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Class Information
Number: 438/711
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > By creating electric field (e.g., plasma, glow discharge, etc.) > Utilizing multiple gas energizing means
Description: Processes wherein plural gas energizing means are utilized either simultaneously or consecutively to ionize the etching gas (e.g., RF discharge and a DC electron source, etc.)










Patents under this class:
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Patent Number Title Of Patent Date Issued
8664122 Method of fabricating a semiconductor device Mar. 4, 2014
8658048 Method of manufacturing magnetic recording medium Feb. 25, 2014
8647990 Method of patterning a low-K dielectric film Feb. 11, 2014
8609545 Method to improve mask critical dimension uniformity (CDU) Dec. 17, 2013
8609546 Pulsed bias plasma process to control microloading Dec. 17, 2013
8598465 Hermetic circuit ring for BCB WSA circuits Dec. 3, 2013
8536059 Equipment and methods for etching of MEMS Sep. 17, 2013
8480914 Multiple gas plasma forming method and ICP source Jul. 9, 2013
8461052 Semiconductor device manufacturing method Jun. 11, 2013
8409991 Method for manufacturing large-area vacuum plasma treated substrates and vacuum plasma treatment apparatus Apr. 2, 2013
8377827 Methods for forming a gate and a shallow trench isolation region and for planarizing an etched surface of silicon substrate Feb. 19, 2013
8367554 Methods for forming a gate and a shallow trench isolation region and for planarizing an etched surface of silicon substrate Feb. 5, 2013
8314033 Method of patterning a low-k dielectric film Nov. 20, 2012
8268728 Method of cleaning and forming a negatively charged passivation layer over a doped region Sep. 18, 2012
8252193 Plasma processing apparatus of substrate and plasma processing method thereof Aug. 28, 2012
8148268 Plasma treatment apparatus and plasma treatment method Apr. 3, 2012
8138096 Plasma etching method Mar. 20, 2012
8093155 Method of controlling striations and CD loss in contact oxide etch Jan. 10, 2012
8071481 Method for forming highly strained source/drain trenches Dec. 6, 2011
8058178 Photoresist strip method for low-k dielectrics Nov. 15, 2011
8058181 Method for post-etch cleans Nov. 15, 2011
8039402 Methods for forming a gate and a shallow trench isolation region and for planarizating an etched surface of silicon substrate Oct. 18, 2011
8030216 Method of making semiconductor device Oct. 4, 2011
8008208 Method of cleaning and forming a negatively charged passivation layer over a doped region Aug. 30, 2011
8003541 Methods of forming variable resistance memory cells, and methods of etching germanium, antimony, and tellurium-comprising materials Aug. 23, 2011
7998876 Method of producing semiconductor element Aug. 16, 2011
7981806 Method for forming trench and method for fabricating semiconductor device using the same Jul. 19, 2011
7972968 High density plasma gapfill deposition-etch-deposition process etchant Jul. 5, 2011
7972980 Method of forming conformal dielectric film having Si-N bonds by PECVD Jul. 5, 2011
7943522 Manufacturing method of semiconductor device May. 17, 2011
7928013 Display panel and rework method of gate insulating layer of thin film transistor Apr. 19, 2011
7919416 Method of forming conformal dielectric film having Si-N bonds by PECVD Apr. 5, 2011
7906432 Method for manufacturing semiconductor device Mar. 15, 2011
7879730 Etch selectivity enhancement in electron beam activated chemical etch Feb. 1, 2011
7846348 Manufacturing method of semiconductor device Dec. 7, 2010
7838436 Bottom electrode for MRAM device and method to fabricate it Nov. 23, 2010
7825033 Methods of forming variable resistance memory cells, and methods of etching germanium, antimony, and tellurium-comprising materials Nov. 2, 2010
7820553 Prevention of trench photoresist scum Oct. 26, 2010
7816272 Process of cleaning a semiconductor manufacturing system and method of manufacturing a semiconductor device Oct. 19, 2010
7781293 Semiconductor device and method of fabricating the same including trenches of different aspect ratios Aug. 24, 2010
7767596 Wafer support pin for preventing slip dislocation during annealing of water and wafer annealing method using the same Aug. 3, 2010
7759214 Semiconductor including STI and method for manufacturing the same Jul. 20, 2010
7682982 Plasma processing apparatus and control method thereof Mar. 23, 2010
7670958 Etching methods Mar. 2, 2010
7637269 Low damage method for ashing a substrate using CO.sub.2/CO-based process Dec. 29, 2009
7622393 Method and apparatus for manufacturing a semiconductor device, control program thereof and computer-readable storage medium storing the control program Nov. 24, 2009
7598177 Methods of filling trenches using high-density plasma deposition (HDP) Oct. 6, 2009
7595005 Method and apparatus for ashing a substrate using carbon dioxide Sep. 29, 2009
7585778 Method of etching an organic low-k dielectric material Sep. 8, 2009
7585777 Photoresist strip method for low-k dielectrics Sep. 8, 2009

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