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Class Information
Number: 438/721
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > By creating electric field (e.g., plasma, glow discharge, etc.) > Electrically conductive material (e.g., metal, conductive oxide, etc.) > Silicide
Description: Processes wherein the material undergoing etching with the energized gas is an electrically conductive compound of silicon and a metal atom.

Patents under this class:
1 2 3 4 5

Patent Number Title Of Patent Date Issued
8691703 Method of manufacturing semiconductor device Apr. 8, 2014
8569170 Manufacturing method of semiconductor device comprising silicide layer with varied thickness Oct. 29, 2013
8563429 Methods of forming a metal silicide layer for semiconductor devices Oct. 22, 2013
8492286 Method of forming E-fuse in replacement metal gate manufacturing process Jul. 23, 2013
8470707 Silicide method Jun. 25, 2013
8455268 Gate replacement with top oxide regrowth for the top oxide improvement Jun. 4, 2013
8344461 Solid-state imaging device and manufacturing method for the same Jan. 1, 2013
8216933 Krypton sputtering of low resistivity tungsten Jul. 10, 2012
8202799 Methods of manufacturing metal-silicide features Jun. 19, 2012
8187969 Method for manufacturing semiconductor device May. 29, 2012
8168538 Buried silicide structure and method for making May. 1, 2012
8030210 Contact barrier structure and manufacturing methods Oct. 4, 2011
7939452 Method of manufacturing transistor having metal silicide and method of manufacturing a semiconductor device using the same May. 10, 2011
7915174 Dielectric stack containing lanthanum and hafnium Mar. 29, 2011
7816218 Selective deposition of amorphous silicon films on metal gates Oct. 19, 2010
7781316 Methods of manufacturing metal-silicide features Aug. 24, 2010
7727897 Method of etching a TE/PCMO stack using an etch stop layer Jun. 1, 2010
7691754 Method for removing photoresist layer and method of forming opening Apr. 6, 2010
7678678 Method to chemically remove metal impurities from polycide gate sidewalls Mar. 16, 2010
7659159 Method of manufacturing a flash memory device Feb. 9, 2010
7648917 Manufacturing method of solid-state imaging device Jan. 19, 2010
7605069 Method for fabricating semiconductor device with gate Oct. 20, 2009
7560379 Semiconductive device fabricated using a raised layer to silicide the gate Jul. 14, 2009
7550372 Method of fabricating conductive lines with silicide layer Jun. 23, 2009
7544621 Method of removing a metal silicide layer on a gate electrode in a semiconductor manufacturing process and etching method Jun. 9, 2009
7544616 Methods of forming nitride read only memory and word lines thereof Jun. 9, 2009
7501317 Method of manufacturing semiconductor device Mar. 10, 2009
7425482 Non-volatile memory device and method for fabricating the same Sep. 16, 2008
7396764 Manufacturing method for forming all regions of the gate electrode silicided Jul. 8, 2008
7371333 Methods of etching nickel silicide and cobalt silicide and methods of forming conductive lines May. 13, 2008
7344985 Nickel alloy silicide including indium and a method of manufacture therefor Mar. 18, 2008
7323418 Etch-back process for capping a polymer memory device Jan. 29, 2008
7309655 Etching method in a semiconductor processing and etching system for performing the same Dec. 18, 2007
7297638 Method for manufacturing a semiconductor device Nov. 20, 2007
7268065 Methods of manufacturing metal-silicide features Sep. 11, 2007
7244642 Method to obtain fully silicided gate electrodes Jul. 17, 2007
7214621 Methods of forming devices associated with semiconductor constructions May. 8, 2007
7211516 Nickel silicide including indium and a method of manufacture therefor May. 1, 2007
7208409 Integrated circuit metal silicide method Apr. 24, 2007
7192532 Dry etching method Mar. 20, 2007
7179707 Method of forming gate electrode in semiconductor device Feb. 20, 2007
7176139 Etching method in a semiconductor processing and etching system for performing the same Feb. 13, 2007
7163879 Hard mask etch for gate polyetch Jan. 16, 2007
7148143 Semiconductor device having a fully silicided gate electrode and method of manufacture therefor Dec. 12, 2006
7122477 Method of plasma treatment Oct. 17, 2006
7115523 Method and apparatus for etching photomasks Oct. 3, 2006
7112535 Precision polysilicon resistor process Sep. 26, 2006
7071114 Method and apparatus for dry etching Jul. 4, 2006
7067391 Method to form a metal silicide gate device Jun. 27, 2006
7067417 Methods of removing resistive remnants from contact holes using silicidation Jun. 27, 2006

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