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Class Information
Number: 438/719
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > By creating electric field (e.g., plasma, glow discharge, etc.) > Silicon
Description: Processes wherein the material undergoing etching with the energized gas is silicon.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8691698 Controlled gas mixing for smooth sidewall rapid alternating etch process Apr. 8, 2014
8692339 Micromechanical component having a rear volume Apr. 8, 2014
8679982 Selective suppression of dry-etch rate of materials containing both silicon and oxygen Mar. 25, 2014
8673788 Method of forming a layer on a semiconductor substrate having a plurality of trenches Mar. 18, 2014
8664119 Semiconductor device manufacturing method Mar. 4, 2014
8642479 Method for forming openings in semiconductor device Feb. 4, 2014
8642473 Methods for contact clean Feb. 4, 2014
8636911 Process for MEMS scanning mirror with mass remove from mirror backside Jan. 28, 2014
8633116 Dry etching method Jan. 21, 2014
8617411 Methods and apparatus for atomic layer etching Dec. 31, 2013
8598040 ETCH process for 3D flash structures Dec. 3, 2013
8598037 Silicon etch with passivation using plasma enhanced oxidation Dec. 3, 2013
8592949 Method of texturing the surface of a silicon substrate, and textured silicon substrate for a solar cell Nov. 26, 2013
8592320 Method for forming fin-shaped semiconductor structure Nov. 26, 2013
8585910 Process of making a microtube and microfluidic devices formed therewith Nov. 19, 2013
8586456 Use of CL2 and/or HCL during silicon epitaxial film formation Nov. 19, 2013
8580695 Method of fabricating a semiconductor device Nov. 12, 2013
8557709 Plasma processing apparatus and plasma processing method Oct. 15, 2013
8546265 Method, apparatus and program for manufacturing silicon structure Oct. 1, 2013
8536061 Semiconductor device manufacturing method Sep. 17, 2013
8518283 Plasma etching method capable of detecting end point and plasma etching device therefor Aug. 27, 2013
8513138 Gas cluster ion beam etching process for Si-containing and Ge-containing materials Aug. 20, 2013
8512586 Gas cluster ion beam etching process for achieving target etch process metrics for multiple materials Aug. 20, 2013
8507386 Lateral uniformity in silicon recess etch Aug. 13, 2013
8492281 Liquid composition, method of producing silicon substrate, and method of producing liquid discharge head substrate Jul. 23, 2013
8492284 Low temperature etchant for treatment of silicon-containing surfaces Jul. 23, 2013
8492285 Method for plasma texturing Jul. 23, 2013
8481401 Component having a through-contact Jul. 9, 2013
8470190 Method for processing portions of walls of an opening formed in a silicon substrate Jun. 25, 2013
8461052 Semiconductor device manufacturing method Jun. 11, 2013
8455367 Method of manufacturing nitride substrate for semiconductors Jun. 4, 2013
8445389 Etchant treatment processes for substrate surfaces and chamber surfaces May. 21, 2013
8440573 Method and apparatus for pattern collapse free wet processing of semiconductor devices May. 14, 2013
8440572 Si etching method May. 14, 2013
8440568 Substrate etching method and system May. 14, 2013
8435895 Methods for stripping photoresist and/or cleaning metal regions May. 7, 2013
8420547 Plasma processing method Apr. 16, 2013
8414787 Electron beam processing device and method using carbon nanotube emitter Apr. 9, 2013
8404052 Method for cleaning the surface of a silicon substrate Mar. 26, 2013
8404592 Methods for fabricating FinFET semiconductor devices using L-shaped spacers Mar. 26, 2013
8404595 Plasma processing method Mar. 26, 2013
8377323 Mold having nanometric features, method for realizing such a mold and corresponding use of it in a method for realizing an array of carbon nanotubes Feb. 19, 2013
8372752 Method for fabricating ultra-fine nanowire Feb. 12, 2013
8372756 Selective etching of silicon dioxide compositions Feb. 12, 2013
8349639 Method for manufacturing image sensor Jan. 8, 2013
8318605 Plasma treatment method for preventing defects in doped silicon oxide surfaces during exposure to atmosphere Nov. 27, 2012
8319295 Use of F-based gate etch to passivate the high-k/metal gate stack for deep submicron transistor technologies Nov. 27, 2012
8298955 Plasma etching method Oct. 30, 2012
8298959 Method and apparatus for etching Oct. 30, 2012
8293554 Luminous device and method of manufacturing the same Oct. 23, 2012

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