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Class Information
Number: 438/722
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > By creating electric field (e.g., plasma, glow discharge, etc.) > Metal oxide
Description: Processes wherein the material undergoing etching with the energized gas is a compound of a metal and oxygen.

Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
8664653 Semiconductor device and method for manufacturing semiconductor device Mar. 4, 2014
8551886 CMP process for processing STI on two distinct silicon planes Oct. 8, 2013
8536062 Chemical removal of oxide layer from chip pads Sep. 17, 2013
8481434 Method of manufacturing a semiconductor device and processing apparatus Jul. 9, 2013
8460565 Process for fabricating patterned magnetic recording device Jun. 11, 2013
8440513 Method of semiconductor processing May. 14, 2013
8415000 Patterned inorganic layers, radiation based patterning compositions and corresponding methods Apr. 9, 2013
8415212 Method of enhancing photoresist adhesion to rare earth oxides Apr. 9, 2013
8394668 Oxide thin film, methods of manufacturing oxide thin film and electronic devices including oxide thin film Mar. 12, 2013
8389417 Semiconductor device and manufacturing method thereof Mar. 5, 2013
8216933 Krypton sputtering of low resistivity tungsten Jul. 10, 2012
8183161 Method and system for dry etching a hafnium containing material May. 22, 2012
8183082 Fabrication of organic solar array for applications in microelectromechanical systems and others May. 22, 2012
8138095 Method of substrate treatment, process for producing semiconductor device, substrate treating apparatus, and recording medium Mar. 20, 2012
8088295 Diamond-like carbon (DLC) hardmask and methods of fabrication using same Jan. 3, 2012
8021564 Method for detecting an end point of resist peeling, method and apparatus for peeling resist, and computer-readable storage medium Sep. 20, 2011
8012878 Atomic layer volatilization process for metal layers Sep. 6, 2011
7981734 Manufacturing method of thin film transistor including low resistance conductive thin films Jul. 19, 2011
7981805 Method for manufacturing resistance change element Jul. 19, 2011
7977246 Thermal annealing method for preventing defects in doped silicon oxide surfaces during exposure to atmosphere Jul. 12, 2011
7964512 Method for etching high dielectric constant materials Jun. 21, 2011
7916432 Thin-film patterning method for magnetoresistive device Mar. 29, 2011
7915174 Dielectric stack containing lanthanum and hafnium Mar. 29, 2011
7910490 Semiconductor device and manufacturing method thereof Mar. 22, 2011
7883906 Integration of capacitive elements in the form of perovskite ceramic Feb. 8, 2011
7820555 Method of patterning multilayer metal gate structures for CMOS devices Oct. 26, 2010
7807584 Method of forming metallic oxide films using atomic layer deposition Oct. 5, 2010
7790604 Krypton sputtering of thin tungsten layer for integrated circuits Sep. 7, 2010
7780862 Device and method for etching flash memory gate stacks comprising high-k dielectric Aug. 24, 2010
7781340 Method and system for etching high-k dielectric materials Aug. 24, 2010
7759247 Manufacturing method of semiconductor device with a barrier layer and a metal layer Jul. 20, 2010
7754618 Method of forming an apparatus having a dielectric containing cerium oxide and aluminum oxide Jul. 13, 2010
7727897 Method of etching a TE/PCMO stack using an etch stop layer Jun. 1, 2010
7718499 Method of fabricating a semiconductor device May. 18, 2010
7709274 Method for forming an RuOx electrode and structure May. 4, 2010
7709397 Method and system for etching a high-k dielectric material May. 4, 2010
7659210 Nano-crystal etch process Feb. 9, 2010
7629221 Method for forming capacitor of semiconductor device Dec. 8, 2009
7615163 Film formation apparatus and method of using the same Nov. 10, 2009
7585698 Thin film transistor having oxide semiconductor layer and manufacturing method thereof Sep. 8, 2009
7576002 Multi-step barrier deposition method Aug. 18, 2009
7560379 Semiconductive device fabricated using a raised layer to silicide the gate Jul. 14, 2009
7538001 Transistor gate forming methods and integrated circuits May. 26, 2009
7442651 Plasma etching method Oct. 28, 2008
7442654 Method of forming an oxide layer on a compound semiconductor structure Oct. 28, 2008
7422020 Aluminum incorporation in porous dielectric for improved mechanical properties of patterned dielectric Sep. 9, 2008
7371263 Plasmaless dry contact cleaning method using interhalogen compounds May. 13, 2008
7368394 Etch methods to form anisotropic features for high aspect ratio applications May. 6, 2008
7364956 Method for manufacturing semiconductor devices Apr. 29, 2008
7361606 Method of forming a metal line and method of manufacturing display substrate having the same Apr. 22, 2008

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