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Class Information
Number: 438/714
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > By creating electric field (e.g., plasma, glow discharge, etc.) > Including change in etch influencing parameter (e.g., energizing power, etchant composition, temperature, etc.)
Description: Processes wherein a parameter influencing material removal, such as energizing power, gas etchant composition, temperature, etc., is varied during the etching process.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7625824 |
Process change detection through the use of evolutionary algorithms |
Dec. 1, 2009 |
| 7625823 |
Method of patterning a metal layer in a semiconductor device |
Dec. 1, 2009 |
| 7625494 |
Plasma etching method and plasma etching unit |
Dec. 1, 2009 |
| 7622391 |
Method of forming an electrically conductive line in an integrated circuit |
Nov. 24, 2009 |
| 7622340 |
Method for manufacturing semiconductor device |
Nov. 24, 2009 |
| 7615164 |
Plasma etching methods and contact opening forming methods |
Nov. 10, 2009 |
| 7611995 |
Method for removing silicon oxide film and processing apparatus |
Nov. 3, 2009 |
| 7611993 |
Plasma processing method and plasma processing apparatus |
Nov. 3, 2009 |
| 7608195 |
High aspect ratio contacts |
Oct. 27, 2009 |
| 7605088 |
Method of uniformly etching refractory metals, refractory metal alloys and refractory metal silicides |
Oct. 20, 2009 |
| 7605069 |
Method for fabricating semiconductor device with gate |
Oct. 20, 2009 |
| 7598178 |
Carbon precursors for use during silicon epitaxial film formation |
Oct. 6, 2009 |
| 7589026 |
Method for fabricating a fine pattern in a semiconductor device |
Sep. 15, 2009 |
| 7589005 |
Methods of forming semiconductor structures and systems for forming semiconductor structures |
Sep. 15, 2009 |
| 7585776 |
Dry etching method of insulating film |
Sep. 8, 2009 |
| 7585775 |
System and method for faceting a masking layer in a plasma etch to slope a feature edge |
Sep. 8, 2009 |
| 7582568 |
Method of forming a phase changeable structure |
Sep. 1, 2009 |
| 7579283 |
Insulating layer patterning method, insulating layer formed by the insulating layer patterning method, display device having the insulating layer |
Aug. 25, 2009 |
| 7573116 |
Etch aided by electrically shorting upper and lower sidewall portions during the formation of a semiconductor device |
Aug. 11, 2009 |
| 7572737 |
Apparatus and methods for adjusting an edge ring potential substrate processing |
Aug. 11, 2009 |
| 7572736 |
Method of dry-etching semiconductor devices |
Aug. 11, 2009 |
| 7572734 |
Etch depth control for dual damascene fabrication process |
Aug. 11, 2009 |
| 7572732 |
Method to modulate etch rate in SLAM |
Aug. 11, 2009 |
| 7569492 |
Method for post-etch cleans |
Aug. 4, 2009 |
| 7569488 |
Methods of making a MEMS device by monitoring a process parameter |
Aug. 4, 2009 |
| 7563723 |
Critical dimension control for integrated circuits |
Jul. 21, 2009 |
| 7560360 |
Methods for enhancing trench capacitance and trench capacitor |
Jul. 14, 2009 |
| 7554108 |
Forming a semiconductor device feature using acquired parameters |
Jun. 30, 2009 |
| 7553773 |
Pressure control method and processing device |
Jun. 30, 2009 |
| 7553679 |
Method of determining plasma ion density, wafer voltage, etch rate and wafer current from applied bias voltage and current |
Jun. 30, 2009 |
| 7550394 |
Semiconductor device and fabrication process thereof |
Jun. 23, 2009 |
| 7550392 |
Semiconductor device and method of manufacturing the same |
Jun. 23, 2009 |
| 7550390 |
Method and apparatus for dielectric etching during integrated circuit fabrication |
Jun. 23, 2009 |
| 7547636 |
Pulsed ultra-high aspect ratio dielectric etch |
Jun. 16, 2009 |
| 7547635 |
Process for etching dielectric films with improved resist and/or etch profile characteristics |
Jun. 16, 2009 |
| 7544621 |
Method of removing a metal silicide layer on a gate electrode in a semiconductor manufacturing process and etching method |
Jun. 9, 2009 |
| 7538041 |
Magnetic recording medium, method of manufacturing the same, and intermediate for magnetic recording medium |
May. 26, 2009 |
| 7531460 |
Dry-etching method |
May. 12, 2009 |
| 7528074 |
Method of manufacturing a semiconductor device and method of etching an insulating film |
May. 5, 2009 |
| 7521370 |
Method of operating a plasma reactor chamber with respect to two plasma parameters selected from a group comprising ion density, wafer voltage, etch rate and wafer current, by controlling cham |
Apr. 21, 2009 |
| 7521365 |
Selective epitaxy process with alternating gas supply |
Apr. 21, 2009 |
| 7521362 |
Methods for the optimization of ion energy control in a plasma processing system |
Apr. 21, 2009 |
| 7517804 |
Selective etch chemistries for forming high aspect ratio features and associated structures |
Apr. 14, 2009 |
| 7517802 |
Method for reducing foreign material concentrations in etch chambers |
Apr. 14, 2009 |
| 7517801 |
Method for selectivity control in a plasma processing system |
Apr. 14, 2009 |
| 7510977 |
Method for manufacturing silicon carbide semiconductor device |
Mar. 31, 2009 |
| 7510665 |
Plasma generation and control using dual frequency RF signals |
Mar. 31, 2009 |
| 7507673 |
Method for etching an object to be processed |
Mar. 24, 2009 |
| 7507672 |
Plasma etching system and method |
Mar. 24, 2009 |
| 7504340 |
System and method for providing contact etch selectivity using RIE lag dependence on contact aspect ratio |
Mar. 17, 2009 |
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