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Class Information
Number: 438/705
Name: Semiconductor device manufacturing: process > Chemical etching > Altering etchability of substrate region by compositional or crystalline modification
Description: Processes wherein the manner in which a semiconductor substrate is etched by a chemical etchant is altered by contacting the substrate prior to etching (a) with a material which alloys or diffuses into a substrate region or (b) by modifying the crystalline structure of a substrate region (e.g., amorphosizing, introducing dislocations, etc.).


Patents under this class:
1 2 3 4 5 6 7 8

Patent Number Title Of Patent Date Issued
7618894 Multi-step selective etching for cross-point memory Nov. 17, 2009
7611978 Method for forming gate electrode of semiconductor device Nov. 3, 2009
7585424 Pattern reversal process for self aligned imprint lithography and device Sep. 8, 2009
7579281 Transistor assembly and method of its fabrication Aug. 25, 2009
7557023 Implantation of gate regions in semiconductor device fabrication Jul. 7, 2009
7557043 Method of fabricating the stacked structure and damascene process Jul. 7, 2009
7553771 Method of forming pattern of semiconductor device Jun. 30, 2009
7544622 Passivation for cleaning a material Jun. 9, 2009
7541199 Methods of forming magnetic memory devices including oxidizing and etching magnetic layers Jun. 2, 2009
7528072 Crystallographic preferential etch to define a recessed-region for epitaxial growth May. 5, 2009
7504339 Method to form shallow trench isolation with rounded upper corner for advanced semiconductor circuits Mar. 17, 2009
7497095 Method for producing quartz glass jig and quartz glass jig Mar. 3, 2009
7498222 Enhanced etching of a high dielectric constant layer Mar. 3, 2009
7494933 Method for achieving uniform etch depth using ion implantation and a timed etch Feb. 24, 2009
7429534 Etching a nitride-based heterostructure Sep. 30, 2008
7422936 Facilitating removal of sacrificial layers via implantation to form replacement metal gates Sep. 9, 2008
7422020 Aluminum incorporation in porous dielectric for improved mechanical properties of patterned dielectric Sep. 9, 2008
7419914 Semiconductor device fabrication method Sep. 2, 2008
7419915 Laser assisted chemical etching method for release microscale and nanoscale devices Sep. 2, 2008
7416988 Semiconductor device and fabrication process thereof Aug. 26, 2008
7407853 Display device and manufacturing method of the same Aug. 5, 2008
7390753 In-situ plasma treatment of advanced resists in fine pattern definition Jun. 24, 2008
7390748 Method of forming a polishing inhibiting layer using a slurry having an additive Jun. 24, 2008
7390745 Pattern enhancement by crystallographic etching Jun. 24, 2008
7386162 Post fabrication CD modification on imprint lithography mask Jun. 10, 2008
7376259 Topography compensation of imprint lithography patterning May. 20, 2008
7358181 Method for structuring a semiconductor device Apr. 15, 2008
7341941 Methods to facilitate etch uniformity and selectivity Mar. 11, 2008
7316978 Method for forming recesses Jan. 8, 2008
7276175 Semiconductor device fabrication method Oct. 2, 2007
7267127 Method for manufacturing electronic device Sep. 11, 2007
7259103 Fabrication method of polycrystalline silicon TFT Aug. 21, 2007
7256130 Process for defining a chalcogenide material layer, in particular in a process for manufacturing phase change memory cells Aug. 14, 2007
7253120 Selectable area laser assisted processing of substrates Aug. 7, 2007
7232765 Utilization of a Ta-containing cap over copper to facilitate concurrent formation of copper vias and memory element structures Jun. 19, 2007
7229928 Method for processing a layered stack in the production of a semiconductor device Jun. 12, 2007
7214978 Semiconductor fabrication that includes surface tension control May. 8, 2007
7208419 Method for fabricating semiconductor device Apr. 24, 2007
7205244 Patterning substrates employing multi-film layers defining etch-differential interfaces Apr. 17, 2007
7202122 Cobalt silicidation process for substrates with a silicon--germanium layer Apr. 10, 2007
7196016 Fabrication process for preparing recording head sliders made from silicon substrates with SiO.sub.2 overcoats Mar. 27, 2007
7195946 Process for fabricating a semiconductor device having a suspended micro-system and resultant device Mar. 27, 2007
7186657 Method for patterning HfO2-containing dielectric Mar. 6, 2007
7179748 Method for forming recesses Feb. 20, 2007
7169669 Method of making thin silicon sheets for solar cells Jan. 30, 2007
7166232 Method for producing a solid body including a microstructure Jan. 23, 2007
7157377 Method of making a semiconductor device using treated photoresist Jan. 2, 2007
7135360 Liquid crystal display device and method of fabricating the same Nov. 14, 2006
7119006 Via formation for damascene metal conductors in an integrated circuit Oct. 10, 2006
7087440 Monitoring of nitrided oxide gate dielectrics by determination of a wet etch Aug. 8, 2006

1 2 3 4 5 6 7 8


 
 
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