28, 2012
8133325 Dry cleaning method for plasma processing apparatus Mar. 13, 2012
8025736 Semiconductor device fabrication equipment for performing PEOX process and method including cleaning the equipment with remotely produced plasma Sep. 27, 2011
7838431 Method for surface treatment of semiconductor substrates Nov. 23, 2010
7829463 Plasma processing method and plasma processing apparatus Nov. 9, 2010
7807584 Method of forming metallic oxide films using atomic layer deposition Oct. 5, 2010
7771689 Bulk synthesis of metal and metal based dielectric nanowires Aug. 10, 2010
7582571 Substrate processing method and recording medium Sep. 1, 2009
7465406 Method of exposing a substrate to a surface microwave plasma, etching method, deposition method, surface microwave plasma generating apparatus, semiconductor substrate etching apparatus, semic Dec. 16, 2008
7456109 Method for cleaning substrate processing chamber Nov. 25, 2008
7329609 Substrate processing method and substrate processing apparatus Feb. 12, 2008
7312157 Methods and apparatus for cleaning semiconductor devices Dec. 25, 2007
7288488 Method for resist strip in presence of regular low k and/or porous low k dielectric materials Oct. 30, 2007
7157375 Methods of downstream microwave photoresist removal and via clean, particularly following Stop-On TiN etching Jan. 2, 2007
7109124 Solid state plasma antenna Sep. 19, 2006
7097782 Method of exposing a substrate to a surface microwave plasma, etching method, deposition method, surface microwave plasma generating apparatus, semiconductor substrate etching apparatus, semic Aug. 29, 2006
6900138 Oxygen plasma treatment for nitride surface to reduce photo footing May. 31, 2005
6884318 Plasma processing system and surface processing method Apr. 26, 2005
6860275 Post etching treatment process for high density oxide etcher Mar. 1, 2005
6855621 Method of forming silicon-based thin film, method of forming silicon-based semiconductor layer, and photovoltaic element Feb. 15, 2005
6828251 Method for improved plasma etching control Dec. 7, 2004
6806228 Low temperature synthesis of semiconductor fibers Oct. 19, 2004
6790784 Plasma treatment of low dielectric constant dielectric material to form structures useful in formation of metal interconnects and/or filled vias for intergrated circuit structure Sep. 14, 2004
6713969 Method and apparatus for determination and control of plasma state Mar. 30, 2004
6673722 Microwave enhanced CVD system under magnetic field Jan. 6, 2004
6660624 Method for reducing fluorine induced defects on a bonding pad surface Dec. 9, 2003
6660647 Method for processing surface of sample Dec. 9, 2003
6656850 Method for in-situ removal of side walls in MOM capacitor formation Dec. 2, 2003
6647994 Method of resist stripping over low-k dielectric material Nov. 18, 2003
6596645 Method for manufacturing a semiconductor memory device Jul. 22, 2003
6541385 Method for plasma etching of Ir-Ta-O electrode and for post-etch cleaning Apr. 1, 2003
6527968 Two-stage self-cleaning silicon etch process Mar. 4, 2003
6507626 Bandpass phase tracker that automatically samples at prescribed carrier phases when digitizing VSB I-F signal Jan. 14, 2003
6471821 Plasma reactor and method Oct. 29, 2002
6461972 Integrated circuit fabrication dual plasma process with separate introduction of different gases into gas flow Oct. 8, 2002
6440867 Metal gate with PVD amorphous silicon and silicide for CMOS devices and method of making the same with a replacement gate process Aug. 27, 2002
6417080 Method of processing residue of ion implanted photoresist, and method of producing semiconductor device Jul. 9, 2002
6387752 Semiconductor memory device and method of fabricating the same May. 14, 2002
6361707 Apparatus and methods for upgraded substrate processing system with microwave plasma source Mar. 26, 2002
6333269 Plasma treatment system and method Dec. 25, 2001
6316369 Corrosion-resistant system and method for a plasma etching apparatus Nov. 13, 2001

1 2

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