| Patent Number |
Title Of Patent |
Date Issued |
| 5194403 |
Method for the making of the electrode metallizations of a transistor |
Mar. 16, 1993 |
| 5186788 |
Fine pattern forming method |
Feb. 16, 1993 |
| 5169494 |
Fine pattern forming method |
Dec. 8, 1992 |
| 5164339 |
Fabrication of oxynitride frontside microstructures |
Nov. 17, 1992 |
| 5149676 |
Silicon layer having increased surface area and method for manufacturing |
Sep. 22, 1992 |
| 5134086 |
Method for manufacturing capacitor of highly integrated semiconductor memory device |
Jul. 28, 1992 |
| 5132236 |
Method of semiconductor manufacture using an inverse self-aligned mask |
Jul. 21, 1992 |
| 5132252 |
Method for fabricating semiconductor devices that prevents pattern contamination |
Jul. 21, 1992 |
| 5129982 |
Selective electrochemical etching |
Jul. 14, 1992 |
| 5128006 |
Deposition of diamond films on semicondutor substrates |
Jul. 7, 1992 |
| 5128283 |
Method of forming mask alignment marks |
Jul. 7, 1992 |
| 5124271 |
Process for fabricating a BiCMOS integrated circuit |
Jun. 23, 1992 |
| 5102830 |
Integrated circuit fabrication process for preventing overprocessing during a laser scan |
Apr. 7, 1992 |
| 5102688 |
Fine pattern forming process |
Apr. 7, 1992 |
| 5098866 |
Method for reducing hot-electron-induced degradation of device characteristics |
Mar. 24, 1992 |
| 5089433 |
Bipolar field-effect electrically erasable programmable read only memory cell and method of manufacture |
Feb. 18, 1992 |
| 5082522 |
Method for forming patterned diamond thin films |
Jan. 21, 1992 |
| 5074956 |
Pattern forming method |
Dec. 24, 1991 |
| 5071510 |
Process for anisotropic etching of silicon plates |
Dec. 10, 1991 |
| 5057022 |
Method of making a silicon integrated circuit waveguide |
Oct. 15, 1991 |
| 5045150 |
Plasma etching using a bilayer mask |
Sep. 3, 1991 |
| 5034351 |
Process for forming a feature on a substrate without recessing the surface of the substrate |
Jul. 23, 1991 |
| 5023203 |
Method of patterning fine line width semiconductor topology using a spacer |
Jun. 11, 1991 |
| 5023197 |
Manufacturing process of mesa SOI MOS transistor |
Jun. 11, 1991 |
| 5021365 |
Compound semiconductor interface control using cationic ingredient oxide to prevent fermi level pinning |
Jun. 4, 1991 |
| 5013689 |
Method of forming a passivation film |
May. 7, 1991 |
| 5008212 |
Selective asperity definition technique suitable for use in fabricating floating-gate transistor |
Apr. 16, 1991 |
| 4992394 |
Self aligned registration marks for integrated circuit fabrication |
Feb. 12, 1991 |
| 4988403 |
Method of forming patterned silicone rubber layer |
Jan. 29, 1991 |
| 4987101 |
Method for providing improved insulation in VLSI and ULSI circuits |
Jan. 22, 1991 |
| 4985114 |
Dry etching by alternately etching and depositing |
Jan. 15, 1991 |
| 4980307 |
Process for producing a semiconductor device having a silicon oxynitride insulative film |
Dec. 25, 1990 |
| 4976818 |
Fine pattern forming method |
Dec. 11, 1990 |
| 4971655 |
Protection of a refractory metal silicide during high-temperature processing using a dual-layer cap of silicon dioxide and silicon nitride |
Nov. 20, 1990 |
| 4954218 |
Method for etching a pattern |
Sep. 4, 1990 |
| 4954189 |
Silicon wafers for producing oxide layers of high breakdown strength and process for the production thereof |
Sep. 4, 1990 |
| 4929302 |
Process for the production of light microguides with low optical propagation losses by multicoating deposition |
May. 29, 1990 |
| 4927781 |
Method of making a silicon integrated circuit waveguide |
May. 22, 1990 |
| 4906328 |
Method for wafer treating |
Mar. 6, 1990 |
| 4902646 |
MESFET process employing dummy electrodes and resist reflow |
Feb. 20, 1990 |
| 4885262 |
Chemical modification of spin-on glass for improved performance in IC fabrication |
Dec. 5, 1989 |
| 4885261 |
Method for isolating a semiconductor element |
Dec. 5, 1989 |
| 4883768 |
Mesa fabrication in semiconductor structures |
Nov. 28, 1989 |
| 4859253 |
Method for passivating a compound semiconductor surface and device having improved semiconductor-insulator interface |
Aug. 22, 1989 |
| 4829025 |
Process for patterning films in manufacture of integrated circuit structures |
May. 9, 1989 |
| 4806202 |
Field enhanced tunnel oxide on treated substrates |
Feb. 21, 1989 |
| 4790920 |
Method for depositing an al.sub.2 O.sub.3 cap layer on an integrated circuit substrate |
Dec. 13, 1988 |
| 4789642 |
Method for fabricating low loss crystalline silicon waveguides by dielectric implantation |
Dec. 6, 1988 |
| 4780428 |
Mosfet semiconductor device and manufacturing method thereof |
Oct. 25, 1988 |
| 4764248 |
Rapid thermal nitridized oxide locos process |
Aug. 16, 1988 |
