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Class Information
Number: 438/705
Name: Semiconductor device manufacturing: process > Chemical etching > Altering etchability of substrate region by compositional or crystalline modification
Description: Processes wherein the manner in which a semiconductor substrate is etched by a chemical etchant is altered by contacting the substrate prior to etching (a) with a material which alloys or diffuses into a substrate region or (b) by modifying the crystalline structure of a substrate region (e.g., amorphosizing, introducing dislocations, etc.).
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5833870 |
Method for forming a high density quantum wire |
Nov. 10, 1998 |
| 5824596 |
POCl.sub.3 process flow for doping polysilicon without forming oxide pillars or gate oxide shorts |
Oct. 20, 1998 |
| 5817580 |
Method of etching silicon dioxide |
Oct. 6, 1998 |
| 5804506 |
Acceleration of etch selectivity for self-aligned contact |
Sep. 8, 1998 |
| 5776817 |
Method of forming a trench structure in a semiconductor device |
Jul. 7, 1998 |
| 5767020 |
Etching solution for etching porous silicon, etching method using the etching solution and method of preparing semiconductor member using the etching solution |
Jun. 16, 1998 |
| 5753523 |
Method for making airbridge from ion-implanted conductive polymers |
May. 19, 1998 |
| 5743998 |
Process for transferring microminiature patterns using spin-on glass resist media |
Apr. 28, 1998 |
| 5736430 |
Transducer having a silicon diaphragm and method for forming same |
Apr. 7, 1998 |
| 5736002 |
Methods and equipment for anisotropic, patterned conversion of copper into selectively removable compounds and for removal of same |
Apr. 7, 1998 |
| 5731245 |
High aspect ratio low resistivity lines/vias with a tungsten-germanium alloy hard cap |
Mar. 24, 1998 |
| 5702869 |
Soft ashing method for removing fluorinated photoresists layers from semiconductor substrates |
Dec. 30, 1997 |
| 5702867 |
Method for forming fine pattern in semiconductor device |
Dec. 30, 1997 |
| 5698467 |
Method of manufacturing an insulation layer having a flat surface |
Dec. 16, 1997 |
| 5693557 |
Method of fabricating a semiconductor device |
Dec. 2, 1997 |
| 5683546 |
Method of etching silicon substrate at different etching rates for different planes of the silicon to form an air bridge |
Nov. 4, 1997 |
| 5674406 |
Stopper manufacturing method of a silicon micromachining structure |
Oct. 7, 1997 |
| 5674758 |
Silicon on insulator achieved using electrochemical etching |
Oct. 7, 1997 |
| 5662768 |
High surface area trenches for an integrated ciruit device |
Sep. 2, 1997 |
| 5651860 |
Ion-implanted resist removal method |
Jul. 29, 1997 |
| 5641382 |
Method to remove residue of metal etch |
Jun. 24, 1997 |
| 5641380 |
Method for fabricating a semiconductor device |
Jun. 24, 1997 |
| 5639689 |
Method for fabricating storage electrode of semiconductor device |
Jun. 17, 1997 |
| 5620920 |
Process for fabricating a CMOS structure with ESD protection |
Apr. 15, 1997 |
| 5618345 |
Method of producing self-supporting thin film of silicon single crystal |
Apr. 8, 1997 |
| 5616511 |
Method of fabricating a micro-trench storage capacitor |
Apr. 1, 1997 |
| 5599736 |
Fabrication method for polysilicon contact plugs |
Feb. 4, 1997 |
| 5593906 |
Method of processing a polysilicon film on a single-crystal silicon substrate |
Jan. 14, 1997 |
| 5587338 |
Polysilicon contact stud process |
Dec. 24, 1996 |
| 5580419 |
Process of making semiconductor device using focused ion beam for resistless in situ etching, deposition, and nucleation |
Dec. 3, 1996 |
| 5561079 |
Stalagraphy |
Oct. 1, 1996 |
| 5536360 |
Method for etching boron nitride |
Jul. 16, 1996 |
| 5507911 |
Monolithic micromechanical vibrating string accelerometer with trimmable resonant frequency |
Apr. 16, 1996 |
| 5500386 |
Manufacturing method of semiconductor devices |
Mar. 19, 1996 |
| 5500078 |
8-beam bridge-type silicon acceleration sensor and the fabricating method thereof |
Mar. 19, 1996 |
| 5487967 |
Surface-imaging technique for lithographic processes for device fabrication |
Jan. 30, 1996 |
| 5464509 |
P-N junction etch-stop technique for electrochemical etching of semiconductors |
Nov. 7, 1995 |
| 5449630 |
Method for fabricating a trench capacitor structure for dynamic random access memory integrated circuit |
Sep. 12, 1995 |
| 5444007 |
Formation of trenches having different profiles |
Aug. 22, 1995 |
| 5436174 |
Method of forming trenches in monocrystalline silicon carbide |
Jul. 25, 1995 |
| 5427649 |
Method for forming a pattern by silylation |
Jun. 27, 1995 |
| 5425844 |
Method of making layer containing magnetic material |
Jun. 20, 1995 |
| 5413953 |
Method for planarizing an insulator on a semiconductor substrate using ion implantation |
May. 9, 1995 |
| 5401357 |
Dry etching method |
Mar. 28, 1995 |
| 5399230 |
Method and apparatus for etching compound semiconductor |
Mar. 21, 1995 |
| 5399527 |
Method of forming multilayer aluminum wiring in semiconductor IC |
Mar. 21, 1995 |
| 5393682 |
Method of making tapered poly profile for TFT device manufacturing |
Feb. 28, 1995 |
| 5374328 |
Method of fabricating group III-V compound |
Dec. 20, 1994 |
| 5372962 |
Method of making a semiconductor integrated circuit device having a capacitor with a porous surface of an electrode |
Dec. 13, 1994 |
| 5358908 |
Method of creating sharp points and other features on the surface of a semiconductor substrate |
Oct. 25, 1994 |
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