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Class Information
Number: 438/706
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching)
Description: Processes wherein the chemical etchant is in a gaseous state when brought into contact with the semiconductive substrate.


Sub-classes under this class:

Class Number Class Name Patents
438/735 Differential etching of semiconductor substrate 236
438/734 Sequential etching steps on a single layer 512
438/707 Utilizing electromagnetic or wave energy 165


Patents under this class:

Patent Number Title Of Patent Date Issued
7025896 Process for treating solid surface and substrate surface Apr. 11, 2006
7026174 Method for reducing wafer arcing Apr. 11, 2006
7026195 Planarizing method for forming FIN-FET device Apr. 11, 2006
7026233 Method for reducing defects in post passivation interconnect process Apr. 11, 2006
7026248 Method for manufacturing semiconductor device with semiconductor region inserted into trench Apr. 11, 2006
7026249 SiGe lattice engineering using a combination of oxidation, thinning and epitaxial regrowth Apr. 11, 2006
7026250 Method for reducing contact resistance of a semiconductor device Apr. 11, 2006
7022537 Liquid crystal display device and fabricating method thereof, and reworking method of alignment film using the same Apr. 4, 2006
7022611 Plasma in-situ treatment of chemically amplified resist Apr. 4, 2006
7022612 Method of removing etch residues Apr. 4, 2006
7022613 Reduced cross-contamination between chambers in a semiconductor processing tool Apr. 4, 2006
7022616 High speed silicon etching method Apr. 4, 2006
7022618 Method of forming a conductive contact Apr. 4, 2006
7022619 Method for fabricating electronic device Apr. 4, 2006
7018926 Method of manufacturing semiconductor device Mar. 28, 2006
7018929 Method for reducing a low volatility byproduct from a wafer surface following an etching process Mar. 28, 2006
7018930 Method for fabricating semiconductor device Mar. 28, 2006
7018931 Method of forming an isolation film in a semiconductor device Mar. 28, 2006
7018934 Methods and apparatus for etching metal layers on substrates Mar. 28, 2006
7018935 Method of forming metal line of semiconductor device Mar. 28, 2006
7014787 Etching method of organic insulating film Mar. 21, 2006
7014788 Surface treatment method and equipment Mar. 21, 2006
7015143 Structure including multiple wire-layers and methods for forming the same Mar. 21, 2006
7015145 Self-aligned collar and strap formation for semiconductor devices Mar. 21, 2006
7012026 Method for producing defined polycrystalline silicon areas in an amorphous silicon layer Mar. 14, 2006
7008877 Etching of chromium layers on photomasks utilizing high density plasma and low frequency RF bias Mar. 7, 2006
7005032 Wafer table for local dry etching apparatus Feb. 28, 2006
7005302 Semiconductor on insulator substrate and devices formed therefrom Feb. 28, 2006
7005305 Signal layer for generating characteristic optical plasma emissions Feb. 28, 2006
7005380 Simultaneous formation of device and backside contacts on wafers having a buried insulator layer Feb. 28, 2006
7001846 High-density SOI cross-point memory array and method for fabricating same Feb. 21, 2006
7001847 Micro pattern forming method and semiconductor device manufacturing method Feb. 21, 2006
6997776 Process for producing a semiconductor wafer Feb. 14, 2006
6998347 Method of reworking layers over substrate Feb. 14, 2006
6998348 Method for manufacturing electronic circuits integrated on a semiconductor substrate Feb. 14, 2006
6995092 Method for manufacturing an electronic device Feb. 7, 2006
6995093 Polysilicon etching method Feb. 7, 2006
6992010 Gate structure and method of manufacture Jan. 31, 2006
6992011 Method and apparatus for removing material from chamber and wafer surfaces by high temperature hydrogen-containing plasma Jan. 31, 2006
6989105 Detection of hardmask removal using a selective etch Jan. 24, 2006
6989108 Etchant gas composition Jan. 24, 2006
6989228 Method and apparatus for processing samples Jan. 24, 2006
6984535 Selective etching of a protective layer to form a catalyst layer for an electron-emitting device Jan. 10, 2006
6982227 Single and multilevel rework Jan. 3, 2006
6982228 Methods of etching a contact opening over a node location on a semiconductor substrate Jan. 3, 2006
6979652 Etching multi-shaped openings in silicon Dec. 27, 2005
6977228 Semiconductor device using damascene technique and manufacturing method therefor Dec. 20, 2005
6973712 Lead plating method for GMR head manufacture Dec. 13, 2005
6974709 Method and device for providing a semiconductor etching end point and for detecting the end point Dec. 13, 2005
6972261 Method for fabricating fine features by jet-printing and surface treatment Dec. 6, 2005



 
 
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