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Class Information
Number: 438/706
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching)
Description: Processes wherein the chemical etchant is in a gaseous state when brought into contact with the semiconductive substrate.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6890859 |
Methods of forming semiconductor structures having reduced defects, and articles and devices formed thereby |
May. 10, 2005 |
| 6890860 |
Method for etching and/or patterning a silicon-containing layer |
May. 10, 2005 |
| 6890861 |
Semiconductor processing equipment having improved particle performance |
May. 10, 2005 |
| 6890862 |
Processes for vacuum treating workpieces, and corresponding process equipment |
May. 10, 2005 |
| 6887340 |
Etch rate uniformity |
May. 3, 2005 |
| 6887793 |
Method for plasma etching a wafer after backside grinding |
May. 3, 2005 |
| 6884365 |
Gas for plasma reaction and method for production thereof |
Apr. 26, 2005 |
| 6884730 |
Method of etching a film of magnetic material and method of manufacturing a thin-film magnetic head |
Apr. 26, 2005 |
| 6881608 |
Semiconductor processing equipment having improved process drift control |
Apr. 19, 2005 |
| 6881677 |
Method for making a micro-fluid ejection device |
Apr. 19, 2005 |
| 6878297 |
Method of producing organic light-emissive devices |
Apr. 12, 2005 |
| 6878635 |
Dry etching |
Apr. 12, 2005 |
| 6878636 |
Method for enhancing substrate processing |
Apr. 12, 2005 |
| 6879109 |
Thin magnetron structures for plasma generation in ion implantation systems |
Apr. 12, 2005 |
| 6875698 |
Dry etching method |
Apr. 5, 2005 |
| 6875699 |
Method for patterning multilevel interconnects |
Apr. 5, 2005 |
| 6875700 |
Ion-Ion plasma processing with bias modulation synchronized to time-modulated discharges |
Apr. 5, 2005 |
| 6872655 |
Method of forming an integrated circuit thin film resistor |
Mar. 29, 2005 |
| 6872668 |
Multi-step tungsten etchback process to preserve barrier integrity in an integrated circuit structure |
Mar. 29, 2005 |
| 6869868 |
Method of fabricating a MOSFET device with metal containing gate structures |
Mar. 22, 2005 |
| 6869879 |
Method for forming conductive interconnects |
Mar. 22, 2005 |
| 6869880 |
In situ application of etch back for improved deposition into high-aspect-ratio features |
Mar. 22, 2005 |
| 6869885 |
Method for a tungsten silicide etch |
Mar. 22, 2005 |
| 6869888 |
E-beam flood exposure of spin-on material to eliminate voids in vias |
Mar. 22, 2005 |
| 6867144 |
Apparatus and method for plasma processing high-speed semiconductor circuits with increased yield |
Mar. 15, 2005 |
| 6867145 |
Method for fabricating semiconductor device using photoresist pattern formed with argon fluoride laser |
Mar. 15, 2005 |
| 6864176 |
Fabrication process for bonded wafer precision layer thickness control and its non-destructive measurement method |
Mar. 8, 2005 |
| 6864182 |
Method of producing large-area membrane masks by dry etching |
Mar. 8, 2005 |
| 6861358 |
Deposition mask and method of preparing the same |
Mar. 1, 2005 |
| 6861362 |
Self-aligned contact process implementing bias compensation etch endpoint detection and methods for implementing the same |
Mar. 1, 2005 |
| 6861363 |
Method of making multilevel MEMS structures |
Mar. 1, 2005 |
| 6858543 |
Method of forming tunnel oxide film in semiconductor device |
Feb. 22, 2005 |
| 6855633 |
Method for fabricating semiconductor device |
Feb. 15, 2005 |
| 6855637 |
Method for manufacturing surface acoustic wave device |
Feb. 15, 2005 |
| 6855641 |
CMOS transistor having different PMOS and NMOS gate electrode structures and method of fabrication thereof |
Feb. 15, 2005 |
| 6852636 |
Insitu post etch process to remove remaining photoresist and residual sidewall passivation |
Feb. 8, 2005 |
| 6852637 |
Method of etching a mask layer and a protecting layer for metal contact windows |
Feb. 8, 2005 |
| 6849554 |
Method of etching a deep trench having a tapered profile in silicon |
Feb. 1, 2005 |
| 6846745 |
High-density plasma process for filling high aspect ratio structures |
Jan. 25, 2005 |
| 6846746 |
Method of smoothing a trench sidewall after a deep trench silicon etch process |
Jan. 25, 2005 |
| 6844264 |
Dry etching method |
Jan. 18, 2005 |
| 6844265 |
Etching method |
Jan. 18, 2005 |
| 6841082 |
Method of manufacturing Er-doped silicon nano-dot array and laser ablation appparatus used therein |
Jan. 11, 2005 |
| 6841481 |
Etching process for a two-layer metallization |
Jan. 11, 2005 |
| 6841484 |
Method of fabricating a magneto-resistive random access memory (MRAM) device |
Jan. 11, 2005 |
| 6841847 |
3-D spiral stacked inductor on semiconductor material |
Jan. 11, 2005 |
| 6838010 |
System and method for wafer-based controlled patterning of features with critical dimensions |
Jan. 4, 2005 |
| 6838386 |
Method for precision-processing a fine structure |
Jan. 4, 2005 |
| 6835665 |
Etching method of hardly-etched material and semiconductor fabricating method and apparatus using the method |
Dec. 28, 2004 |
| 6833232 |
Micro-pattern forming method for semiconductor device |
Dec. 21, 2004 |
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