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Class Information
Number: 438/703
Name: Semiconductor device manufacturing: process > Chemical etching > Combined with coating step > Plural coating steps
Description: Processes having multiple material deposition steps.










Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13

Patent Number Title Of Patent Date Issued
7888270 Etching method for nitride semiconductor Feb. 15, 2011
7884429 Impact sensor and method for manufacturing the impact sensor Feb. 8, 2011
7879729 Method of forming a micro pattern of a semiconductor device Feb. 1, 2011
7871933 Combined stepper and deposition tool Jan. 18, 2011
7867796 Liquid crystal display and fabrication method thereof Jan. 11, 2011
7867402 Method for realizing a multispacer structure, use of said structure as a mold and circuital architectures obtained from said mold Jan. 11, 2011
7863196 Self-aligned dielectric cap Jan. 4, 2011
7855151 Formation of a slot in a silicon substrate Dec. 21, 2010
7851366 Forming a sacrificial layer in order to realise a suspended element Dec. 14, 2010
7846844 Method for fabricating saddle type fin transistor Dec. 7, 2010
7846849 Frequency tripling using spacer mask having interposed regions Dec. 7, 2010
7846756 Nanoimprint enhanced resist spacer patterning method Dec. 7, 2010
7846843 Method for manufacturing a semiconductor device using a spacer as an etch mask for forming a fine pattern Dec. 7, 2010
7842616 Methods for fabricating semiconductor structures Nov. 30, 2010
7842615 Semiconductor device having a copper metal line and method of forming the same Nov. 30, 2010
7838412 Method for manufacturing a semiconductor device Nov. 23, 2010
7833860 Recessed gate dielectric antifuse Nov. 16, 2010
7833910 Film substrate, fabrication method thereof, and image display substrate Nov. 16, 2010
7828987 Organic BARC etch process capable of use in the formation of low K dual damascene integrated circuits Nov. 9, 2010
7829465 Method for plasma etching of positively sloped structures Nov. 9, 2010
7829466 Methods for fabricating FinFET structures having different channel lengths Nov. 9, 2010
7825030 Method of forming a spacer Nov. 2, 2010
7807578 Frequency doubling using spacer mask Oct. 5, 2010
7803709 Method of fabricating pattern in semiconductor device using spacer Sep. 28, 2010
7786015 Method for fabricating self-aligned complementary pillar structures and wiring Aug. 31, 2010
7781345 Method of manufacturing imprint substrate and imprinting method Aug. 24, 2010
7781320 Method for fabricating a semiconductor device by considering the extinction coefficient during etching of an interlayer insulating film Aug. 24, 2010
7776750 Semiconductor device and method for forming a pattern in the same with double exposure technology Aug. 17, 2010
7767589 Passivation layer for a circuit device and method of manufacture Aug. 3, 2010
7749915 Protection of polymer surfaces during micro-fabrication Jul. 6, 2010
7749912 Method for fabricating bulb-shaped recess pattern Jul. 6, 2010
7741226 Optimal tungsten through wafer via and process of fabricating same Jun. 22, 2010
7732337 Method for manufacturing the shallow trench isolation structure Jun. 8, 2010
7718528 Photoactive adhesion promoter in a SLAM May. 18, 2010
7713801 Method of making a semiconductor structure utilizing spacer removal and semiconductor structure May. 11, 2010
7713885 Methods of etching oxide, reducing roughness, and forming capacitor constructions May. 11, 2010
7695632 Critical dimension reduction and roughness control Apr. 13, 2010
7687403 Method of manufacturing flash memory device Mar. 30, 2010
7682516 Vertical profile fixing Mar. 23, 2010
7678664 Method for fabricating semiconductor device Mar. 16, 2010
7670867 Method for manufacturing CMOS image sensor having microlens therein with high photosensitivity Mar. 2, 2010
7662711 Method of forming dual damascene pattern Feb. 16, 2010
7655569 Method of manufacturing semiconductor device Feb. 2, 2010
7628897 Reactive ion etching for semiconductor device feature topography modification Dec. 8, 2009
7625822 Semiconductor device and method for manufacturing the same including two antireflective coating films Dec. 1, 2009
7605087 Methods of forming semiconductor devices using di-block polymer layers Oct. 20, 2009
7605016 CMOS image sensor and method of manufacturing the same Oct. 20, 2009
7572735 Blanket resist to protect active side of semiconductor Aug. 11, 2009
7556916 Method for burying resist and method for manufacturing semiconductor device Jul. 7, 2009
7553770 Reverse masking profile improvements in high aspect ratio etch Jun. 30, 2009

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