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Class Information
Number: 438/706
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching)
Description: Processes wherein the chemical etchant is in a gaseous state when brought into contact with the semiconductive substrate.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6426300 |
Method for fabricating semiconductor device by using etching polymer |
Jul. 30, 2002 |
| 6426301 |
Reduction of via etch charging damage through the use of a conducting hard mask |
Jul. 30, 2002 |
| 6420273 |
Self-aligned etch-stop layer formation for semiconductor devices |
Jul. 16, 2002 |
| 6420274 |
Method for conditioning process chambers |
Jul. 16, 2002 |
| 6420280 |
Method and system for reducing ARC layer removal by providing a capping layer for the ARC layer |
Jul. 16, 2002 |
| 6417109 |
Chemical-mechanical etch (CME) method for patterned etching of a substrate surface |
Jul. 9, 2002 |
| 6410422 |
Method of forming a local interconnect contact opening |
Jun. 25, 2002 |
| 6410447 |
Process for removing photoresist material |
Jun. 25, 2002 |
| 6410448 |
Plasma etch reactor and method for emerging films |
Jun. 25, 2002 |
| 6410449 |
Method of processing a workpiece using an externally excited torroidal plasma source |
Jun. 25, 2002 |
| 6407003 |
Fabrication process of semiconductor device with titanium film |
Jun. 18, 2002 |
| 6406836 |
Method of stripping photoresist using re-coating material |
Jun. 18, 2002 |
| 6403385 |
Method of inspecting a semiconductor wafer for defects |
Jun. 11, 2002 |
| 6403487 |
Method of forming separated spacer structures in mixed-mode integrated circuits |
Jun. 11, 2002 |
| 6403488 |
Selective SAC etch process |
Jun. 11, 2002 |
| 6403489 |
Method for removing polymer stacked on a lower electrode within an etching reaction chamber |
Jun. 11, 2002 |
| 6399505 |
Method and system for copper interconnect formation |
Jun. 4, 2002 |
| 6399506 |
Method for planarizing an oxide layer |
Jun. 4, 2002 |
| 6399507 |
Stable plasma process for etching of films |
Jun. 4, 2002 |
| 6399508 |
Method for metal etch using a dielectric hard mask |
Jun. 4, 2002 |
| 6399509 |
Defects reduction for a metal etcher |
Jun. 4, 2002 |
| 6395347 |
Micromachining method for workpiece observation |
May. 28, 2002 |
| 6395637 |
Method for fabricating a inductor of low parasitic resistance and capacitance |
May. 28, 2002 |
| 6395638 |
Method for producing a micromembrane pump body |
May. 28, 2002 |
| 6395639 |
Process for improving line width variations between tightly spaced and isolated features in integrated circuits |
May. 28, 2002 |
| 6395640 |
Apparatus and method for selectivity restricting process fluid flow in semiconductor processing |
May. 28, 2002 |
| 6396023 |
Airtight sealing method and airtight sealing apparatus for semiconductor laser element |
May. 28, 2002 |
| 6391116 |
Semiconductor device manufacturing apparatus and semiconductor device manufacturing method |
May. 21, 2002 |
| 6391220 |
Methods for fabricating flexible circuit structures |
May. 21, 2002 |
| 6391741 |
Fabrication process for microstructure protection systems related to hard disk reading unit |
May. 21, 2002 |
| 6391786 |
Etching process for organic anti-reflective coating |
May. 21, 2002 |
| 6392270 |
Semiconductor device and method for manufacturing the device |
May. 21, 2002 |
| 6383938 |
Method of anisotropic etching of substrates |
May. 7, 2002 |
| 6383939 |
Method for etching memory gate stack using thin resist layer |
May. 7, 2002 |
| 6380090 |
Protecting method applied to the semiconductor manufacturing process |
Apr. 30, 2002 |
| 6380091 |
Dual damascene arrangement for metal interconnection with oxide dielectric layer and low K dielectric constant layer |
Apr. 30, 2002 |
| 6380092 |
Gas phase planarization process for semiconductor wafers |
Apr. 30, 2002 |
| 6380103 |
Rapid thermal etch and rapid thermal oxidation |
Apr. 30, 2002 |
| 6376353 |
Aluminum and copper bimetallic bond pad scheme for copper damascene interconnects |
Apr. 23, 2002 |
| 6376365 |
Method for fabricating semiconductor devices |
Apr. 23, 2002 |
| 6376383 |
Method for etching silicon layer |
Apr. 23, 2002 |
| 6376384 |
Multiple etch contact etching method incorporating post contact etch etching |
Apr. 23, 2002 |
| 6372523 |
Etching method and etching device |
Apr. 16, 2002 |
| 6372634 |
Plasma etch chemistry and method of improving etch control |
Apr. 16, 2002 |
| 6372650 |
Method of cleaning substrate and method of manufacturing semiconductor device |
Apr. 16, 2002 |
| 6372651 |
Method for trimming a photoresist pattern line for memory gate etching |
Apr. 16, 2002 |
| 6372652 |
Method for forming a thin-film, electrically blowable fuse with a reproducible blowing wattage |
Apr. 16, 2002 |
| 6372653 |
Method of forming dual damascene structure |
Apr. 16, 2002 |
| 6368971 |
Method of manufacturing bottom electrode of capacitor |
Apr. 9, 2002 |
| 6368972 |
Method for making an integrated circuit including alignment marks |
Apr. 9, 2002 |
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