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Class Information
Number: 438/714
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > By creating electric field (e.g., plasma, glow discharge, etc.) > Including change in etch influencing parameter (e.g., energizing power, etchant composition, temperature, etc.)
Description: Processes wherein a parameter influencing material removal, such as energizing power, gas etchant composition, temperature, etc., is varied during the etching process.










Patents under this class:

Patent Number Title Of Patent Date Issued
8709952 Etching method, etching apparatus, and computer-readable recording medium Apr. 29, 2014
8703619 Taper-etching method and method of manufacturing near-field light generator Apr. 22, 2014
8703617 Method for planarizing interlayer dielectric layer Apr. 22, 2014
8703591 Method for fabricating black silicon by using plasma immersion ion implantation Apr. 22, 2014
8703003 Selective etching of semiconductor substrate(s) that preserves underlying dielectric layers Apr. 22, 2014
8691700 Gas cluster ion beam etch profile control using beam divergence Apr. 8, 2014
8691019 Process for cleaning a compound semiconductor wafer Apr. 8, 2014
8686711 High-frequency measuring device and high-frequency measuring device calibration method Apr. 1, 2014
8685267 Substrate processing method Apr. 1, 2014
8679358 Plasma etching method and computer-readable storage medium Mar. 25, 2014
8673787 Method to reduce charge buildup during high aspect ratio contact etch Mar. 18, 2014
8673702 Field shield dielectric as a mask during semiconductor ink jet printing Mar. 18, 2014
8673693 Methods for forming materials using micro-heaters and electronic devices including such materials Mar. 18, 2014
8669183 Manufacturing method of semiconductor device Mar. 11, 2014
8668837 Method for etching substrate Mar. 11, 2014
8664124 Method for etching organic hardmasks Mar. 4, 2014
8664122 Method of fabricating a semiconductor device Mar. 4, 2014
8664056 Transistor with embedded strain-inducing material formed in diamond-shaped cavities based on a pre-amorphization Mar. 4, 2014
8659335 Method and system for controlling radio frequency power Feb. 25, 2014
8652298 Triode reactor design with multiple radiofrequency powers Feb. 18, 2014
8647990 Method of patterning a low-K dielectric film Feb. 11, 2014
8642481 Dry-etch for silicon-and-nitrogen-containing films Feb. 4, 2014
8617997 Selective wet etching of gold-tin based solder Dec. 31, 2013
8614150 Methods of manufacturing semiconductor structures using RIE process Dec. 24, 2013
8613864 Methods of forming semiconductor constructions Dec. 24, 2013
8609548 Method for providing high etch rate Dec. 17, 2013
8609547 Plasma etching method and computer-readable storage medium Dec. 17, 2013
8609546 Pulsed bias plasma process to control microloading Dec. 17, 2013
8609545 Method to improve mask critical dimension uniformity (CDU) Dec. 17, 2013
8598043 Methods of forming semiconductor constructions Dec. 3, 2013
8598040 ETCH process for 3D flash structures Dec. 3, 2013
8592319 Substrate processing method and substrate processing apparatus Nov. 26, 2013
8591755 Methods for controlling plasma constituent flux and deposition during semiconductor fabrication and apparatus for implementing the same Nov. 26, 2013
8569179 Method for etching organic hardmasks Oct. 29, 2013
8569176 Substrate processing method Oct. 29, 2013
8557710 Gas cluster ion beam etching process for metal-containing materials Oct. 15, 2013
8557675 Methods of patterning features in a structure using multiple sidewall image transfer technique Oct. 15, 2013
8557613 Methods for designing, fabricating, and predicting shape formations in a material Oct. 15, 2013
8546266 Plasma processing method and plasma processing apparatus Oct. 1, 2013
8546265 Method, apparatus and program for manufacturing silicon structure Oct. 1, 2013
8536059 Equipment and methods for etching of MEMS Sep. 17, 2013
8529783 Method for backside polymer reduction in dry-etch process Sep. 10, 2013
8512584 Etching method using an at least semi-solid media Aug. 20, 2013
8501630 Selective etch process for silicon nitride Aug. 6, 2013
8501624 Excited gas injection for ion implant control Aug. 6, 2013
8501620 Method for depositing tungsten film having low resistivity, low roughness and high reflectivity Aug. 6, 2013
8501608 Method for processing semiconductor device Aug. 6, 2013
8497213 Plasma processing method Jul. 30, 2013
8492287 Substrate processing method Jul. 23, 2013
8492285 Method for plasma texturing Jul. 23, 2013











 
 
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