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Class Information
Number: 438/707
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy
Description: Processes wherein the vapor phase etching is conducted using irradiation of electromagnetic or wave energy.


Sub-classes under this class:

Class Number Class Name Patents
438/710 By creating electric field (e.g., plasma, glow discharge, etc.) 1,273
438/708 Photo-induced etching 230
438/733 Using or orientation dependent etchant (i.e., anisotropic etchant) 163


Patents under this class:
1 2 3 4

Patent Number Title Of Patent Date Issued
7628897 Reactive ion etching for semiconductor device feature topography modification Dec. 8, 2009
7615494 Method for fabricating semiconductor device including plug Nov. 10, 2009
7569487 Method for atomic layer deposition of materials using a pre-treatment for semiconductor devices Aug. 4, 2009
7550394 Semiconductor device and fabrication process thereof Jun. 23, 2009
7544588 Laser processing method for wafer Jun. 9, 2009
7544603 Method of fabricating silicon nitride layer and method of fabricating semiconductor device Jun. 9, 2009
7524769 Method and system for removing an oxide from a substrate Apr. 28, 2009
7498266 Method for structuring of silicon substrates for microsystem technological device elements and associated silicon substrate Mar. 3, 2009
7491649 Plasma processing apparatus Feb. 17, 2009
7479456 Gasless high voltage high contact force wafer contact-cooling electrostatic chuck Jan. 20, 2009
7452814 Method of polishing GaN substrate Nov. 18, 2008
7419902 Method of manufacture of semiconductor integrated circuit Sep. 2, 2008
7396771 Plasma etching apparatus and plasma etching method Jul. 8, 2008
7378703 Semiconductor device having step gates and method for fabricating the same May. 27, 2008
7365017 Method for finishing metal line for semiconductor device Apr. 29, 2008
7326652 Atomic layer deposition using photo-enhanced bond reconfiguration Feb. 5, 2008
7320941 Plasma stabilization method and plasma apparatus Jan. 22, 2008
7309655 Etching method in a semiconductor processing and etching system for performing the same Dec. 18, 2007
7309515 Method for fabricating an imprint mold structure Dec. 18, 2007
7291564 Method and structure for facilitating etching Nov. 6, 2007
7285498 Etching method Oct. 23, 2007
7268083 Plasma etching apparatus and plasma etching process Sep. 11, 2007
7250317 Method of fabricating optical waveguide reflectors Jul. 31, 2007
7247575 Multi-step EBR process for photoresist removal Jul. 24, 2007
7205241 Method for manufacturing semiconductor device with contact body extended in direction of bit line Apr. 17, 2007
7195716 Etching process and patterning process Mar. 27, 2007
7192875 Processes for treating morphologically-modified silicon electrode surfaces using gas-phase interhalogens Mar. 20, 2007
7176139 Etching method in a semiconductor processing and etching system for performing the same Feb. 13, 2007
7166530 Method of forming contact pads Jan. 23, 2007
7166535 Plasma etching of silicon carbide Jan. 23, 2007
7148148 Mask forming and removing method, and semiconductor device, an electric circuit, a display module, a color filter and an emissive device manufactured by the same method Dec. 12, 2006
7129178 Reducing defect formation within an etched semiconductor topography Oct. 31, 2006
7125786 Method of forming vias in silicon carbide and resulting devices and circuits Oct. 24, 2006
7094641 Method for forming wiring pattern, method for manufacturing semiconductor device, electro-optic device and electronic equipment Aug. 22, 2006
7091129 Atomic layer deposition using photo-enhanced bond reconfiguration Aug. 15, 2006
7091127 Methods and apparatus for patterning a surface Aug. 15, 2006
7053000 System, method and apparatus for constant voltage control of RF generator for optimum operation May. 30, 2006
7026174 Method for reducing wafer arcing Apr. 11, 2006
7022614 Method of etching back of semiconductor wafer Apr. 4, 2006
6995092 Method for manufacturing an electronic device Feb. 7, 2006
6967169 Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate Nov. 22, 2005
6960416 Method and apparatus for controlling etch processes during fabrication of semiconductor devices Nov. 1, 2005
6951827 Controlling surface chemistry on solid substrates Oct. 4, 2005
6946400 Patterning method for fabricating integrated circuit Sep. 20, 2005
6936546 Apparatus for shaping thin films in the near-edge regions of in-process semiconductor substrates Aug. 30, 2005
6914005 Plasma etching method Jul. 5, 2005
6914008 Structure having pores and its manufacturing method Jul. 5, 2005
6914007 In-situ discharge to avoid arcing during plasma etch processes Jul. 5, 2005
6914006 Wafer scribing method and wafer scribing device Jul. 5, 2005
6903027 Method of forming dielectric film and dielectric film Jun. 7, 2005

1 2 3 4


 
 
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