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Class Information
Number: 438/705
Name: Semiconductor device manufacturing: process > Chemical etching > Altering etchability of substrate region by compositional or crystalline modification
Description: Processes wherein the manner in which a semiconductor substrate is etched by a chemical etchant is altered by contacting the substrate prior to etching (a) with a material which alloys or diffuses into a substrate region or (b) by modifying the crystalline structure of a substrate region (e.g., amorphosizing, introducing dislocations, etc.).










Patents under this class:
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Patent Number Title Of Patent Date Issued
8709898 Fabrication method of semiconductor device and fabrication method of dynamic threshold transistor Apr. 29, 2014
8703000 Slimming method of carbon-containing thin film and oxidation apparatus Apr. 22, 2014
8685269 Laser processing method Apr. 1, 2014
8668777 Process for treating a semiconductor wafer Mar. 11, 2014
8664056 Transistor with embedded strain-inducing material formed in diamond-shaped cavities based on a pre-amorphization Mar. 4, 2014
8658051 Lithography resolution improving method Feb. 25, 2014
8642476 Method for manufacturing silicon carbide semiconductor device Feb. 4, 2014
8637403 Locally tailoring chemical mechanical polishing (CMP) polish rate for dielectrics Jan. 28, 2014
8603920 Manufacturing method of semiconductor device including etching step Dec. 10, 2013
8599616 Three-dimensional NAND memory with stacked mono-crystalline channels Dec. 3, 2013
8586859 Wafer level interconnection of inverted metamorphic multijunction solar cells Nov. 19, 2013
8557612 Method for fabricating micro and nanostructures in a material Oct. 15, 2013
8557613 Methods for designing, fabricating, and predicting shape formations in a material Oct. 15, 2013
8551846 Methods for fabricating semiconductor devices Oct. 8, 2013
8546209 Replacement metal gate processing with reduced interlevel dielectric layer etch rate Oct. 1, 2013
8513143 Semiconductor structure and method of manufacturing Aug. 20, 2013
8501516 Method for producing micromechanical patterns having a relief-like sidewall outline shape or an adjustable angle of inclination Aug. 6, 2013
8501609 Method for generating a three-dimensional NAND memory with mono-crystalline channels using sacrificial material Aug. 6, 2013
8486814 Wafer backside defectivity clean-up utilizing selective removal of substrate material Jul. 16, 2013
8470190 Method for processing portions of walls of an opening formed in a silicon substrate Jun. 25, 2013
8460948 Method for manufacturing liquid ejecting head Jun. 11, 2013
8460569 Method and system for post-etch treatment of patterned substrate features Jun. 11, 2013
8450165 Semiconductor device having tipless epitaxial source/drain regions May. 28, 2013
8450166 Method of fabricating semiconductor devices May. 28, 2013
8450167 Method of fabricating semiconductor devices May. 28, 2013
8450194 Method to modify the shape of a cavity using angled implantation May. 28, 2013
8445307 Monolithic IC and MEMS microfabrication process May. 21, 2013
8426312 Method of reducing contamination by providing an etch stop layer at the substrate edge Apr. 23, 2013
8394720 Plasma processing method and resist pattern modifying method Mar. 12, 2013
8377320 Method of forming an undercut microstructure Feb. 19, 2013
8367551 Spin-printing of etchants and modifiers Feb. 5, 2013
8349675 Method for forming a gate electrode Jan. 8, 2013
8338306 Forming semiconductor resistors in a semiconductor device comprising metal gates by increasing etch resistivity of the resistors Dec. 25, 2012
8329589 Semiconductor device with gate-undercutting recessed region Dec. 11, 2012
8330036 Method of fabrication and structure for multi-junction solar cell formed upon separable substrate Dec. 11, 2012
8318604 Substrate comprising a nanometer-scale projection array Nov. 27, 2012
8288258 Method for producing a semiconductor Oct. 16, 2012
8288262 Method for fabricating semiconductor device Oct. 16, 2012
8263853 Wafer level interconnection of inverted metamorphic multijunction solar cells Sep. 11, 2012
8242021 Method for manufacturing semiconductor device Aug. 14, 2012
8222154 Fin and finFET formation by angled ion implantation Jul. 17, 2012
8222153 Textured single crystal Jul. 17, 2012
8216946 Patterning method Jul. 10, 2012
8211804 Methods of forming a hole having a vertical profile and semiconductor devices having a vertical hole Jul. 3, 2012
8203176 Dielectric, capacitor using dielectric, semiconductor device using dielectric, and manufacturing method of dielectric Jun. 19, 2012
8193095 Method for forming silicon trench Jun. 5, 2012
8173891 Monolithic, multi-bandgap, tandem, ultra-thin, strain-counterbalanced, photovoltaic energy converters with optimal subcell bandgaps May. 8, 2012
8153462 Method of manufacturing liquid crystal display device Apr. 10, 2012
8133800 Free-standing thickness of single crystal material and method having carrier lifetimes Mar. 13, 2012
8124534 Multiple exposure and single etch integration method Feb. 28, 2012

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