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Class Information
Number: 438/707
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy
Description: Processes wherein the vapor phase etching is conducted using irradiation of electromagnetic or wave energy.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7396771 |
Plasma etching apparatus and plasma etching method |
Jul. 8, 2008 |
| 7378703 |
Semiconductor device having step gates and method for fabricating the same |
May. 27, 2008 |
| 7365017 |
Method for finishing metal line for semiconductor device |
Apr. 29, 2008 |
| 7326652 |
Atomic layer deposition using photo-enhanced bond reconfiguration |
Feb. 5, 2008 |
| 7320941 |
Plasma stabilization method and plasma apparatus |
Jan. 22, 2008 |
| 7309655 |
Etching method in a semiconductor processing and etching system for performing the same |
Dec. 18, 2007 |
| 7309515 |
Method for fabricating an imprint mold structure |
Dec. 18, 2007 |
| 7291564 |
Method and structure for facilitating etching |
Nov. 6, 2007 |
| 7285498 |
Etching method |
Oct. 23, 2007 |
| 7268083 |
Plasma etching apparatus and plasma etching process |
Sep. 11, 2007 |
| 7250317 |
Method of fabricating optical waveguide reflectors |
Jul. 31, 2007 |
| 7247575 |
Multi-step EBR process for photoresist removal |
Jul. 24, 2007 |
| 7205241 |
Method for manufacturing semiconductor device with contact body extended in direction of bit line |
Apr. 17, 2007 |
| 7195716 |
Etching process and patterning process |
Mar. 27, 2007 |
| 7192875 |
Processes for treating morphologically-modified silicon electrode surfaces using gas-phase interhalogens |
Mar. 20, 2007 |
| 7176139 |
Etching method in a semiconductor processing and etching system for performing the same |
Feb. 13, 2007 |
| 7166530 |
Method of forming contact pads |
Jan. 23, 2007 |
| 7166535 |
Plasma etching of silicon carbide |
Jan. 23, 2007 |
| 7148148 |
Mask forming and removing method, and semiconductor device, an electric circuit, a display module, a color filter and an emissive device manufactured by the same method |
Dec. 12, 2006 |
| 7129178 |
Reducing defect formation within an etched semiconductor topography |
Oct. 31, 2006 |
| 7125786 |
Method of forming vias in silicon carbide and resulting devices and circuits |
Oct. 24, 2006 |
| 7094641 |
Method for forming wiring pattern, method for manufacturing semiconductor device, electro-optic device and electronic equipment |
Aug. 22, 2006 |
| 7091127 |
Methods and apparatus for patterning a surface |
Aug. 15, 2006 |
| 7091129 |
Atomic layer deposition using photo-enhanced bond reconfiguration |
Aug. 15, 2006 |
| 7053000 |
System, method and apparatus for constant voltage control of RF generator for optimum operation |
May. 30, 2006 |
| 7026174 |
Method for reducing wafer arcing |
Apr. 11, 2006 |
| 7022614 |
Method of etching back of semiconductor wafer |
Apr. 4, 2006 |
| 6995092 |
Method for manufacturing an electronic device |
Feb. 7, 2006 |
| 6967169 |
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
Nov. 22, 2005 |
| 6960416 |
Method and apparatus for controlling etch processes during fabrication of semiconductor devices |
Nov. 1, 2005 |
| 6951827 |
Controlling surface chemistry on solid substrates |
Oct. 4, 2005 |
| 6946400 |
Patterning method for fabricating integrated circuit |
Sep. 20, 2005 |
| 6936546 |
Apparatus for shaping thin films in the near-edge regions of in-process semiconductor substrates |
Aug. 30, 2005 |
| 6914005 |
Plasma etching method |
Jul. 5, 2005 |
| 6914006 |
Wafer scribing method and wafer scribing device |
Jul. 5, 2005 |
| 6914008 |
Structure having pores and its manufacturing method |
Jul. 5, 2005 |
| 6914007 |
In-situ discharge to avoid arcing during plasma etch processes |
Jul. 5, 2005 |
| 6903027 |
Method of forming dielectric film and dielectric film |
Jun. 7, 2005 |
| 6899817 |
Device and method for etching a substrate using an inductively coupled plasma |
May. 31, 2005 |
| 6897156 |
Vacuum plasma processor method |
May. 24, 2005 |
| 6881608 |
Semiconductor processing equipment having improved process drift control |
Apr. 19, 2005 |
| 6855621 |
Method of forming silicon-based thin film, method of forming silicon-based semiconductor layer, and photovoltaic element |
Feb. 15, 2005 |
| 6846747 |
Method for etching vias |
Jan. 25, 2005 |
| 6818557 |
Method of forming SiC capped copper interconnects with reduced hillock formation and improved electromigration resistance |
Nov. 16, 2004 |
| 6815340 |
Method of forming an electroless nucleation layer on a via bottom |
Nov. 9, 2004 |
| 6790766 |
Method of fabricating semiconductor device having low dielectric constant insulator film |
Sep. 14, 2004 |
| 6787054 |
Two-stage etching process |
Sep. 7, 2004 |
| 6784007 |
Nano-structures, process for preparing nano-structures and devices |
Aug. 31, 2004 |
| 6780781 |
Method for manufacturing an electronic device |
Aug. 24, 2004 |
| 6777333 |
Method for fabricating semiconductor device |
Aug. 17, 2004 |
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