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Class Information
Number: 438/704
Name: Semiconductor device manufacturing: process > Chemical etching > Having liquid and vapor etching steps
Description: Processes having a liquid (i.e., wet) chemical etching step and a gaseous (i.e., dry) chemical etching step.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 4624740 |
Tailoring of via-hole sidewall slope |
Nov. 25, 1986 |
| 4615102 |
Method of producing enhancement mode and depletion mode FETs |
Oct. 7, 1986 |
| 4584055 |
Method for manufacturing a semiconductor device |
Apr. 22, 1986 |
| 4543320 |
Method of making a high performance, small area thin film transistor |
Sep. 24, 1985 |
| 4541892 |
Process for the positioning of an interconnection line on an electrical contact hole of an integrated circuit |
Sep. 17, 1985 |
| 4536249 |
Integrated circuit processing methods |
Aug. 20, 1985 |
| 4534826 |
Trench etch process for dielectric isolation |
Aug. 13, 1985 |
| 4468285 |
Plasma etch process for single-crystal silicon with improved selectivity to silicon dioxide |
Aug. 28, 1984 |
| 4456501 |
Process for dislocation-free slot isolations in device fabrication |
Jun. 26, 1984 |
| 4449285 |
Method for producing a vertical channel transistor |
May. 22, 1984 |
| 4447291 |
Method for via formation in HgCdTe |
May. 8, 1984 |
| 4398992 |
Defect free zero oxide encroachment process for semiconductor fabrication |
Aug. 16, 1983 |
| 4387145 |
Lift-off shadow mask |
Jun. 7, 1983 |
| 4372034 |
Process for forming contact openings through oxide layers |
Feb. 8, 1983 |
| 4354897 |
Process for forming contact through holes |
Oct. 19, 1982 |
| 4352724 |
Method of manufacturing a semiconductor device |
Oct. 5, 1982 |
| 4350563 |
Dry etching of metal film |
Sep. 21, 1982 |
| 4343677 |
Method for patterning films using reactive ion etching thereof |
Aug. 10, 1982 |
| 4341594 |
Method of restoring semiconductor device performance |
Jul. 27, 1982 |
| 4325181 |
Simplified fabrication method for high-performance FET |
Apr. 20, 1982 |
| 4318751 |
Self-aligned process for providing an improved high performance bipolar transistor |
Mar. 9, 1982 |
| 4267012 |
Process for patterning metal connections on a semiconductor structure by using a tungsten-titanium etch resistant layer |
May. 12, 1981 |
| 4057460 |
Plasma etching process |
Nov. 8, 1977 |
| 4035208 |
Method of patterning Cr-Pt-Au metallization for silicon devices |
Jul. 12, 1977 |
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