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Class Information
Number: 438/711
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > By creating electric field (e.g., plasma, glow discharge, etc.) > Utilizing multiple gas energizing means
Description: Processes wherein plural gas energizing means are utilized either simultaneously or consecutively to ionize the etching gas (e.g., RF discharge and a DC electron source, etc.)
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7622393 |
Method and apparatus for manufacturing a semiconductor device, control program thereof and computer-readable storage medium storing the control program |
Nov. 24, 2009 |
| 7598177 |
Methods of filling trenches using high-density plasma deposition (HDP) |
Oct. 6, 2009 |
| 7595005 |
Method and apparatus for ashing a substrate using carbon dioxide |
Sep. 29, 2009 |
| 7585777 |
Photoresist strip method for low-k dielectrics |
Sep. 8, 2009 |
| 7585778 |
Method of etching an organic low-k dielectric material |
Sep. 8, 2009 |
| 7572386 |
Method of treating a mask layer prior to performing an etching process |
Aug. 11, 2009 |
| 7569488 |
Methods of making a MEMS device by monitoring a process parameter |
Aug. 4, 2009 |
| 7569492 |
Method for post-etch cleans |
Aug. 4, 2009 |
| 7553772 |
Process and apparatus for simultaneous light and radical surface treatment of integrated circuit structure |
Jun. 30, 2009 |
| 7547621 |
LPCVD gate hard mask |
Jun. 16, 2009 |
| 7528073 |
Dry etching method and diffractive optical element |
May. 5, 2009 |
| 7524769 |
Method and system for removing an oxide from a substrate |
Apr. 28, 2009 |
| 7488687 |
Methods of forming electrical interconnect structures using polymer residues to increase etching selectivity through dielectric layers |
Feb. 10, 2009 |
| 7485581 |
Device with gaps for capacitance reduction |
Feb. 3, 2009 |
| 7482262 |
Method of manufacturing semiconductor device |
Jan. 27, 2009 |
| 7476623 |
Method for microstructuring flat glass substrates |
Jan. 13, 2009 |
| 7473630 |
Semiconductor device and method for manufacturing same |
Jan. 6, 2009 |
| 7429534 |
Etching a nitride-based heterostructure |
Sep. 30, 2008 |
| 7416973 |
Method of increasing the etch selectivity in a contact structure of semiconductor devices |
Aug. 26, 2008 |
| 7390755 |
Methods for post etch cleans |
Jun. 24, 2008 |
| 7384876 |
Method and apparatus for determining consumable lifetime |
Jun. 10, 2008 |
| 7365017 |
Method for finishing metal line for semiconductor device |
Apr. 29, 2008 |
| 7312156 |
Method and apparatus for supporting a semiconductor wafer during processing |
Dec. 25, 2007 |
| 7307025 |
Lag control |
Dec. 11, 2007 |
| 7288484 |
Photoresist strip method for low-k dielectrics |
Oct. 30, 2007 |
| 7288485 |
Device and method for anisotropic plasma etching of a substrate, particularly a silicon element |
Oct. 30, 2007 |
| RE39895 |
Semiconductor integrated circuit arrangement fabrication method |
Oct. 23, 2007 |
| 7279427 |
Damage-free ashing process and system for post low-k etch |
Oct. 9, 2007 |
| 7268080 |
Method for printing contacts on a substrate |
Sep. 11, 2007 |
| 7250373 |
Method and apparatus for etching material layers with high uniformity of a lateral etch rate across a substrate |
Jul. 31, 2007 |
| 7226869 |
Methods for protecting silicon or silicon carbide electrode surfaces from morphological modification during plasma etch processing |
Jun. 5, 2007 |
| 7217665 |
Method of plasma etching high-K dielectric materials with high selectivity to underlying layers |
May. 15, 2007 |
| 7212878 |
Wafer-to-wafer control using virtual modules |
May. 1, 2007 |
| 7205235 |
Method for reducing corrosion of metal surfaces during semiconductor processing |
Apr. 17, 2007 |
| 7192878 |
Method for removing post-etch residue from wafer surface |
Mar. 20, 2007 |
| 7189653 |
Etching method and etching apparatus |
Mar. 13, 2007 |
| 7148073 |
Methods and systems for preparing a copper containing substrate for analysis |
Dec. 12, 2006 |
| 7129171 |
Selective oxygen-free etching process for barrier materials |
Oct. 31, 2006 |
| 7115524 |
Methods of processing a semiconductor substrate |
Oct. 3, 2006 |
| 7109123 |
Silicon etching method |
Sep. 19, 2006 |
| 7105100 |
System and method for gas distribution in a dry etch process |
Sep. 12, 2006 |
| 7094706 |
Device and method for etching a substrate by using an inductively coupled plasma |
Aug. 22, 2006 |
| 7084074 |
CVD gas injector and method therefor |
Aug. 1, 2006 |
| 7053000 |
System, method and apparatus for constant voltage control of RF generator for optimum operation |
May. 30, 2006 |
| 7037846 |
Method and apparatus for micro-jet enabled, low energy ion generation and transport in plasma processing |
May. 2, 2006 |
| 7037810 |
Method of replacing atmosphere of chamber apparatus, chamber apparatus, electro-optic apparatus, and organic EL device |
May. 2, 2006 |
| 7033954 |
Etching of high aspect ration structures |
Apr. 25, 2006 |
| 7033952 |
Apparatus and method using a remote RF energized plasma for processing semiconductor wafers |
Apr. 25, 2006 |
| 7033874 |
Method of forming insulating film and method of fabricating semiconductor device including plasma bias for forming a second insulating film |
Apr. 25, 2006 |
| 7030027 |
Etching methods and apparatus for producing semiconductor devices |
Apr. 18, 2006 |
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