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Class Information
Number: 438/706
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching)
Description: Processes wherein the chemical etchant is in a gaseous state when brought into contact with the semiconductive substrate.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7226867 |
Method of etching a metal layer using a mask, a metallization method for a semiconductor device, a method of etching a metal layer, and an etching gas |
Jun. 5, 2007 |
| 7226836 |
Method of manufacturing substrate for electro-optical device, substrate for electro-optical device, electro-optical device, and electronic apparatus |
Jun. 5, 2007 |
| 7223701 |
In-situ sequential high density plasma deposition and etch processing for gap fill |
May. 29, 2007 |
| 7223700 |
Method for fabricating fine features by jet-printing and surface treatment |
May. 29, 2007 |
| 7223699 |
Plasma etch reactor and method |
May. 29, 2007 |
| 7223661 |
Method of manufacturing semiconductor device |
May. 29, 2007 |
| 7220678 |
Method for etching of a silicon substrate and etching apparatus |
May. 22, 2007 |
| 7220497 |
Yttria-coated ceramic components of semiconductor material processing apparatuses and methods of manufacturing the components |
May. 22, 2007 |
| 7214978 |
Semiconductor fabrication that includes surface tension control |
May. 8, 2007 |
| 7214624 |
Resist pattern forming method, magnetic recording medium manufacturing method and magnetic head manufacturing method |
May. 8, 2007 |
| 7208712 |
Structures and methods for coupling energy from an electromagnetic wave |
Apr. 24, 2007 |
| 7208422 |
Plasma processing method |
Apr. 24, 2007 |
| 7208421 |
Method and apparatus for production of metal film or the like |
Apr. 24, 2007 |
| 7208095 |
Method for fabricating bottom electrodes of stacked capacitor memory cells and method for cleaning and drying a semiconductor wafer |
Apr. 24, 2007 |
| 7205243 |
Process for producing a mask on a substrate |
Apr. 17, 2007 |
| 7205242 |
Method for forming isolation layer in semiconductor device |
Apr. 17, 2007 |
| 7202180 |
Methods of forming semiconductor devices using an etch stop layer |
Apr. 10, 2007 |
| 7202176 |
Enhanced stripping of low-k films using downstream gas mixing |
Apr. 10, 2007 |
| 7202171 |
Method for forming a contact opening in a semiconductor device |
Apr. 10, 2007 |
| 7202170 |
Method of improving etching profile of floating gates for flash memory devices |
Apr. 10, 2007 |
| 7199059 |
Method for removing polymer as etching residue |
Apr. 3, 2007 |
| 7199058 |
Method of manufacturing a semiconductor device and apparatus for manufacturing a semiconductor device |
Apr. 3, 2007 |
| 7196017 |
Method for etching smooth sidewalls in III-V based compounds for electro-optical devices |
Mar. 27, 2007 |
| 7196015 |
Pattern forming method and electric device fabricating method using the same |
Mar. 27, 2007 |
| 7192879 |
Method for manufacturing micro-structural unit |
Mar. 20, 2007 |
| 7192876 |
Transistor with independent gate structures |
Mar. 20, 2007 |
| 7192875 |
Processes for treating morphologically-modified silicon electrode surfaces using gas-phase interhalogens |
Mar. 20, 2007 |
| 7192874 |
Method for reducing foreign material concentrations in etch chambers |
Mar. 20, 2007 |
| 7192531 |
In-situ plug fill |
Mar. 20, 2007 |
| 7189655 |
Method of correcting amplitude defect in multilayer film of EUVL mask |
Mar. 13, 2007 |
| 7189654 |
Manufacturing method for wiring |
Mar. 13, 2007 |
| 7189653 |
Etching method and etching apparatus |
Mar. 13, 2007 |
| 7189332 |
Apparatus and method for detecting an endpoint in a vapor phase etch |
Mar. 13, 2007 |
| 7186659 |
Plasma etching method |
Mar. 6, 2007 |
| 7186658 |
Method and resulting structure for PCMO film to obtain etching rate and mask to selectively by inductively coupled plasma |
Mar. 6, 2007 |
| 7183220 |
Plasma etching methods |
Feb. 27, 2007 |
| 7183219 |
Method of plasma processing |
Feb. 27, 2007 |
| 7183215 |
Etching with electrostatically attracted ions |
Feb. 27, 2007 |
| 7179749 |
Method for fabricating semiconductor device capable of decreasing critical dimension in peripheral region |
Feb. 20, 2007 |
| 7179745 |
Method for offsetting a silicide process from a gate electrode of a semiconductor device |
Feb. 20, 2007 |
| 7179744 |
Method for fabricating semiconductor device |
Feb. 20, 2007 |
| 7176140 |
Adhesion promotion for etch by-products |
Feb. 13, 2007 |
| 7176139 |
Etching method in a semiconductor processing and etching system for performing the same |
Feb. 13, 2007 |
| 7175777 |
Method of forming a sub-micron tip feature |
Feb. 13, 2007 |
| 7173339 |
Semiconductor device having a substrate an undoped silicon oxide structure and an overlaying doped silicon oxide structure with a sidewall terminating at the undoped silicon oxide structure |
Feb. 6, 2007 |
| 7172973 |
System and method for selectively modifying a wet etch rate in a large area |
Feb. 6, 2007 |
| 7172972 |
Semiconductor device manufacture method and etching system |
Feb. 6, 2007 |
| 7172969 |
Method and system for etching a film stack |
Feb. 6, 2007 |
| 7172918 |
Infrared thermopile detector system for semiconductor process monitoring and control |
Feb. 6, 2007 |
| 7169695 |
Method for forming a dual damascene structure |
Jan. 30, 2007 |
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