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Class Information
Number: 438/706
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching)
Description: Processes wherein the chemical etchant is in a gaseous state when brought into contact with the semiconductive substrate.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7615163 |
Film formation apparatus and method of using the same |
Nov. 10, 2009 |
| 7611993 |
Plasma processing method and plasma processing apparatus |
Nov. 3, 2009 |
| 7608545 |
Semiconductor device |
Oct. 27, 2009 |
| 7608539 |
ALD method and apparatus |
Oct. 27, 2009 |
| 7605089 |
Method of manufacturing an electronic device |
Oct. 20, 2009 |
| 7605088 |
Method of uniformly etching refractory metals, refractory metal alloys and refractory metal silicides |
Oct. 20, 2009 |
| 7605076 |
Method of manufacturing a semiconductor device from which damage layers and native oxide films in connection holes have been removed |
Oct. 20, 2009 |
| 7601645 |
Methods for fabricating device features having small dimensions |
Oct. 13, 2009 |
| 7601641 |
Two step optical planarizing layer etch |
Oct. 13, 2009 |
| 7598178 |
Carbon precursors for use during silicon epitaxial film formation |
Oct. 6, 2009 |
| 7598177 |
Methods of filling trenches using high-density plasma deposition (HDP) |
Oct. 6, 2009 |
| 7595206 |
Manufacturing method for semiconductor light emitting device |
Sep. 29, 2009 |
| 7595005 |
Method and apparatus for ashing a substrate using carbon dioxide |
Sep. 29, 2009 |
| 7592261 |
Method for suppressing charging of component in vacuum processing chamber of plasma processing system and plasma processing system |
Sep. 22, 2009 |
| 7585780 |
Method for manufacturing semiconductor device |
Sep. 8, 2009 |
| 7585779 |
Fabrication method of semiconductor device |
Sep. 8, 2009 |
| 7585778 |
Method of etching an organic low-k dielectric material |
Sep. 8, 2009 |
| 7585776 |
Dry etching method of insulating film |
Sep. 8, 2009 |
| 7585775 |
System and method for faceting a masking layer in a plasma etch to slope a feature edge |
Sep. 8, 2009 |
| 7585774 |
Method for fabricating metal line of semiconductor device |
Sep. 8, 2009 |
| 7585685 |
Method of determining wafer voltage in a plasma reactor from applied bias voltage and current and a pair of constants |
Sep. 8, 2009 |
| 7582567 |
Method for forming CMOS device with self-aligned contacts and region formed using salicide process |
Sep. 1, 2009 |
| 7582532 |
Method for fabricating semiconductor device |
Sep. 1, 2009 |
| 7578945 |
Method and apparatus for tuning a set of plasma processing steps |
Aug. 25, 2009 |
| 7573116 |
Etch aided by electrically shorting upper and lower sidewall portions during the formation of a semiconductor device |
Aug. 11, 2009 |
| 7572736 |
Method of dry-etching semiconductor devices |
Aug. 11, 2009 |
| 7572732 |
Method to modulate etch rate in SLAM |
Aug. 11, 2009 |
| 7566664 |
Selective etching of MEMS using gaseous halides and reactive co-etchants |
Jul. 28, 2009 |
| 7566660 |
Semiconductor device and method for manufacturing the same |
Jul. 28, 2009 |
| 7566596 |
Method of manufacturing a thin film transistor substrate and stripping composition |
Jul. 28, 2009 |
| 7566574 |
Method of performing a double-sided process |
Jul. 28, 2009 |
| 7563723 |
Critical dimension control for integrated circuits |
Jul. 21, 2009 |
| 7563721 |
Method for fabricating semiconductor device capable of decreasing critical dimension in peripheral region |
Jul. 21, 2009 |
| 7563382 |
Mask and method of fabricating the same, and method of machining material |
Jul. 21, 2009 |
| 7563379 |
Dry etching method and photonic crystal device fabricated by use of the same |
Jul. 21, 2009 |
| 7560391 |
Forming of trenches or wells having different destinations in a semiconductor substrate |
Jul. 14, 2009 |
| 7560389 |
Method for fabricating semiconductor element |
Jul. 14, 2009 |
| 7560386 |
Method of manufacturing nonvolatile semiconductor memory device |
Jul. 14, 2009 |
| 7553769 |
Method for treating a dielectric film |
Jun. 30, 2009 |
| 7553761 |
Method of fabricating semiconductor device |
Jun. 30, 2009 |
| 7553679 |
Method of determining plasma ion density, wafer voltage, etch rate and wafer current from applied bias voltage and current |
Jun. 30, 2009 |
| 7547627 |
Method for manufacturing semiconductor device |
Jun. 16, 2009 |
| 7547621 |
LPCVD gate hard mask |
Jun. 16, 2009 |
| 7544531 |
Ground strap for suppressing stiction during MEMS fabrication |
Jun. 9, 2009 |
| 7541289 |
Process for removing high stressed film using LF or HF bias power and capacitively coupled VHF source power with enhanced residue capture |
Jun. 2, 2009 |
| 7541270 |
Methods for forming openings in doped silicon dioxide |
Jun. 2, 2009 |
| 7540971 |
Plasma etch process using polymerizing etch gases across a wafer surface and additional polymer managing or controlling gases in independently fed gas zones with time and spatial modulation of |
Jun. 2, 2009 |
| 7538377 |
Semiconductor memory device |
May. 26, 2009 |
| 7538038 |
Method of removing resist, semiconductor device thereby and method of manufacturing a semiconductor device |
May. 26, 2009 |
| 7538028 |
Barrier layer, IC via, and IC line forming methods |
May. 26, 2009 |
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