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Class Information
Number: 438/703
Name: Semiconductor device manufacturing: process > Chemical etching > Combined with coating step > Plural coating steps
Description: Processes having multiple material deposition steps.










Patents under this class:
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Patent Number Title Of Patent Date Issued
6238936 Method of using critical dimension mapping to qualify a new integrated circuit fabrication etch process May. 29, 2001
6232218 Etch stop for use in etching of silicon oxide May. 15, 2001
6221780 Dual damascene flowable oxide insulation structure and metallic barrier Apr. 24, 2001
6214735 Method for planarizing a semiconductor substrate Apr. 10, 2001
6207574 Method for fabricating a DRAM cell storage node Mar. 27, 2001
6194320 Method for preparing a semiconductor device Feb. 27, 2001
6190233 Method and apparatus for improving gap-fill capability using chemical and physical etchbacks Feb. 20, 2001
6184144 Methods for growing defect-free heteroepitaxial layers Feb. 6, 2001
6174416 Micromechanical component production method Jan. 16, 2001
6171964 Method of forming a conductive spacer in a via Jan. 9, 2001
6156643 Method of forming a dual damascene trench and borderless via structure Dec. 5, 2000
6140247 Semiconductor device manufacturing method Oct. 31, 2000
6130164 Semiconductor device having gate oxide formed by selective oxide removal and method of manufacture thereof Oct. 10, 2000
6127258 Method for forming a semiconductor device Oct. 3, 2000
6127272 Method of electron beam lithography on very high resistivity substrates Oct. 3, 2000
6121145 Method of fabricating via and interconnection Sep. 19, 2000
6091132 Passivation for integrated circuit sensors Jul. 18, 2000
6077754 Methods of forming a silicon nitride film, a capacitor dielectric layer and a capacitor Jun. 20, 2000
6059983 Method for fabricating an overcoated printed circuit board with contaminant-free areas May. 9, 2000
6060398 Guard cell for etching May. 9, 2000
6043160 Method of manufacturing a monitor pad for chemical mechanical polishing planarization Mar. 28, 2000
6043151 Method for forming a semiconductor connection with a top surface having an enlarged recess Mar. 28, 2000
6040207 Oxide formation technique using thin film silicon deposition Mar. 21, 2000
6040619 Semiconductor device including antireflective etch stop layer Mar. 21, 2000
6037261 Semiconductor processing method of making electrical contact to a node received within a mass of insulating dielectric material Mar. 14, 2000
6036872 Method for making a wafer-pair having sealed chambers Mar. 14, 2000
6033584 Process for reducing copper oxide during integrated circuit fabrication Mar. 7, 2000
6030900 Process for generating a space in a structure Feb. 29, 2000
6027860 Method for forming a structure using redeposition of etchable layer Feb. 22, 2000
6020261 Process for forming high aspect ratio circuit features Feb. 1, 2000
6020267 Method for forming local interconnect metal structures via the addition of a titanium nitride anti-reflective coating Feb. 1, 2000
6017823 Method of forming a MOS field effect transistor with improved gate side wall insulation films Jan. 25, 2000
6004875 Etch stop for use in etching of silicon oxide Dec. 21, 1999
5989997 Method for forming dual damascene structure Nov. 23, 1999
5981397 Integrated circuitry having a pair of adjacent conductive lines and method of forming Nov. 9, 1999
5972744 Quantum effect device, method of manufacturing the same Oct. 26, 1999
5968844 Method for etching nitride features in integrated circuit construction Oct. 19, 1999
5965939 Semiconductor device and a method of manufacture Oct. 12, 1999
5948280 Multilayer printed circuit board laminated with unreinforced resin Sep. 7, 1999
5948701 Self-aligned contact (SAC) etching using polymer-building chemistry Sep. 7, 1999
5928966 Method for manufacturing a stacked electrode for a semiconductor device Jul. 27, 1999
5902126 Methods for forming integrated circuit capacitor electrodes including surrounding insulating sidewalls and spacers May. 11, 1999
5902493 Method for forming micro patterns of semiconductor devices May. 11, 1999
5899750 Fine processing method May. 4, 1999
5891798 Method for forming a High dielectric constant insulator in the fabrication of an integrated circuit Apr. 6, 1999
5882978 Methods of forming a silicon nitride film, a capacitor dielectric layer and a capacitor Mar. 16, 1999
5882489 Processes for cleaning and stripping photoresist from surfaces of semiconductor wafers Mar. 16, 1999
5883705 Atomic force microscope for high speed imaging including integral actuator and sensor Mar. 16, 1999
5880003 Method of giving a substantially flat surface of a semiconductor device through a polishing operation Mar. 9, 1999
5858854 Method for forming high contrast alignment marks Jan. 12, 1999

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