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Class Information
Number: 438/724
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > By creating electric field (e.g., plasma, glow discharge, etc.) > Silicon nitride
Description: Process wherein the material undergoing etching with the energized gas is a compound of silicon and nitrogen.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8709944 Method to alter silicide properties using GCIB treatment Apr. 29, 2014
8703607 Method to alter silicide properties using GCIB treatment Apr. 22, 2014
8679982 Selective suppression of dry-etch rate of materials containing both silicon and oxygen Mar. 25, 2014
8673770 Methods of forming conductive structures in dielectric layers on an integrated circuit device Mar. 18, 2014
8669185 Method of tailoring conformality of Si-containing film Mar. 11, 2014
8668837 Method for etching substrate Mar. 11, 2014
8664119 Semiconductor device manufacturing method Mar. 4, 2014
8642481 Dry-etch for silicon-and-nitrogen-containing films Feb. 4, 2014
8617998 Method of forming a micro-pattern for semiconductor devices Dec. 31, 2013
8580131 Plasma etching method Nov. 12, 2013
8557621 Method for manufacturing thin film transistor array panel Oct. 15, 2013
8551886 CMP process for processing STI on two distinct silicon planes Oct. 8, 2013
8536061 Semiconductor device manufacturing method Sep. 17, 2013
8536059 Equipment and methods for etching of MEMS Sep. 17, 2013
8513086 Methods for etching doped oxides in the manufacture of microfeature devices Aug. 20, 2013
8501630 Selective etch process for silicon nitride Aug. 6, 2013
8502286 Etch stop layers and methods of forming the same Aug. 6, 2013
8486840 Inverse spacer processing Jul. 16, 2013
RE44292 Method of etching silicon nitride by a mixture of CH.sub.2F.sub.2, CH.sub.3F or CHF.sub.3 and an inert gas Jun. 11, 2013
8435890 Method to alter silicide properties using GCIB treatment May. 7, 2013
8404597 Device and method for stopping an etching process Mar. 26, 2013
8399361 Semiconductor device and method of manufacturing the same Mar. 19, 2013
8383001 Plasma etching method, plasma etching apparatus and storage medium Feb. 26, 2013
8366953 Plasma cleaning method and plasma CVD method Feb. 5, 2013
8343780 Method of stressing a thin pattern Jan. 1, 2013
8338309 Method for forming deep trench in semiconductor device Dec. 25, 2012
8278180 Methods of forming a semiconductor device having a contact structure Oct. 2, 2012
8216434 MEMS vascular sensor Jul. 10, 2012
8187971 Method to alter silicide properties using GCIB treatment May. 29, 2012
8178444 Substrate processing method and substrate processing apparatus May. 15, 2012
8173532 Semiconductor transistors having reduced distances between gate electrode regions May. 8, 2012
8163653 Semiconductor device and method of manufacturing the same Apr. 24, 2012
8148270 Low K dielectric surface damage control Apr. 3, 2012
8138096 Plasma etching method Mar. 20, 2012
8114781 Substrate processing method and substrate processing apparatus Feb. 14, 2012
8043921 Nitride removal while protecting semiconductor surfaces for forming shallow junctions Oct. 25, 2011
8034720 Substrate processing method and substrate processing apparatus Oct. 11, 2011
8012877 Backside nitride removal to reduce streak defects Sep. 6, 2011
8008212 Fabrication methods for integration CMOS and BJT devices Aug. 30, 2011
7988873 Method of forming a mask pattern for fabricating a semiconductor device Aug. 2, 2011
7989353 Method for in-situ refurbishing a ceramic substrate holder Aug. 2, 2011
7981308 Method of etching a device using a hard mask and etch stop layer Jul. 19, 2011
7981806 Method for forming trench and method for fabricating semiconductor device using the same Jul. 19, 2011
7977249 Methods for removing silicon nitride and other materials during fabrication of contacts Jul. 12, 2011
7964510 Method for forming pattern of a semiconductor device Jun. 21, 2011
7943524 Method of etching and etching apparatus May. 17, 2011
7939451 Method for fabricating a pattern May. 10, 2011
7928000 Method for forming self aligned contacts for integrated circuit devices Apr. 19, 2011
7915175 Etching nitride and anti-reflective coating Mar. 29, 2011
7855149 Treatment method for surface of substrate, method of fabricating image sensor by using the treatment method, and image sensor fabricated by the same Dec. 21, 2010

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