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Class Information
Number: 438/720
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > By creating electric field (e.g., plasma, glow discharge, etc.) > Electrically conductive material (e.g., metal, conductive oxide, etc.)
Description: Processes wherein the material undergoing etching with the energized gas is an electrically conductive material.










Sub-classes under this class:

Class Number Class Name Patents
438/721 Silicide 206


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20

Patent Number Title Of Patent Date Issued
8709919 Method for the synthesis of an array of metal nanowire capable of supporting localized plasmon resonances and photonic device comprising said array Apr. 29, 2014
8703619 Taper-etching method and method of manufacturing near-field light generator Apr. 22, 2014
8679984 Method of manufacturing electric device, array of electric devices, and manufacturing method therefor Mar. 25, 2014
8679359 Low temperature metal etching and patterning Mar. 25, 2014
8664124 Method for etching organic hardmasks Mar. 4, 2014
8633117 Sputter and surface modification etch processing for metal patterning in integrated circuits Jan. 21, 2014
8629063 Forming features on a substrate having varying feature densities Jan. 14, 2014
8623230 Methods and systems for removing a material from a sample Jan. 7, 2014
8623670 Method for making a perpendicular thermally-assisted recording (TAR) magnetic recording disk having a carbon segregant Jan. 7, 2014
8617998 Method of forming a micro-pattern for semiconductor devices Dec. 31, 2013
8614151 Method of etching a high aspect ratio contact Dec. 24, 2013
8609546 Pulsed bias plasma process to control microloading Dec. 17, 2013
8598039 Barrier layer removal method and apparatus Dec. 3, 2013
8580675 Two-track cross-connect in double-patterned structure using rectangular via Nov. 12, 2013
8575020 Pattern-split decomposition strategy for double-patterned lithography process Nov. 5, 2013
8569179 Method for etching organic hardmasks Oct. 29, 2013
8563438 Method for manufacturing semiconductor device Oct. 22, 2013
8557710 Gas cluster ion beam etching process for metal-containing materials Oct. 15, 2013
8536062 Chemical removal of oxide layer from chip pads Sep. 17, 2013
8524607 Anisotropically conductive member and method of manufacture Sep. 3, 2013
8501608 Method for processing semiconductor device Aug. 6, 2013
8501620 Method for depositing tungsten film having low resistivity, low roughness and high reflectivity Aug. 6, 2013
8501628 Differential metal gate etching process Aug. 6, 2013
8501023 Method for forming a mirror MEMS device Aug. 6, 2013
8491799 Method for forming magnetic tunnel junction cell Jul. 23, 2013
8480911 Method and system for providing a read sensor in a magnetic recording transducer using focused ion beam scan polishing Jul. 9, 2013
8481434 Method of manufacturing a semiconductor device and processing apparatus Jul. 9, 2013
8475872 Patterning of thin film layers Jul. 2, 2013
8461038 Two-track cross-connects in double-patterned metal layers using a forbidden zone Jun. 11, 2013
8440513 Method of semiconductor processing May. 14, 2013
8440574 Post chromium alloy plasma etch ashing process May. 14, 2013
8435895 Methods for stripping photoresist and/or cleaning metal regions May. 7, 2013
8426316 Ta-TaN selective removal process for integrated device fabrication Apr. 23, 2013
8415249 Method of manufacturing semiconductor device Apr. 9, 2013
8404558 Method for making buried circumferential electrode microcavity plasma device arrays, and electrical interconnects Mar. 26, 2013
8404590 Plasma processing method and storage medium Mar. 26, 2013
8404597 Device and method for stopping an etching process Mar. 26, 2013
8377318 Magnetic device manufacturing method Feb. 19, 2013
8372743 Hybrid pitch-split pattern-split lithography process Feb. 12, 2013
8338311 Method for the production of structured layers of titanium and nickel Dec. 25, 2012
8338914 Integrated process for thin film resistors with silicides Dec. 25, 2012
8334215 Substrate processing method and substrate processing apparatus Dec. 18, 2012
8298955 Plasma etching method Oct. 30, 2012
8273614 Semiconductor device and method of manufacturing the same Sep. 25, 2012
8258063 Method for manufacturing a metal gate electrode/high K dielectric gate stack Sep. 4, 2012
8236701 Plasma processing apparatus and plasma processing method Aug. 7, 2012
8232214 Liquid crystal display device and method of fabricating the same Jul. 31, 2012
8198196 High aspect ratio trench structures with void-free fill material Jun. 12, 2012
8198197 Plasma etching method Jun. 12, 2012
8193095 Method for forming silicon trench Jun. 5, 2012

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