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Class Information
Number: 438/720
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > By creating electric field (e.g., plasma, glow discharge, etc.) > Electrically conductive material (e.g., metal, conductive oxide, etc.)
Description: Processes wherein the material undergoing etching with the energized gas is an electrically conductive material.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7625825 |
Method of patterning mechanical layer for MEMS structures |
Dec. 1, 2009 |
| 7622391 |
Method of forming an electrically conductive line in an integrated circuit |
Nov. 24, 2009 |
| 7615495 |
Display device and manufacturing method of the same |
Nov. 10, 2009 |
| 7605069 |
Method for fabricating semiconductor device with gate |
Oct. 20, 2009 |
| 7605088 |
Method of uniformly etching refractory metals, refractory metal alloys and refractory metal silicides |
Oct. 20, 2009 |
| 7595265 |
Semiconductor device and method for forming a metal line in the semiconductor device |
Sep. 29, 2009 |
| 7585784 |
System and method for reducing etch sequencing induced downstream dielectric defects in high volume semiconducting manufacturing |
Sep. 8, 2009 |
| 7585779 |
Fabrication method of semiconductor device |
Sep. 8, 2009 |
| 7585698 |
Thin film transistor having oxide semiconductor layer and manufacturing method thereof |
Sep. 8, 2009 |
| 7560315 |
Manufacturing method for semiconductor device |
Jul. 14, 2009 |
| 7538041 |
Magnetic recording medium, method of manufacturing the same, and intermediate for magnetic recording medium |
May. 26, 2009 |
| 7517464 |
Method for manufacturing an LCD device |
Apr. 14, 2009 |
| 7517810 |
Reduced metal design rules for power devices |
Apr. 14, 2009 |
| 7504680 |
Semiconductor device and mask pattern |
Mar. 17, 2009 |
| 7501071 |
Method of forming a patterned conductive structure |
Mar. 10, 2009 |
| 7488689 |
Plasma etching method |
Feb. 10, 2009 |
| 7482277 |
Multilevel fabrication processing by functional regrouping of material deposition, lithography, and etching |
Jan. 27, 2009 |
| 7476624 |
Dry-etching method |
Jan. 13, 2009 |
| 7446036 |
Gap free anchored conductor and dielectric structure and method for fabrication thereof |
Nov. 4, 2008 |
| 7442647 |
Structure and method for formation of cladded interconnects for MRAMs |
Oct. 28, 2008 |
| 7442651 |
Plasma etching method |
Oct. 28, 2008 |
| 7439188 |
Reactor with heated and textured electrodes and surfaces |
Oct. 21, 2008 |
| 7439087 |
Semiconductor device and manufacturing method thereof |
Oct. 21, 2008 |
| 7435681 |
Methods of etching stacks having metal layers and hard mask layers |
Oct. 14, 2008 |
| 7429535 |
Use of a plasma source to form a layer during the formation of a semiconductor device |
Sep. 30, 2008 |
| 7422983 |
Ta-TaN selective removal process for integrated device fabrication |
Sep. 9, 2008 |
| 7422984 |
Method of manufacturing a semiconductor device |
Sep. 9, 2008 |
| 7413993 |
Process for removing a residue from a metal structure on a semiconductor substrate |
Aug. 19, 2008 |
| 7402522 |
Hard mask structure for deep trenched super-junction device |
Jul. 22, 2008 |
| 7393788 |
Method and system for selectively etching a dielectric material relative to silicon |
Jul. 1, 2008 |
| 7390752 |
Self-aligning patterning method |
Jun. 24, 2008 |
| 7384873 |
Manufacturing process of semiconductor device |
Jun. 10, 2008 |
| 7378352 |
Method of fabricating semiconductor device |
May. 27, 2008 |
| 7375036 |
Anisotropic etch method |
May. 20, 2008 |
| 7368392 |
Method of fabricating a gate structure of a field effect transistor having a metal-containing gate electrode |
May. 6, 2008 |
| 7361606 |
Method of forming a metal line and method of manufacturing display substrate having the same |
Apr. 22, 2008 |
| 7361601 |
Chemical mechanical polish process and method for improving accuracy of determining polish endpoint thereof |
Apr. 22, 2008 |
| 7354853 |
Selective dry etching of tantalum and tantalum nitride |
Apr. 8, 2008 |
| 7354865 |
Method for removal of pattern resist over patterned metal having an underlying spacer layer |
Apr. 8, 2008 |
| 7351661 |
Semiconductor device having trench isolation layer and a method of forming the same |
Apr. 1, 2008 |
| 7348279 |
Method of making an integrated circuit, including forming a contact |
Mar. 25, 2008 |
| 7341958 |
Integrated process for thin film resistors with silicides |
Mar. 11, 2008 |
| 7341955 |
Method for fabricating semiconductor device |
Mar. 11, 2008 |
| 7341950 |
Method for controlling a thickness of a first layer and method for adjusting the thickness of different first layers |
Mar. 11, 2008 |
| 7326650 |
Method of etching dual damascene structure |
Feb. 5, 2008 |
| RE40028 |
Liquid crystal display device and method of manufacturing the same |
Jan. 22, 2008 |
| 7316980 |
Method for forming ferrocapacitors and FeRAM devices |
Jan. 8, 2008 |
| 7312158 |
Method of forming pattern |
Dec. 25, 2007 |
| 7309657 |
Circuit board, liquid discharge apparatus, and method of manufacturing the circuit board |
Dec. 18, 2007 |
| 7309655 |
Etching method in a semiconductor processing and etching system for performing the same |
Dec. 18, 2007 |
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