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Class Information
Number: 438/706
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching)
Description: Processes wherein the chemical etchant is in a gaseous state when brought into contact with the semiconductive substrate.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6998348 |
Method for manufacturing electronic circuits integrated on a semiconductor substrate |
Feb. 14, 2006 |
| 6995092 |
Method for manufacturing an electronic device |
Feb. 7, 2006 |
| 6995093 |
Polysilicon etching method |
Feb. 7, 2006 |
| 6992010 |
Gate structure and method of manufacture |
Jan. 31, 2006 |
| 6992011 |
Method and apparatus for removing material from chamber and wafer surfaces by high temperature hydrogen-containing plasma |
Jan. 31, 2006 |
| 6989105 |
Detection of hardmask removal using a selective etch |
Jan. 24, 2006 |
| 6989108 |
Etchant gas composition |
Jan. 24, 2006 |
| 6989228 |
Method and apparatus for processing samples |
Jan. 24, 2006 |
| 6984535 |
Selective etching of a protective layer to form a catalyst layer for an electron-emitting device |
Jan. 10, 2006 |
| 6982227 |
Single and multilevel rework |
Jan. 3, 2006 |
| 6982228 |
Methods of etching a contact opening over a node location on a semiconductor substrate |
Jan. 3, 2006 |
| 6979652 |
Etching multi-shaped openings in silicon |
Dec. 27, 2005 |
| 6977228 |
Semiconductor device using damascene technique and manufacturing method therefor |
Dec. 20, 2005 |
| 6973712 |
Lead plating method for GMR head manufacture |
Dec. 13, 2005 |
| 6974709 |
Method and device for providing a semiconductor etching end point and for detecting the end point |
Dec. 13, 2005 |
| 6972261 |
Method for fabricating fine features by jet-printing and surface treatment |
Dec. 6, 2005 |
| 6972262 |
Method for fabricating semiconductor device with improved tolerance to wet cleaning process |
Dec. 6, 2005 |
| 6969619 |
Full spectrum endpoint detection |
Nov. 29, 2005 |
| 6969629 |
Method for manufacturing micro-structural unit |
Nov. 29, 2005 |
| 6969668 |
Treatment method of film quality for the manufacture of substrates |
Nov. 29, 2005 |
| 6967072 |
Photolithography scheme using a silicon containing resist |
Nov. 22, 2005 |
| 6967167 |
Silicon dioxide removing method |
Nov. 22, 2005 |
| 6967168 |
Method to repair localized amplitude defects in a EUV lithography mask blank |
Nov. 22, 2005 |
| 6967169 |
Aqueous cleaning composition containing copper-specific corrosion inhibitor for cleaning inorganic residues on semiconductor substrate |
Nov. 22, 2005 |
| 6967171 |
Insulation film etching method |
Nov. 22, 2005 |
| 6964927 |
Method and production of a sensor |
Nov. 15, 2005 |
| 6964928 |
Method for removing residue from a magneto-resistive random access memory (MRAM) film stack using a dual mask |
Nov. 15, 2005 |
| 6962878 |
Method to reduce photoresist mask line dimensions |
Nov. 8, 2005 |
| 6960526 |
Method of fabricating sub-100 nanometer field emitter tips comprising group III-nitride semiconductors |
Nov. 1, 2005 |
| 6960527 |
Method for fabricating non-volatile memory device having sidewall gate structure and SONOS cell structure |
Nov. 1, 2005 |
| 6960532 |
Suppressing lithography at a wafer edge |
Nov. 1, 2005 |
| 6958295 |
Method for using a hard mask for critical dimension growth containment |
Oct. 25, 2005 |
| 6958296 |
CVD TiSiN barrier for copper integration |
Oct. 25, 2005 |
| 6955989 |
Use of a U-groove as an alternative to using a V-groove for protection against dicing induced damage in silicon |
Oct. 18, 2005 |
| 6955990 |
Methods for forming a gate in a semiconductor device |
Oct. 18, 2005 |
| 6951786 |
Method of forming a stack of refractory metal nitride over refractory metal silicide over silicon |
Oct. 4, 2005 |
| 6951820 |
Method for using a hard mask for critical dimension growth containment |
Oct. 4, 2005 |
| 6951821 |
Processing system and method for chemically treating a substrate |
Oct. 4, 2005 |
| 6949437 |
Manufacturing method of semiconductor device including an anisotropic etching step |
Sep. 27, 2005 |
| 6946398 |
Method for fabricating a micro machine |
Sep. 20, 2005 |
| 6946399 |
Cleaning system method and apparatus for the manufacture of integrated cicuits |
Sep. 20, 2005 |
| 6946400 |
Patterning method for fabricating integrated circuit |
Sep. 20, 2005 |
| 6946401 |
Plasma treatment for copper oxide reduction |
Sep. 20, 2005 |
| 6942813 |
Method of etching magnetic and ferroelectric materials using a pulsed bias source |
Sep. 13, 2005 |
| 6939472 |
Etching method in fabrications of microstructures |
Sep. 6, 2005 |
| 6939805 |
Method of etching a layer in a trench and method of fabricating a trench capacitor |
Sep. 6, 2005 |
| 6939808 |
Undoped and fluorinated amorphous carbon film as pattern mask for metal etch |
Sep. 6, 2005 |
| 6939809 |
Method for release of surface micromachined structures in an epitaxial reactor |
Sep. 6, 2005 |
| 6936529 |
Method for fabricating gate-electrode of semiconductor device with use of hard mask |
Aug. 30, 2005 |
| 6936544 |
Method of removing metal etching residues following a metal etchback process to improve a CMP process |
Aug. 30, 2005 |
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