| |
 |
|
Class Information
Number: 438/706
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching)
Description: Processes wherein the chemical etchant is in a gaseous state when brought into contact with the semiconductive substrate.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6933189 |
Integration system via metal oxide conversion |
Aug. 23, 2005 |
| 6933224 |
Method of fabricating integrated circuitry |
Aug. 23, 2005 |
| 6933235 |
Method for removing contaminants on a substrate |
Aug. 23, 2005 |
| 6933237 |
Substrate etch method and device |
Aug. 23, 2005 |
| 6933238 |
Method for manufacturing semiconductor device |
Aug. 23, 2005 |
| 6933239 |
Method for removing conductive residue |
Aug. 23, 2005 |
| 6930027 |
Method of manufacturing a semiconductor component |
Aug. 16, 2005 |
| 6930047 |
Dry etching apparatus, etching method, and method of forming a wiring |
Aug. 16, 2005 |
| 6930049 |
Endpoint control for small open area by RF source parameter Vdc |
Aug. 16, 2005 |
| 6926843 |
Etching of hard masks |
Aug. 9, 2005 |
| 6927076 |
Method for recovering a plasma process |
Aug. 9, 2005 |
| 6927171 |
Piezoresistive device and manufacturing processes of this device |
Aug. 9, 2005 |
| 6927172 |
Process to suppress lithography at a wafer edge |
Aug. 9, 2005 |
| 6924205 |
Collar formation using selective SiGe/Si etch |
Aug. 2, 2005 |
| 6924235 |
Sidewall smoothing in high aspect ratio/deep etching using a discrete gas switching method |
Aug. 2, 2005 |
| 6924239 |
Method for removal of hydrocarbon contamination on gate oxide prior to non-thermal nitridation using "spike" radical oxidation |
Aug. 2, 2005 |
| 6921720 |
Plasma treating apparatus and plasma treating method |
Jul. 26, 2005 |
| 6921721 |
Post plasma clean process for a hardmask |
Jul. 26, 2005 |
| 6921725 |
Etching of high aspect ratio structures |
Jul. 26, 2005 |
| 6919278 |
Method for etching silicon carbide |
Jul. 19, 2005 |
| 6919279 |
Endpoint detection for high density plasma (HDP) processes |
Jul. 19, 2005 |
| 6916746 |
Method for plasma etching using periodic modulation of gas chemistry |
Jul. 12, 2005 |
| 6913976 |
Method of manufacturing semiconductor device |
Jul. 5, 2005 |
| 6913994 |
Method to form Cu/OSG dual damascene structure for high performance and reliable interconnects |
Jul. 5, 2005 |
| 6914004 |
Method for via etching in organo-silica-glass |
Jul. 5, 2005 |
| 6914005 |
Plasma etching method |
Jul. 5, 2005 |
| 6911346 |
Method of etching a magnetic material |
Jun. 28, 2005 |
| 6911398 |
Method of sequentially processing a plurality of lots each including semiconductor substrates |
Jun. 28, 2005 |
| 6908566 |
Local dry etching method |
Jun. 21, 2005 |
| 6908864 |
Pressure control method and processing device |
Jun. 21, 2005 |
| 6905621 |
Method for preventing the etch transfer of sidelobes in contact hole patterns |
Jun. 14, 2005 |
| 6905626 |
Notch-free etching of high aspect SOI structures using alternating deposition and etching and pulsed plasma |
Jun. 14, 2005 |
| 6905968 |
Process for selectively etching dielectric layers |
Jun. 14, 2005 |
| 6905969 |
Plasma etch reactor and method |
Jun. 14, 2005 |
| 6905970 |
Method for making a thin film bulk acoustic-wave resonator |
Jun. 14, 2005 |
| 6905971 |
Treatment of dielectric material to enhance etch rate |
Jun. 14, 2005 |
| 6903024 |
Method of manufacturing storage nodes of a semiconductor memory device using a two-step etching process |
Jun. 7, 2005 |
| 6903025 |
Method of purging semiconductor manufacturing apparatus and method of manufacturing semiconductor device |
Jun. 7, 2005 |
| 6899785 |
Method of stabilizing oxide etch and chamber performance using seasoning |
May. 31, 2005 |
| 6899817 |
Device and method for etching a substrate using an inductively coupled plasma |
May. 31, 2005 |
| 6900133 |
Method of etching variable depth features in a crystalline substrate |
May. 31, 2005 |
| 6900136 |
Method for reducing reactive ion etching (RIE) lag in semiconductor fabrication processes |
May. 31, 2005 |
| 6900139 |
Method for photoresist trim endpoint detection |
May. 31, 2005 |
| 6896826 |
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
May. 24, 2005 |
| 6897153 |
Etching gas composition for silicon oxide and method of etching silicon oxide using the same |
May. 24, 2005 |
| 6897154 |
Selective etching of low-k dielectrics |
May. 24, 2005 |
| 6897155 |
Method for etching high-aspect-ratio features |
May. 24, 2005 |
| 6897156 |
Vacuum plasma processor method |
May. 24, 2005 |
| 6893969 |
Use of ammonia for etching organic low-k dielectrics |
May. 17, 2005 |
| 6893970 |
Plasma processing method |
May. 17, 2005 |
|
|
|
