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Class Information
Number: 438/723
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > By creating electric field (e.g., plasma, glow discharge, etc.) > Silicon oxide or glass
Description: Processes wherein the material undergoing etching with the energized gas is a compound of silicon and oxygen or glass.










Patents under this class:

Patent Number Title Of Patent Date Issued
8709944 Method to alter silicide properties using GCIB treatment Apr. 29, 2014
8704445 Method for improving uniformity of high-frequency plasma discharge by means of frequency modulation Apr. 22, 2014
8703607 Method to alter silicide properties using GCIB treatment Apr. 22, 2014
8679982 Selective suppression of dry-etch rate of materials containing both silicon and oxygen Mar. 25, 2014
8673789 Method for fabricating carbon hard mask and method for fabricating patterns of semiconductor device using the same Mar. 18, 2014
8673770 Methods of forming conductive structures in dielectric layers on an integrated circuit device Mar. 18, 2014
8671878 Profile and CD uniformity control by plasma oxidation treatment Mar. 18, 2014
8658468 Method for fabricating a semiconductor and semiconductor package Feb. 25, 2014
8652970 Vacuum processing method and vacuum processing apparatus Feb. 18, 2014
8642479 Method for forming openings in semiconductor device Feb. 4, 2014
8642478 Plasma processing method and plasma processing apparatus Feb. 4, 2014
8642477 Method for clearing native oxide Feb. 4, 2014
8642476 Method for manufacturing silicon carbide semiconductor device Feb. 4, 2014
8598043 Methods of forming semiconductor constructions Dec. 3, 2013
8598040 ETCH process for 3D flash structures Dec. 3, 2013
8592320 Method for forming fin-shaped semiconductor structure Nov. 26, 2013
8580689 Plasma processing method Nov. 12, 2013
8580127 Method of manufacturing RFID based thermal bubble type accelerometer Nov. 12, 2013
8557621 Method for manufacturing thin film transistor array panel Oct. 15, 2013
8551886 CMP process for processing STI on two distinct silicon planes Oct. 8, 2013
8546268 Manufacturing integrated circuit components having multiple gate oxidations Oct. 1, 2013
8536061 Semiconductor device manufacturing method Sep. 17, 2013
8536060 Method for clearing native oxide Sep. 17, 2013
8536059 Equipment and methods for etching of MEMS Sep. 17, 2013
8536050 Selective shrinkage of contact elements in a semiconductor device Sep. 17, 2013
8535551 Plasma etching method Sep. 17, 2013
8535549 Method for forming stair-step structures Sep. 17, 2013
8518829 Self-sealed fluidic channels for nanopore array Aug. 27, 2013
8501629 Smooth SiConi etch for silicon-containing films Aug. 6, 2013
8501627 Profile control in dielectric etch Aug. 6, 2013
8501023 Method for forming a mirror MEMS device Aug. 6, 2013
8486840 Inverse spacer processing Jul. 16, 2013
RE44356 Tunable-wavelength optical filter and method of manufacturing the same Jul. 9, 2013
8475666 Method for making toughening agent materials Jul. 2, 2013
8470715 CD bias loading control with ARC layer open Jun. 25, 2013
8461047 Method for processing amorphous carbon film, and semiconductor device manufacturing method using the method Jun. 11, 2013
8445296 Apparatus and methods for end point determination in reactive ion etching May. 21, 2013
8440568 Substrate etching method and system May. 14, 2013
8440523 Micromechanical device and methods to fabricate same using hard mask resistant to structure release etch May. 14, 2013
8435902 Invertable pattern loading with dry etch May. 7, 2013
8435890 Method to alter silicide properties using GCIB treatment May. 7, 2013
8431032 Method for continual preparation of polycrystalline silicon using a fluidized bed reactor Apr. 30, 2013
8426318 Method of setting thickness of dielectric and substrate processing apparatus having dielectric disposed in electrode Apr. 23, 2013
8420547 Plasma processing method Apr. 16, 2013
8414787 Electron beam processing device and method using carbon nanotube emitter Apr. 9, 2013
8404595 Plasma processing method Mar. 26, 2013
8404052 Method for cleaning the surface of a silicon substrate Mar. 26, 2013
8388854 Methods of forming nanodots using spacer patterning techniques and structures formed thereby Mar. 5, 2013
8383521 Substrate processing method Feb. 26, 2013
8383517 Substrate processing method and substrate processing apparatus Feb. 26, 2013











 
 
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