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Class Information
Number: 438/705
Name: Semiconductor device manufacturing: process > Chemical etching > Altering etchability of substrate region by compositional or crystalline modification
Description: Processes wherein the manner in which a semiconductor substrate is etched by a chemical etchant is altered by contacting the substrate prior to etching (a) with a material which alloys or diffuses into a substrate region or (b) by modifying the crystalline structure of a substrate region (e.g., amorphosizing, introducing dislocations, etc.).
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7358181 |
Method for structuring a semiconductor device |
Apr. 15, 2008 |
| 7341941 |
Methods to facilitate etch uniformity and selectivity |
Mar. 11, 2008 |
| 7316978 |
Method for forming recesses |
Jan. 8, 2008 |
| 7276175 |
Semiconductor device fabrication method |
Oct. 2, 2007 |
| 7267127 |
Method for manufacturing electronic device |
Sep. 11, 2007 |
| 7259103 |
Fabrication method of polycrystalline silicon TFT |
Aug. 21, 2007 |
| 7256130 |
Process for defining a chalcogenide material layer, in particular in a process for manufacturing phase change memory cells |
Aug. 14, 2007 |
| 7253120 |
Selectable area laser assisted processing of substrates |
Aug. 7, 2007 |
| 7232765 |
Utilization of a Ta-containing cap over copper to facilitate concurrent formation of copper vias and memory element structures |
Jun. 19, 2007 |
| 7229928 |
Method for processing a layered stack in the production of a semiconductor device |
Jun. 12, 2007 |
| 7214978 |
Semiconductor fabrication that includes surface tension control |
May. 8, 2007 |
| 7208419 |
Method for fabricating semiconductor device |
Apr. 24, 2007 |
| 7205244 |
Patterning substrates employing multi-film layers defining etch-differential interfaces |
Apr. 17, 2007 |
| 7202122 |
Cobalt silicidation process for substrates with a silicon--germanium layer |
Apr. 10, 2007 |
| 7195946 |
Process for fabricating a semiconductor device having a suspended micro-system and resultant device |
Mar. 27, 2007 |
| 7196016 |
Fabrication process for preparing recording head sliders made from silicon substrates with SiO.sub.2 overcoats |
Mar. 27, 2007 |
| 7186657 |
Method for patterning HfO2-containing dielectric |
Mar. 6, 2007 |
| 7179748 |
Method for forming recesses |
Feb. 20, 2007 |
| 7169669 |
Method of making thin silicon sheets for solar cells |
Jan. 30, 2007 |
| 7166232 |
Method for producing a solid body including a microstructure |
Jan. 23, 2007 |
| 7157377 |
Method of making a semiconductor device using treated photoresist |
Jan. 2, 2007 |
| 7135360 |
Liquid crystal display device and method of fabricating the same |
Nov. 14, 2006 |
| 7119006 |
Via formation for damascene metal conductors in an integrated circuit |
Oct. 10, 2006 |
| 7087440 |
Monitoring of nitrided oxide gate dielectrics by determination of a wet etch |
Aug. 8, 2006 |
| 7078352 |
Methods for selective integration of airgaps and devices made by such methods |
Jul. 18, 2006 |
| 7067430 |
Method of making relaxed silicon-germanium on insulator via layer transfer with stress reduction |
Jun. 27, 2006 |
| 7064076 |
Process for low temperature, dry etching, and dry planarization of copper |
Jun. 20, 2006 |
| 7063091 |
Method for cleaning the surface of a substrate |
Jun. 20, 2006 |
| 7053003 |
Photoresist conditioning with hydrogen ramping |
May. 30, 2006 |
| 7049241 |
Method for forming a trench in a layer or a layer stack on a semiconductor wafer |
May. 23, 2006 |
| 7045073 |
Pre-etch implantation damage for the removal of thin film layers |
May. 16, 2006 |
| 7045407 |
Amorphous etch stop for the anisotropic etching of substrates |
May. 16, 2006 |
| 7037849 |
Process for patterning high-k dielectric material |
May. 2, 2006 |
| 7037851 |
Methods for selective integration of airgaps and devices made by such methods |
May. 2, 2006 |
| 7026247 |
Nanocircuit and self-correcting etching method for fabricating same |
Apr. 11, 2006 |
| 7022611 |
Plasma in-situ treatment of chemically amplified resist |
Apr. 4, 2006 |
| 7018928 |
Plasma treatment method to reduce silicon erosion over HDI silicon regions |
Mar. 28, 2006 |
| 7018936 |
Ion implant lithography method of processing a semiconductor substrate |
Mar. 28, 2006 |
| 7015136 |
Method for preventing formation of photoresist scum |
Mar. 21, 2006 |
| 7001811 |
Method for making memory cell without halo implant |
Feb. 21, 2006 |
| 6989331 |
Hard mask removal |
Jan. 24, 2006 |
| 6960531 |
Method of manufacturing electronic device |
Nov. 1, 2005 |
| 6951819 |
High efficiency, monolithic multijunction solar cells containing lattice-mismatched materials and methods of forming same |
Oct. 4, 2005 |
| 6946398 |
Method for fabricating a micro machine |
Sep. 20, 2005 |
| 6943118 |
Method of fabricating flash memory |
Sep. 13, 2005 |
| 6939758 |
Gate length control for semiconductor chip design |
Sep. 6, 2005 |
| 6932916 |
Semiconductor substrate with trenches of varying depth |
Aug. 23, 2005 |
| 6930030 |
Method of forming an electronic device on a recess in the surface of a thin film of silicon etched to a precise thickness |
Aug. 16, 2005 |
| 6927082 |
Method of evaluating the quality of a contact plug fill |
Aug. 9, 2005 |
| 6924217 |
Method of forming trench in semiconductor device |
Aug. 2, 2005 |
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