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Class Information
Number: 438/706
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching)
Description: Processes wherein the chemical etchant is in a gaseous state when brought into contact with the semiconductive substrate.

Sub-classes under this class:

Class Number Class Name Patents
438/735 Differential etching of semiconductor substrate 363
438/734 Sequential etching steps on a single layer 695
438/707 Utilizing electromagnetic or wave energy 251

Patents under this class:

Patent Number Title Of Patent Date Issued
8709957 Spalling utilizing stressor layer portions Apr. 29, 2014
8709950 Silicon carbide substrate, epitaxial wafer and manufacturing method of silicon carbide substrate Apr. 29, 2014
8709949 System and method for removing oxide from a sensor clip assembly Apr. 29, 2014
8709919 Method for the synthesis of an array of metal nanowire capable of supporting localized plasmon resonances and photonic device comprising said array Apr. 29, 2014
8703619 Taper-etching method and method of manufacturing near-field light generator Apr. 22, 2014
8703617 Method for planarizing interlayer dielectric layer Apr. 22, 2014
8703605 High yield and high throughput method for the manufacture of integrated circuit devices of improved integrity, performance and reliability Apr. 22, 2014
8703591 Method for fabricating black silicon by using plasma immersion ion implantation Apr. 22, 2014
8703000 Slimming method of carbon-containing thin film and oxidation apparatus Apr. 22, 2014
8692339 Micromechanical component having a rear volume Apr. 8, 2014
8691701 Strip with reduced low-K dielectric damage Apr. 8, 2014
8685266 Monocyclic high aspect ratio titanium inductively coupled plasma deep etching processes and products so produced Apr. 1, 2014
8679985 Dry etching method for silicon nitride film Mar. 25, 2014
8679983 Selective suppression of dry-etch rate of materials containing both silicon and nitrogen Mar. 25, 2014
8679982 Selective suppression of dry-etch rate of materials containing both silicon and oxygen Mar. 25, 2014
8679981 Method for self-aligned doubled patterning lithography Mar. 25, 2014
8679975 Method for forming trenches in a semiconductor component Mar. 25, 2014
8679358 Plasma etching method and computer-readable storage medium Mar. 25, 2014
8673766 Methods of forming copper-based conductive structures by forming a copper-based seed layer having an as-deposited thickness profile and thereafter performing an etching process and electroless Mar. 18, 2014
8673166 Plasma processing apparatus and plasma processing method Mar. 18, 2014
8673162 Methods for substrate surface planarization during magnetic patterning by plasma immersion ion implantation Mar. 18, 2014
8669190 Method for manufacturing semiconductor device and semiconductor wafer Mar. 11, 2014
8669187 Porous lift-off layer for selective removal of deposited films Mar. 11, 2014
8664124 Method for etching organic hardmasks Mar. 4, 2014
8664122 Method of fabricating a semiconductor device Mar. 4, 2014
8664092 Method for cleaning silicon wafer, and method for producing epitaxial wafer using the cleaning method Mar. 4, 2014
8664040 Exposing connectors in packages through selective treatment Mar. 4, 2014
8658540 Methods for low temperature conditioning of process chambers Feb. 25, 2014
8658534 Method for producing a semiconductor component, and semiconductor component Feb. 25, 2014
8658048 Method of manufacturing magnetic recording medium Feb. 25, 2014
8657961 Method for UV based silylation chamber clean Feb. 25, 2014
8652970 Vacuum processing method and vacuum processing apparatus Feb. 18, 2014
8652926 Methods of forming capacitors Feb. 18, 2014
8647991 Method for forming dual damascene opening Feb. 11, 2014
8647990 Method of patterning a low-K dielectric film Feb. 11, 2014
8647521 Method of forming micro pattern of semiconductor device Feb. 11, 2014
8642480 Adjusting substrate temperature to improve CD uniformity Feb. 4, 2014
8642478 Plasma processing method and plasma processing apparatus Feb. 4, 2014
8642477 Method for clearing native oxide Feb. 4, 2014
8642473 Methods for contact clean Feb. 4, 2014
8641916 Plasma etching apparatus, plasma etching method and storage medium Feb. 4, 2014
8636911 Process for MEMS scanning mirror with mass remove from mirror backside Jan. 28, 2014
8633116 Dry etching method Jan. 21, 2014
8633115 Methods for atomic layer etching Jan. 21, 2014
8632687 Method for electron beam induced etching of layers contaminated with gallium Jan. 21, 2014
8623765 Processed object processing apparatus, processed object processing method, pressure control method, processed object transfer method, and transfer apparatus Jan. 7, 2014
8623230 Methods and systems for removing a material from a sample Jan. 7, 2014
8617411 Methods and apparatus for atomic layer etching Dec. 31, 2013
8613862 Method for manufacturing liquid discharge head substrate Dec. 24, 2013
8609547 Plasma etching method and computer-readable storage medium Dec. 17, 2013

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