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Class Information
Number: 438/703
Name: Semiconductor device manufacturing: process > Chemical etching > Combined with coating step > Plural coating steps
Description: Processes having multiple material deposition steps.










Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13

Patent Number Title Of Patent Date Issued
4859253 Method for passivating a compound semiconductor surface and device having improved semiconductor-insulator interface Aug. 22, 1989
4829025 Process for patterning films in manufacture of integrated circuit structures May. 9, 1989
4806202 Field enhanced tunnel oxide on treated substrates Feb. 21, 1989
4790920 Method for depositing an al.sub.2 O.sub.3 cap layer on an integrated circuit substrate Dec. 13, 1988
4789642 Method for fabricating low loss crystalline silicon waveguides by dielectric implantation Dec. 6, 1988
4780428 Mosfet semiconductor device and manufacturing method thereof Oct. 25, 1988
4764248 Rapid thermal nitridized oxide locos process Aug. 16, 1988
4746630 Method for producing recessed field oxide with improved sidewall characteristics May. 24, 1988
4738749 Process for producing an active matrix display screen with gate resistance Apr. 19, 1988
4735702 Method of producing an ISFET and same ISFET Apr. 5, 1988
4735917 Silicon-on-sapphire integrated circuits Apr. 5, 1988
4722912 Method of forming a semiconductor structure Feb. 2, 1988
4701241 Method of making a resistor Oct. 20, 1987
4695479 MOSFET semiconductor device and manufacturing method thereof Sep. 22, 1987
4693782 Fabrication method of semiconductor device Sep. 15, 1987
4675982 Method of making self-aligned recessed oxide isolation regions Jun. 30, 1987
4670091 Process for forming vias on integrated circuits Jun. 2, 1987
4658495 Method of forming a semiconductor structure Apr. 21, 1987
4654120 Method of making a planar trench semiconductor structure Mar. 31, 1987
4648937 Method of preventing asymmetric etching of lines in sub-micrometer range sidewall images transfer Mar. 10, 1987
4645683 Method of manufacturing a semiconductor device Feb. 24, 1987
4631113 Method for manufacturing a narrow line of photosensitive material Dec. 23, 1986
4608097 Method for producing an electronically passivated surface on crystalline silicon using a fluorination treatment and an organic overlayer Aug. 26, 1986
4574466 High quality gate oxides for VLSI devices Mar. 11, 1986
4575402 Method for fabricating conductors in integrated circuits Mar. 11, 1986
4572765 Method of fabricating integrated circuit structures using replica patterning Feb. 25, 1986
4541169 Method for making studs for interconnecting metallization layers at different levels in a semiconductor chip Sep. 17, 1985
4527325 Process for fabricating semiconductor devices utilizing a protective film during high temperature annealing Jul. 9, 1985
4430365 Method for forming conductive lines and vias Feb. 7, 1984
4428796 Adhesion bond-breaking of lift-off regions on semiconductor structures Jan. 31, 1984
4423548 Method for protecting a semiconductor device from radiation indirect failures Jan. 3, 1984
4405710 Ion beam exposure of (g-Ge.sub.x -Se.sub.1-x) inorganic resists Sep. 20, 1983
4387145 Lift-off shadow mask Jun. 7, 1983
4371407 Method for producing semiconductor device Feb. 1, 1983
4366229 Method of making cold shield for infrared detector array Dec. 28, 1982
4363868 Process of producing semiconductor devices by forming a silicon oxynitride layer by a plasma CVD technique which is employed in a selective oxidation process Dec. 14, 1982
4356056 Process for insulating the interconnections of integrated circuits Oct. 26, 1982
4346512 Integrated circuit manufacturing method Aug. 31, 1982
4333965 Method of making integrated circuits Jun. 8, 1982
4318759 Retro-etch process for integrated circuits Mar. 9, 1982
4313782 Method of manufacturing submicron channel transistors Feb. 2, 1982
4289574 Process for patterning metal connections on a semiconductor structure by using an aluminum oxide etch resistant layer Sep. 15, 1981
4277884 Method for forming an improved gate member utilizing special masking and oxidation to eliminate projecting points on silicon islands Jul. 14, 1981
4262399 Ultrasonic transducer fabricated as an integral park of a monolithic integrated circuit Apr. 21, 1981
4226667 Oxide masking of gallium arsenide Oct. 7, 1980
4219379 Method for making a semiconductor device Aug. 26, 1980
4178396 Method of forming an insulating film Dec. 11, 1979
4132586 Selective dry etching of substrates Jan. 2, 1979
4125427 Method of processing a semiconductor Nov. 14, 1978
4105805 Formation of metal nitride oxide semiconductor (MNOS) by ion implantation of oxygen through a silicon nitride layer Aug. 8, 1978

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