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Class Information
Number: 438/706
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching)
Description: Processes wherein the chemical etchant is in a gaseous state when brought into contact with the semiconductive substrate.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6841484 |
Method of fabricating a magneto-resistive random access memory (MRAM) device |
Jan. 11, 2005 |
| 6841847 |
3-D spiral stacked inductor on semiconductor material |
Jan. 11, 2005 |
| 6838010 |
System and method for wafer-based controlled patterning of features with critical dimensions |
Jan. 4, 2005 |
| 6838386 |
Method for precision-processing a fine structure |
Jan. 4, 2005 |
| 6835665 |
Etching method of hardly-etched material and semiconductor fabricating method and apparatus using the method |
Dec. 28, 2004 |
| 6833232 |
Micro-pattern forming method for semiconductor device |
Dec. 21, 2004 |
| 6830950 |
Integrated method for release and passivation of MEMS structures |
Dec. 14, 2004 |
| 6831007 |
Method for forming metal line of Al/Cu structure |
Dec. 14, 2004 |
| 6831018 |
Method for fabricating semiconductor device |
Dec. 14, 2004 |
| 6828229 |
Method of manufacturing interconnection line in semiconductor device |
Dec. 7, 2004 |
| 6828241 |
Efficient cleaning by secondary in-situ activation of etch precursor from remote plasma source |
Dec. 7, 2004 |
| 6828242 |
Method for manufacturing semiconductor integrated circuit device |
Dec. 7, 2004 |
| 6828243 |
Apparatus and method for plasma treatment |
Dec. 7, 2004 |
| 6828244 |
Method and apparatus for high density nanostructures |
Dec. 7, 2004 |
| 6828249 |
System and method for enhanced monitoring of an etch process |
Dec. 7, 2004 |
| 6828252 |
Method of etching a contact opening |
Dec. 7, 2004 |
| 6825118 |
Method of manufacturing semiconductor device having trench element-isolating structure |
Nov. 30, 2004 |
| 6825125 |
Thin-film-transistor-array substrate, thin-film-transistor-array fabrication method, and display device |
Nov. 30, 2004 |
| 6825127 |
Micro-fluidic devices |
Nov. 30, 2004 |
| 6821451 |
Dry etching method, microfabrication process and dry etching mask |
Nov. 23, 2004 |
| 6821880 |
Process of dual or single damascene utilizing separate etching and DCM apparati |
Nov. 23, 2004 |
| 6821903 |
Method for making an integrated optical circuit |
Nov. 23, 2004 |
| 6821904 |
Method of blocking nitrogen from thick gate oxide during dual gate CMP |
Nov. 23, 2004 |
| 6821905 |
Method for avoiding carbon and nitrogen contamination of a dielectric insulating layer |
Nov. 23, 2004 |
| 6818141 |
Application of the CVD bilayer ARC as a hard mask for definition of the subresolution trench features between polysilicon wordlines |
Nov. 16, 2004 |
| 6818493 |
Selective metal oxide removal performed in a reaction chamber in the absence of RF activation |
Nov. 16, 2004 |
| 6818526 |
Method for moat nitride pull back for shallow trench isolation |
Nov. 16, 2004 |
| 6818560 |
Plasma processing apparatus and plasma processing method |
Nov. 16, 2004 |
| 6818561 |
Control methodology using optical emission spectroscopy derived data, system for performing same |
Nov. 16, 2004 |
| 6815299 |
Method for manufacturing silicon carbide device using water rich anneal |
Nov. 9, 2004 |
| 6815355 |
Method of integrating L-shaped spacers in a high performance CMOS process via use of an oxide-nitride-doped oxide spacer |
Nov. 9, 2004 |
| 6815359 |
Process for improving the etch stability of ultra-thin photoresist |
Nov. 9, 2004 |
| 6815360 |
Silicon micro-machined projection with duct |
Nov. 9, 2004 |
| 6815361 |
Method of fabricating anti-stiction micromachined structures |
Nov. 9, 2004 |
| 6815362 |
End point determination of process residues in wafer-less auto clean process using optical emission spectroscopy |
Nov. 9, 2004 |
| 6812044 |
Advanced control for plasma process |
Nov. 2, 2004 |
| 6812147 |
GCIB processing to improve interconnection vias and improved interconnection via |
Nov. 2, 2004 |
| 6812151 |
Method of etching |
Nov. 2, 2004 |
| 6812152 |
Method to obtain contamination free laser mirrors and passivation of these |
Nov. 2, 2004 |
| 6812153 |
Method for high aspect ratio HDP CVD gapfill |
Nov. 2, 2004 |
| 6809034 |
Method of etching metallic thin film on thin film resistor |
Oct. 26, 2004 |
| 6806164 |
Semiconductor apparatus and method for fabricating the same |
Oct. 19, 2004 |
| 6806197 |
Method of forming integrated circuitry, and method of forming a contact opening |
Oct. 19, 2004 |
| 6806198 |
Gas-assisted etch with oxygen |
Oct. 19, 2004 |
| 6806199 |
Method for manufacturing silicon mirror wafer, silicon mirror wafer, and heat treatment furnace |
Oct. 19, 2004 |
| 6803267 |
Silicon containing material for patterning polymeric memory element |
Oct. 12, 2004 |
| 6800210 |
Method for making a micromechanical device by removing a sacrificial layer with multiple sequential etchants |
Oct. 5, 2004 |
| 6800559 |
Method and apparatus for generating H20 to be used in a wet oxidation process to form SiO2 on a silicon surface |
Oct. 5, 2004 |
| 6800565 |
Method of forming thin oxidation layer by cluster ion beam |
Oct. 5, 2004 |
| 6797629 |
Method of manufacturing nano transistors |
Sep. 28, 2004 |
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