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Class Information
Number: 438/705
Name: Semiconductor device manufacturing: process > Chemical etching > Altering etchability of substrate region by compositional or crystalline modification
Description: Processes wherein the manner in which a semiconductor substrate is etched by a chemical etchant is altered by contacting the substrate prior to etching (a) with a material which alloys or diffuses into a substrate region or (b) by modifying the crystalline structure of a substrate region (e.g., amorphosizing, introducing dislocations, etc.).
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6335290 |
Etching method, thin film transistor matrix substrate, and its manufacture |
Jan. 1, 2002 |
| 6331488 |
Planarization process for semiconductor substrates |
Dec. 18, 2001 |
| 6331378 |
Pattern forming method |
Dec. 18, 2001 |
| 6323046 |
Method and apparatus for endpointing a chemical-mechanical planarization process |
Nov. 27, 2001 |
| 6313040 |
Process for the definition of openings in a dielectric layer |
Nov. 6, 2001 |
| 6309975 |
Methods of making implanted structures |
Oct. 30, 2001 |
| 6310018 |
Fluorinated solvent compositions containing hydrogen fluoride |
Oct. 30, 2001 |
| 6303508 |
Superior silicon carbide integrated circuits and method of fabricating |
Oct. 16, 2001 |
| 6294473 |
Method of polishing substrates comprising silicon dioxide and composition relating thereto |
Sep. 25, 2001 |
| 6281131 |
Methods of forming electrical contacts |
Aug. 28, 2001 |
| 6279585 |
Etching method and method for manufacturing semiconductor device using the same |
Aug. 28, 2001 |
| 6274481 |
Process sequence to improve DRAM data retention |
Aug. 14, 2001 |
| 6261961 |
Adhesion layer for etching of tracks in nuclear trackable materials |
Jul. 17, 2001 |
| 6261967 |
Easy to remove hard mask layer for semiconductor device fabrication |
Jul. 17, 2001 |
| 6261964 |
Material removal method for forming a structure |
Jul. 17, 2001 |
| 6255219 |
Method for fabricating high-performance submicron MOSFET with lateral asymmetric channel |
Jul. 3, 2001 |
| 6254796 |
Selective etching of silicate |
Jul. 3, 2001 |
| 6251470 |
Methods of forming insulating materials, and methods of forming insulating materials around a conductive component |
Jun. 26, 2001 |
| 6240933 |
Methods for cleaning semiconductor surfaces |
Jun. 5, 2001 |
| 6235639 |
Method of making straight wall containers and the resultant containers |
May. 22, 2001 |
| 6232208 |
Semiconductor device and method of manufacturing a semiconductor device having an improved gate electrode profile |
May. 15, 2001 |
| 6225232 |
Semiconductor processing methods, and methods of forming capacitor constructions |
May. 1, 2001 |
| 6225231 |
Recovery of damages in a field oxide caused by high energy ion implant process |
May. 1, 2001 |
| 6225203 |
PE-SiN spacer profile for C2 SAC isolation window |
May. 1, 2001 |
| 6214736 |
Silicon processing method |
Apr. 10, 2001 |
| 6207517 |
Method of fabricating a semiconductor insulation layer and a semiconductor component containing the semiconductor insulation layer |
Mar. 27, 2001 |
| 6200903 |
Method of manufacturing semiconductor devices |
Mar. 13, 2001 |
| 6197697 |
Method of patterning semiconductor materials and other brittle materials |
Mar. 6, 2001 |
| 6189546 |
Polishing process for manufacturing dopant-striation-free polished silicon wafers |
Feb. 20, 2001 |
| 6174816 |
Treatment for film surface to reduce photo footing |
Jan. 16, 2001 |
| 6171966 |
Delineation pattern for epitaxial depositions |
Jan. 9, 2001 |
| 6168977 |
Method of manufacturing a semiconductor device having conductive patterns |
Jan. 2, 2001 |
| 6165842 |
Method for fabricating a non-volatile memory device using nano-crystal dots |
Dec. 26, 2000 |
| 6162732 |
Method for reducing capacitance depletion during hemispherical grain polysilicon synthesis for DRAM |
Dec. 19, 2000 |
| 6156668 |
Method for forming a fine pattern in a semiconductor device |
Dec. 5, 2000 |
| 6150277 |
Method of making an oxide structure having a finely calibrated thickness |
Nov. 21, 2000 |
| 6143642 |
Programmable semiconductor structures and methods for making the same |
Nov. 7, 2000 |
| 6140168 |
Method of fabricating self-aligned contact window |
Oct. 31, 2000 |
| 6140245 |
Semiconductor processing methods, and methods of forming capacitor constructions |
Oct. 31, 2000 |
| 6140244 |
Method for forming a spacer |
Oct. 31, 2000 |
| 6136719 |
Method and arrangement for fabricating a semiconductor device |
Oct. 24, 2000 |
| 6136717 |
Method for producing a via hole to a doped region |
Oct. 24, 2000 |
| 6130162 |
Method of preparing passivated copper line and device manufactured thereby |
Oct. 10, 2000 |
| 6121112 |
Fabrication method for semiconductor substrate |
Sep. 19, 2000 |
| 6103546 |
Method to improve the short circuit current of the porous silicon photodetector |
Aug. 15, 2000 |
| 6100202 |
Pre deposition stabilization method for forming a void free isotropically etched anisotropically patterned doped silicate glass layer |
Aug. 8, 2000 |
| 6090722 |
Process for fabricating a semiconductor structure having a self-aligned spacer |
Jul. 18, 2000 |
| 6068000 |
Substrate treatment method |
May. 30, 2000 |
| 6051503 |
Method of surface treatment of semiconductor substrates |
Apr. 18, 2000 |
| 6030898 |
Advanced etching method for VLSI fabrication |
Feb. 29, 2000 |
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