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Class Information
Number: 438/706
Name: Semiconductor device manufacturing: process > Chemical etching > Vapor phase etching (i.e., dry etching)
Description: Processes wherein the chemical etchant is in a gaseous state when brought into contact with the semiconductive substrate.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7371263 |
Plasmaless dry contact cleaning method using interhalogen compounds |
May. 13, 2008 |
| 7368394 |
Etch methods to form anisotropic features for high aspect ratio applications |
May. 6, 2008 |
| 7368393 |
Chemical oxide removal of plasma damaged SiCOH low k dielectrics |
May. 6, 2008 |
| 7368392 |
Method of fabricating a gate structure of a field effect transistor having a metal-containing gate electrode |
May. 6, 2008 |
| 7368064 |
Cleaning solution and manufacturing method for semiconductor device |
May. 6, 2008 |
| 7365018 |
Fabrication of semiconductor device for flash memory with increased select gate width |
Apr. 29, 2008 |
| 7365017 |
Method for finishing metal line for semiconductor device |
Apr. 29, 2008 |
| 7365016 |
Anhydrous HF release of process for MEMS devices |
Apr. 29, 2008 |
| 7364960 |
Methods for fabricating solid state image sensor devices having non-planar transistors |
Apr. 29, 2008 |
| 7361916 |
Coupled nano-resonating energy emitting structures |
Apr. 22, 2008 |
| 7361609 |
Mask patterns for semiconductor device fabrication and related methods |
Apr. 22, 2008 |
| 7361605 |
System and method for removal of photoresist and residues following contact etch with a stop layer present |
Apr. 22, 2008 |
| 7361604 |
Method for reducing dimensions between patterns on a hardmask |
Apr. 22, 2008 |
| 7361287 |
Method for etching structures in an etching body by means of a plasma |
Apr. 22, 2008 |
| 7358193 |
Apparatus for forming nanoholes and method for forming nanoholes |
Apr. 15, 2008 |
| 7358192 |
Method and apparatus for in-situ film stack processing |
Apr. 15, 2008 |
| 7357876 |
Eliminating printability of sub-resolution defects in imprint lithography |
Apr. 15, 2008 |
| 7354865 |
Method for removal of pattern resist over patterned metal having an underlying spacer layer |
Apr. 8, 2008 |
| 7354864 |
Method of producing semiconductor device |
Apr. 8, 2008 |
| 7354525 |
Specimen surface processing apparatus and surface processing method |
Apr. 8, 2008 |
| 7351664 |
Methods for minimizing mask undercuts and notches for plasma processing system |
Apr. 1, 2008 |
| 7351663 |
Removing whisker defects |
Apr. 1, 2008 |
| 7351643 |
Method of manufacturing a semiconductor device |
Apr. 1, 2008 |
| 7348231 |
Methods of fabricating semiconductor devices having insulating layers with differing compressive stresses |
Mar. 25, 2008 |
| 7344993 |
Low-pressure removal of photoresist and etch residue |
Mar. 18, 2008 |
| 7344992 |
Method for forming via hole and trench for dual damascene interconnection |
Mar. 18, 2008 |
| 7344991 |
Method and apparatus for multilayer photoresist dry development |
Mar. 18, 2008 |
| 7344955 |
Cut-and-paste imprint lithographic mold and method therefor |
Mar. 18, 2008 |
| 7344906 |
Structure and method for releasing stressy metal films |
Mar. 18, 2008 |
| 7344652 |
Plasma etching method |
Mar. 18, 2008 |
| 7341956 |
Disposable hard mask for forming bit lines |
Mar. 11, 2008 |
| 7341954 |
Method and apparatus for determining an operation status of a plasma processing apparatus, program and storage medium storing same |
Mar. 11, 2008 |
| 7341953 |
Mask profile control for controlling feature profile |
Mar. 11, 2008 |
| 7341952 |
Multi-layer hard mask structure for etching deep trench in substrate |
Mar. 11, 2008 |
| 7341951 |
Methods of forming semiconductor constructions |
Mar. 11, 2008 |
| 7338903 |
Sequential reducing plasma and inert plasma pre-treatment method for oxidizable conductor layer |
Mar. 4, 2008 |
| 7335602 |
Charge-free layer by layer etching of dielectrics |
Feb. 26, 2008 |
| 7332436 |
Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition |
Feb. 19, 2008 |
| 7332262 |
Photolithography scheme using a silicon containing resist |
Feb. 19, 2008 |
| 7329608 |
Method of processing a substrate |
Feb. 12, 2008 |
| 7329365 |
Etchant composition for indium oxide layer and etching method using the same |
Feb. 12, 2008 |
| 7326651 |
Method for forming damascene structure utilizing planarizing material coupled with compressive diffusion barrier material |
Feb. 5, 2008 |
| 7326650 |
Method of etching dual damascene structure |
Feb. 5, 2008 |
| 7326647 |
Dry etching process to form a conductive layer within an opening without use of a mask during the formation of a semiconductor device |
Feb. 5, 2008 |
| 7326358 |
Plasma processing method and apparatus, and storage medium |
Feb. 5, 2008 |
| 7320941 |
Plasma stabilization method and plasma apparatus |
Jan. 22, 2008 |
| 7316979 |
Method and apparatus for providing an integrated active region on silicon-on-insulator devices |
Jan. 8, 2008 |
| 7316975 |
Method of forming sidewall spacers |
Jan. 8, 2008 |
| 7314833 |
Method for manufacturing substrate for discrete track recording media and method for manufacturing discrete track recording media |
Jan. 1, 2008 |
| 7312158 |
Method of forming pattern |
Dec. 25, 2007 |
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