Resources Contact Us Home
Browse by: INVENTOR PATENT HOLDER PATENT NUMBER DATE
 
 
Browse by Category: Main > Engineering
Class Information
Number: 438/707
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching) > Utilizing electromagnetic or wave energy
Description: Processes wherein the vapor phase etching is conducted using irradiation of electromagnetic or wave energy.










Sub-classes under this class:

Class Number Class Name Patents
438/710 By creating electric field (e.g., plasma, glow discharge, etc.) 1,679
438/708 Photo-induced etching 289
438/733 Using or orientation dependent etchant (i.e., anisotropic etchant) 218


Patents under this class:
1 2 3 4 5 6

Patent Number Title Of Patent Date Issued
8709951 Implementing state-of-the-art gate transistor, sidewall profile/angle control by tuning gate etch process recipe parameters Apr. 29, 2014
8664122 Method of fabricating a semiconductor device Mar. 4, 2014
8658541 Method of controlling trench microloading using plasma pulsing Feb. 25, 2014
8647990 Method of patterning a low-K dielectric film Feb. 11, 2014
8642478 Plasma processing method and plasma processing apparatus Feb. 4, 2014
8633115 Methods for atomic layer etching Jan. 21, 2014
8623765 Processed object processing apparatus, processed object processing method, pressure control method, processed object transfer method, and transfer apparatus Jan. 7, 2014
8609546 Pulsed bias plasma process to control microloading Dec. 17, 2013
8609545 Method to improve mask critical dimension uniformity (CDU) Dec. 17, 2013
8591755 Methods for controlling plasma constituent flux and deposition during semiconductor fabrication and apparatus for implementing the same Nov. 26, 2013
8569177 Plasma processing apparatus and plasma processing method Oct. 29, 2013
8563431 Method for manufacturing semiconductor device Oct. 22, 2013
8546244 Method of manufacturing semiconductor device Oct. 1, 2013
8536059 Equipment and methods for etching of MEMS Sep. 17, 2013
8524607 Anisotropically conductive member and method of manufacture Sep. 3, 2013
8518832 Process for masking and removal of residue from complex shapes Aug. 27, 2013
8513125 Manufacturing a microelectronic device comprising silicon and germanium nanowires integrated on a same substrate Aug. 20, 2013
8501624 Excited gas injection for ion implant control Aug. 6, 2013
8501629 Smooth SiConi etch for silicon-containing films Aug. 6, 2013
8470715 CD bias loading control with ARC layer open Jun. 25, 2013
8461052 Semiconductor device manufacturing method Jun. 11, 2013
8450215 Particle beam systems and methods May. 28, 2013
8445389 Etchant treatment processes for substrate surfaces and chamber surfaces May. 21, 2013
8445390 Patterning of antistiction films for electromechanical systems devices May. 21, 2013
8429808 Method for fabrication an electrical transducer Apr. 30, 2013
8409991 Method for manufacturing large-area vacuum plasma treated substrates and vacuum plasma treatment apparatus Apr. 2, 2013
RE44071 Method for patterning a multilayered conductor/substrate structure Mar. 12, 2013
8338307 Substrate plasma treatment using magnetic mask device Dec. 25, 2012
8329593 Method and apparatus for removing polymer from the wafer backside and edge Dec. 11, 2012
8329586 Method of processing a workpiece in a plasma reactor using feed forward thermal control Dec. 11, 2012
8314033 Method of patterning a low-k dielectric film Nov. 20, 2012
8309456 Method and system for metal barrier and seed integration Nov. 13, 2012
8298955 Plasma etching method Oct. 30, 2012
8293649 Release accumulative charges on wafers using O.sub.2 neutralization Oct. 23, 2012
8288285 Reversible water-free process for the separation of acid-containing gas mixtures Oct. 16, 2012
8278222 Selective etching and formation of xenon difluoride Oct. 2, 2012
8263495 Release accumulative charges by tuning ESC voltages in via-etchers Sep. 11, 2012
8263499 Plasma processing method and computer readable storage medium Sep. 11, 2012
8232207 Substrate processing method Jul. 31, 2012
8211804 Methods of forming a hole having a vertical profile and semiconductor devices having a vertical hole Jul. 3, 2012
8202796 Method of forming vias in silicon carbide and resulting devices and circuits Jun. 19, 2012
8198195 Plasma processing method and plasma processing apparatus Jun. 12, 2012
8193095 Method for forming silicon trench Jun. 5, 2012
8193099 Protecting exposed metal gate structures from etching processes in integrated circuit manufacturing Jun. 5, 2012
8158524 Line width roughness control with arc layer open Apr. 17, 2012
8158525 Plasma etching method and apparatus, and method of manufacturing liquid ejection head Apr. 17, 2012
8153019 Methods for substantially equalizing rates at which material is removed over an area of a structure or film that includes recesses or crevices Apr. 10, 2012
8148269 Boron nitride and boron-nitride derived materials deposition method Apr. 3, 2012
8138096 Plasma etching method Mar. 20, 2012
8097540 Method of opening pad in semiconductor device Jan. 17, 2012

1 2 3 4 5 6










 
 
  Recently Added Patents
Modified and stabilized GDF propeptides and uses thereof
DMAPN having a low DGN content and a process for preparing DMAPA having a low DGN content
Ultrathin fluid-absorbent cores
Conductive polymer and a solid electrolytic capacitor using the same as a solid electrolyte
Using interrupted through-silicon-vias in integrated circuits adapted for stacking
System and method for measuring an analyte in a sample
Near-field optical disk having surface plasmon amplification by stimulated emission of radiation
  Randomly Featured Patents
Communication device
Interface device between pieces of equipment of a plant
Basketball holder
Speed barrier
Heat pack insert
Pneumococcus polysaccharide-related vaccines
Light guide, illuminating device having the light guide, and image reading device and information processing apparatus having the illuminating device
Method for calculating semantic similarities between messages and conversations based on enhanced entity extraction
Insulation displacement terminal for nonmetallic core cable
Apparatus for thermal treatment of thin wafers