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Class Information
Number: 438/709
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy > Photo-induced etching > Photo-induced plasma etching
Description: Processes wherein the photo-induced vapor phase etching is accompanied with the excitation of the etchant into a plasma.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7611944 |
Integrated circuit fabrication |
Nov. 3, 2009 |
| 7605089 |
Method of manufacturing an electronic device |
Oct. 20, 2009 |
| 7601619 |
Method and apparatus for plasma processing |
Oct. 13, 2009 |
| 7585698 |
Thin film transistor having oxide semiconductor layer and manufacturing method thereof |
Sep. 8, 2009 |
| 7553772 |
Process and apparatus for simultaneous light and radical surface treatment of integrated circuit structure |
Jun. 30, 2009 |
| 7528073 |
Dry etching method and diffractive optical element |
May. 5, 2009 |
| 7501346 |
Gallium and chromium ions for oxide rate enhancement |
Mar. 10, 2009 |
| 7498271 |
Nitrogen based plasma process for metal gate MOS device |
Mar. 3, 2009 |
| 7497095 |
Method for producing quartz glass jig and quartz glass jig |
Mar. 3, 2009 |
| 7482274 |
Metal wiring and method of manufacturing the same, and metal wiring substrate and method of manufacturing the same |
Jan. 27, 2009 |
| 7479457 |
Gas mixture for removing photoresist and post etch residue from low-k dielectric material and method of use thereof |
Jan. 20, 2009 |
| 7479456 |
Gasless high voltage high contact force wafer contact-cooling electrostatic chuck |
Jan. 20, 2009 |
| 7459401 |
Method of dividing wafer |
Dec. 2, 2008 |
| 7446048 |
Dry etching apparatus and dry etching method |
Nov. 4, 2008 |
| 7432209 |
Plasma dielectric etch process including in-situ backside polymer removal for low-dielectric constant material |
Oct. 7, 2008 |
| 7429536 |
Methods for forming arrays of small, closely spaced features |
Sep. 30, 2008 |
| 7427519 |
Method of detecting end point of plasma etching process |
Sep. 23, 2008 |
| 7416990 |
Method for patterning low dielectric layer of semiconductor device |
Aug. 26, 2008 |
| 7413960 |
Method of forming floating gate electrode in flash memory device |
Aug. 19, 2008 |
| 7405160 |
Method of making semiconductor device |
Jul. 29, 2008 |
| 7396769 |
Method for stripping photoresist from etched wafer |
Jul. 8, 2008 |
| 7396725 |
Method of manufacturing semiconductor device |
Jul. 8, 2008 |
| 7368390 |
Photolithographic patterning process using a carbon hard mask layer of diamond-like hardness produced by a plasma-enhanced deposition process |
May. 6, 2008 |
| 7361606 |
Method of forming a metal line and method of manufacturing display substrate having the same |
Apr. 22, 2008 |
| 7361607 |
Method for multi-layer resist plasma etch |
Apr. 22, 2008 |
| 7344975 |
Method to reduce charge buildup during high aspect ratio contact etch |
Mar. 18, 2008 |
| 7341955 |
Method for fabricating semiconductor device |
Mar. 11, 2008 |
| 7323418 |
Etch-back process for capping a polymer memory device |
Jan. 29, 2008 |
| 7273815 |
Etch features with reduced line edge roughness |
Sep. 25, 2007 |
| 7256129 |
Method for fabricating semiconductor device |
Aug. 14, 2007 |
| 7217663 |
Via hole and trench structures and fabrication methods thereof and dual damascene structures and fabrication methods thereof |
May. 15, 2007 |
| 7208326 |
Edge protection process for semiconductor device fabrication |
Apr. 24, 2007 |
| 7199058 |
Method of manufacturing a semiconductor device and apparatus for manufacturing a semiconductor device |
Apr. 3, 2007 |
| 7183201 |
Selective etching of organosilicate films over silicon oxide stop etch layers |
Feb. 27, 2007 |
| 7172974 |
Methods for forming fine pattern of semiconductor device |
Feb. 6, 2007 |
| 7151040 |
Methods for increasing photo alignment margins |
Dec. 19, 2006 |
| 7141505 |
Method for bilayer resist plasma etch |
Nov. 28, 2006 |
| 7115525 |
Method for integrated circuit fabrication using pitch multiplication |
Oct. 3, 2006 |
| 7112534 |
Process for low k dielectric plasma etching with high selectivity to deep uv photoresist |
Sep. 26, 2006 |
| 7094702 |
Layer-by-layer etching apparatus using neutral beam and method of etching using the same |
Aug. 22, 2006 |
| 7094703 |
Method and apparatus for surface treatment |
Aug. 22, 2006 |
| 7084067 |
Removal of copper oxides from integrated interconnects |
Aug. 1, 2006 |
| 7067441 |
Damage-free resist removal process for ultra-low-k processing |
Jun. 27, 2006 |
| 7052989 |
Semiconductor device having opening and method of fabricating the same |
May. 30, 2006 |
| 7041597 |
Semiconductor device having void free contact and method for fabricating the contact |
May. 9, 2006 |
| 7030027 |
Etching methods and apparatus for producing semiconductor devices |
Apr. 18, 2006 |
| 7022611 |
Plasma in-situ treatment of chemically amplified resist |
Apr. 4, 2006 |
| 7005386 |
Method for reducing resist height erosion in a gate etch process |
Feb. 28, 2006 |
| 6987066 |
Dry etching method and semiconductor device manufacturing method |
Jan. 17, 2006 |
| 6962874 |
Method for fabricating semiconductor device |
Nov. 8, 2005 |
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