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Class Information
Number: 438/725
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > By creating electric field (e.g., plasma, glow discharge, etc.) > Organic material (e.g., resist, etc.)
Description: Processes wherein the material undergoing etching with the energized gas is an organic material.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7625494 |
Plasma etching method and plasma etching unit |
Dec. 1, 2009 |
| 7605081 |
Sub-lithographic feature patterning using self-aligned self-assembly polymers |
Oct. 20, 2009 |
| 7605090 |
Process for producing sublithographic structures |
Oct. 20, 2009 |
| 7597816 |
Wafer bevel polymer removal |
Oct. 6, 2009 |
| 7598176 |
Method for photoresist stripping and treatment of low-k dielectric material |
Oct. 6, 2009 |
| 7595005 |
Method and apparatus for ashing a substrate using carbon dioxide |
Sep. 29, 2009 |
| 7592262 |
Method for manufacturing MOS transistors utilizing a hybrid hard mask |
Sep. 22, 2009 |
| 7592249 |
Method for manufacturing a semiconductor device |
Sep. 22, 2009 |
| 7585780 |
Method for manufacturing semiconductor device |
Sep. 8, 2009 |
| 7585778 |
Method of etching an organic low-k dielectric material |
Sep. 8, 2009 |
| 7585777 |
Photoresist strip method for low-k dielectrics |
Sep. 8, 2009 |
| 7585775 |
System and method for faceting a masking layer in a plasma etch to slope a feature edge |
Sep. 8, 2009 |
| 7579284 |
Etching solution, method of forming a pattern using the same, method of manufacturing a multiple gate oxide layer using the same and method of manufacturing a flash memory device using the sam |
Aug. 25, 2009 |
| 7569477 |
Method for fabricating fine pattern in semiconductor device |
Aug. 4, 2009 |
| 7569478 |
Method and apparatus for manufacturing semiconductor device, control program and computer storage medium |
Aug. 4, 2009 |
| 7566598 |
Method of mask reduction for producing a LTPS-TFT array by use of photo-sensitive low-K dielectrics |
Jul. 28, 2009 |
| 7560390 |
Multiple spacer steps for pitch multiplication |
Jul. 14, 2009 |
| 7557023 |
Implantation of gate regions in semiconductor device fabrication |
Jul. 7, 2009 |
| 7553774 |
Method of fabricating semiconductor optical device |
Jun. 30, 2009 |
| 7550392 |
Semiconductor device and method of manufacturing the same |
Jun. 23, 2009 |
| 7547635 |
Process for etching dielectric films with improved resist and/or etch profile characteristics |
Jun. 16, 2009 |
| 7547636 |
Pulsed ultra-high aspect ratio dielectric etch |
Jun. 16, 2009 |
| 7544966 |
Three-terminal electrical bistable devices |
Jun. 9, 2009 |
| 7541292 |
Plasma etch process with separately fed carbon-lean and carbon-rich polymerizing etch gases in independent inner and outer gas injection zones |
Jun. 2, 2009 |
| 7538038 |
Method of removing resist, semiconductor device thereby and method of manufacturing a semiconductor device |
May. 26, 2009 |
| 7531045 |
Method for removing haze in a photo mask |
May. 12, 2009 |
| 7524768 |
Method using monolayer etch masks in combination with printed masks |
Apr. 28, 2009 |
| 7521367 |
FIB/RIE method for in-line circuit modification of microelectronic chips containing organic dielectric |
Apr. 21, 2009 |
| 7517805 |
Method of in-situ ash strip to eliminate memory effect and reduce wafer damage |
Apr. 14, 2009 |
| 7514357 |
Method of manufacturing a semiconductor device |
Apr. 7, 2009 |
| 7514709 |
Organo-silsesquioxane polymers for forming low-k dielectrics |
Apr. 7, 2009 |
| 7510979 |
Method for forming a pattern on a semiconductor device and semiconductor device resulting from the same |
Mar. 31, 2009 |
| 7504342 |
Photolithography method for fabricating thin film |
Mar. 17, 2009 |
| 7501071 |
Method of forming a patterned conductive structure |
Mar. 10, 2009 |
| 7494599 |
Method for fabricating fine pattern in semiconductor device |
Feb. 24, 2009 |
| 7494932 |
Method for the formation of an integrated electronic circuit having a closed cavity |
Feb. 24, 2009 |
| 7494935 |
Method for forming fine pattern of semiconductor device |
Feb. 24, 2009 |
| 7491648 |
Method of patterning a photoresist film using a lithographic |
Feb. 17, 2009 |
| 7488661 |
Device and method for improving interface adhesion in thin film structures |
Feb. 10, 2009 |
| 7488687 |
Methods of forming electrical interconnect structures using polymer residues to increase etching selectivity through dielectric layers |
Feb. 10, 2009 |
| 7488691 |
Method of fabricating semiconductor device |
Feb. 10, 2009 |
| 7482280 |
Method for forming a lithography pattern |
Jan. 27, 2009 |
| 7482279 |
Method for fabricating semiconductor device using ArF photolithography capable of protecting tapered profile of hard mask |
Jan. 27, 2009 |
| 7479458 |
Methods and apparatus for the optimization of highly selective process gases |
Jan. 20, 2009 |
| 7473377 |
Plasma processing method |
Jan. 6, 2009 |
| 7473635 |
Method for manufacturing semiconductor device |
Jan. 6, 2009 |
| 7473645 |
Method of depositing a layer comprising silicon, carbon, and fluorine onto a semiconductor substrate |
Jan. 6, 2009 |
| 7473647 |
Method of forming pattern using fine pitch hard mask |
Jan. 6, 2009 |
| 7470610 |
Method of fabricating organic electroluminescent devices |
Dec. 30, 2008 |
| 7470625 |
Method of plasma etching a substrate |
Dec. 30, 2008 |
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