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Class Information
Number: 438/710
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > By creating electric field (e.g., plasma, glow discharge, etc.)
Description: Processes involving the application of an electric field to generate, modify, or control the vaporous reactant(s) used in the chemical etching process.










Sub-classes under this class:

Class Number Class Name Patents
438/718 Compound semiconductor 226
438/720 Electrically conductive material (e.g., metal, conductive oxide, etc.) 961
438/713 Forming tapered profile (e.g., tapered etching, etc.) 380
438/726 Having microwave gas energizing 84
438/714 Including change in etch influencing parameter (e.g., energizing power, etchant composition, temperature, etc.) 1,312
438/722 Metal oxide 188
438/725 Organic material (e.g., resist, etc.) 1,235
438/712 Reactive ion beam etching (i.e., ribe) 767
438/724 Silicon nitride 719
438/723 Silicon oxide or glass 1,316
438/719 Silicon 878
438/732 Using magnet (e.g., electron cyclotron resonance, etc.) 116
438/729 Using specified electrode/susceptor configuration (e.g., of multiple substrates using barrel-type susceptor, planar reactor configuration, etc.) to generate plasma 263
438/717 Utilizing multilayered mask 650
438/711 Utilizing multiple gas energizing means 301
438/716 With substrate handling (e.g., conveying, etc.) 192
438/715 With substrate heating or cooling 415


Patents under this class:

Patent Number Title Of Patent Date Issued
8709952 Etching method, etching apparatus, and computer-readable recording medium Apr. 29, 2014
8704445 Method for improving uniformity of high-frequency plasma discharge by means of frequency modulation Apr. 22, 2014
8703605 High yield and high throughput method for the manufacture of integrated circuit devices of improved integrity, performance and reliability Apr. 22, 2014
8691702 Method and apparatus for plasma dicing a semi-conductor wafer Apr. 8, 2014
8691701 Strip with reduced low-K dielectric damage Apr. 8, 2014
8691698 Controlled gas mixing for smooth sidewall rapid alternating etch process Apr. 8, 2014
8685832 Trench filling method and method of manufacturing semiconductor integrated circuit device Apr. 1, 2014
8679983 Selective suppression of dry-etch rate of materials containing both silicon and nitrogen Mar. 25, 2014
8679982 Selective suppression of dry-etch rate of materials containing both silicon and oxygen Mar. 25, 2014
8679359 Low temperature metal etching and patterning Mar. 25, 2014
8679358 Plasma etching method and computer-readable storage medium Mar. 25, 2014
8679288 Showerhead electrode assemblies for plasma processing apparatuses Mar. 25, 2014
8673166 Plasma processing apparatus and plasma processing method Mar. 18, 2014
8669183 Manufacturing method of semiconductor device Mar. 11, 2014
8664124 Method for etching organic hardmasks Mar. 4, 2014
8664122 Method of fabricating a semiconductor device Mar. 4, 2014
8658050 Method to transfer lithographic patterns into inorganic substrates Feb. 25, 2014
8658048 Method of manufacturing magnetic recording medium Feb. 25, 2014
8657961 Method for UV based silylation chamber clean Feb. 25, 2014
8652926 Methods of forming capacitors Feb. 18, 2014
8652343 Method for selectively removing material from the surface of a substrate, masking material for a wafer, and wafer with masking material Feb. 18, 2014
8652342 Semiconductor fabrication apparatuses to perform semiconductor etching and deposition processes and methods of forming semiconductor device using the same Feb. 18, 2014
8647991 Method for forming dual damascene opening Feb. 11, 2014
8647990 Method of patterning a low-K dielectric film Feb. 11, 2014
8647521 Method of forming micro pattern of semiconductor device Feb. 11, 2014
8642481 Dry-etch for silicon-and-nitrogen-containing films Feb. 4, 2014
8642480 Adjusting substrate temperature to improve CD uniformity Feb. 4, 2014
8642479 Method for forming openings in semiconductor device Feb. 4, 2014
8642478 Plasma processing method and plasma processing apparatus Feb. 4, 2014
8642477 Method for clearing native oxide Feb. 4, 2014
8642473 Methods for contact clean Feb. 4, 2014
8641916 Plasma etching apparatus, plasma etching method and storage medium Feb. 4, 2014
8633117 Sputter and surface modification etch processing for metal patterning in integrated circuits Jan. 21, 2014
8628676 Plasma etching method Jan. 14, 2014
8628675 Method for reduction of voltage potential spike during dechucking Jan. 14, 2014
8623471 Plasma treatment system Jan. 7, 2014
8617411 Methods and apparatus for atomic layer etching Dec. 31, 2013
8614151 Method of etching a high aspect ratio contact Dec. 24, 2013
8614140 Semiconductor device manufacturing apparatus Dec. 24, 2013
8609549 Plasma etching method, plasma etching apparatus, and computer-readable storage medium Dec. 17, 2013
8609547 Plasma etching method and computer-readable storage medium Dec. 17, 2013
8609546 Pulsed bias plasma process to control microloading Dec. 17, 2013
8609545 Method to improve mask critical dimension uniformity (CDU) Dec. 17, 2013
8608973 Layer-layer etch of non volatile materials using plasma Dec. 17, 2013
8603884 Methods of fabricating substrates Dec. 10, 2013
8598040 ETCH process for 3D flash structures Dec. 3, 2013
8598039 Barrier layer removal method and apparatus Dec. 3, 2013
8597527 Method for forming a concavo-convex pattern and a method of manufacturing a patterned medium type magnetic recording medium Dec. 3, 2013
8592327 Formation of SiOCl-containing layer on exposed low-k surfaces to reduce low-k damage Nov. 26, 2013
8592318 Pitch reduction using oxide spacer Nov. 26, 2013











 
 
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