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Class Information
Number: 438/706
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching)
Description: Processes wherein the chemical etchant is in a gaseous state when brought into contact with the semiconductive substrate.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6656847 |
Method for etching silicon nitride selective to titanium silicide |
Dec. 2, 2003 |
| 6656894 |
Method for cleaning etcher parts |
Dec. 2, 2003 |
| 6653227 |
Method of cobalt silicidation using an oxide-Titanium interlayer |
Nov. 25, 2003 |
| 6653237 |
High resist-selectivity etch for silicon trench etch applications |
Nov. 25, 2003 |
| 6649075 |
Method and apparatus for measuring etch uniformity of a semiconductor wafer |
Nov. 18, 2003 |
| 6649082 |
Harm-removing agent and method for rendering halogen-containing gas harmless and uses thereof |
Nov. 18, 2003 |
| 6649514 |
EEPROM device having improved data retention and process for fabricating the device |
Nov. 18, 2003 |
| 6649527 |
Method of etching a substrate |
Nov. 18, 2003 |
| 6649528 |
Local dry etching method |
Nov. 18, 2003 |
| 6649533 |
Method and apparatus for forming an under bump metallurgy layer |
Nov. 18, 2003 |
| 6645822 |
Method for manufacturing a semiconductor circuit system |
Nov. 11, 2003 |
| 6645870 |
Process for fabricating semiconductor device |
Nov. 11, 2003 |
| 6642151 |
Techniques for plasma etching silicon-germanium |
Nov. 4, 2003 |
| 6642153 |
Method for avoiding unetched polymer residue in anisotropically etched semiconductor features |
Nov. 4, 2003 |
| 6638869 |
Process for manufacturing reflective TFT-LCD with rough diffuser |
Oct. 28, 2003 |
| 6638873 |
Semiconductor device producing method |
Oct. 28, 2003 |
| 6638874 |
Methods used in fabricating gates in integrated circuit device structures |
Oct. 28, 2003 |
| 6635335 |
Etching methods and apparatus and substrate assemblies produced therewith |
Oct. 21, 2003 |
| 6635577 |
Method for reducing topography dependent charging effects in a plasma enhanced semiconductor wafer processing system |
Oct. 21, 2003 |
| 6635578 |
Method of operating a dual chamber reactor with neutral density decoupled from ion density |
Oct. 21, 2003 |
| 6635579 |
Operating method of a semiconductor etcher |
Oct. 21, 2003 |
| 6635580 |
Apparatus and method for controlling wafer temperature in a plasma etcher |
Oct. 21, 2003 |
| 6632741 |
Self-trimming method on looped patterns |
Oct. 14, 2003 |
| 6632746 |
Etching method, semiconductor and fabricating method for the same |
Oct. 14, 2003 |
| 6627540 |
Method for forming dual damascene structure in semiconductor device |
Sep. 30, 2003 |
| 6627548 |
Process for treating semiconductor substrates |
Sep. 30, 2003 |
| 6627553 |
Composition for removing side wall and method of removing side wall |
Sep. 30, 2003 |
| 6624080 |
Method of fabricating nickel etching mask |
Sep. 23, 2003 |
| 6620735 |
Method for processing substrates |
Sep. 16, 2003 |
| 6617186 |
Method for producing electroluminescent element |
Sep. 9, 2003 |
| 6617207 |
Method and system for forming a stacked gate insulating film |
Sep. 9, 2003 |
| 6617253 |
Plasma etching method using polymer deposition and method of forming contact hole using the plasma etching method |
Sep. 9, 2003 |
| 6617255 |
Plasma processing method for working the surface of semiconductor devices |
Sep. 9, 2003 |
| 6613242 |
Process for treating solid surface and substrate surface |
Sep. 2, 2003 |
| 6613680 |
Method of manufacturing a semiconductor device |
Sep. 2, 2003 |
| 6613681 |
Method of removing etch residues |
Sep. 2, 2003 |
| 6613682 |
Method for in situ removal of a dielectric antireflective coating during a gate etch process |
Sep. 2, 2003 |
| 6613683 |
Method of manufacturing a contact hole of a semiconductor device |
Sep. 2, 2003 |
| 6613684 |
Semiconductor device and method for forming contact holes in a semiconductor device |
Sep. 2, 2003 |
| 6613689 |
Magnetically enhanced plasma oxide etch using hexafluorobutadiene |
Sep. 2, 2003 |
| 6613690 |
Approach for forming a buried stack capacitor structure featuring reduced polysilicon stringers |
Sep. 2, 2003 |
| 6613692 |
Substrate processing method and apparatus |
Sep. 2, 2003 |
| 6607985 |
Gate stack and etch process |
Aug. 19, 2003 |
| 6607986 |
Dry etching method and semiconductor device manufacturing method |
Aug. 19, 2003 |
| 6605227 |
Method of manufacturing a ridge-shaped three dimensional waveguide |
Aug. 12, 2003 |
| 6605541 |
Pitch reduction using a set of offset masks |
Aug. 12, 2003 |
| 6605542 |
Manufacturing method of semiconductor devices by using dry etching technology |
Aug. 12, 2003 |
| 6602793 |
Pre-clean chamber |
Aug. 5, 2003 |
| 6599839 |
Plasma etch process for nonhomogenous film |
Jul. 29, 2003 |
| 6599841 |
Method for manufacturing a semiconductor device |
Jul. 29, 2003 |
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