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Class Information
Number: 438/703
Name: Semiconductor device manufacturing: process > Chemical etching > Combined with coating step > Plural coating steps
Description: Processes having multiple material deposition steps.










Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13

Patent Number Title Of Patent Date Issued
5270264 Process for filling submicron spaces with dielectric Dec. 14, 1993
5256248 Method for patterning semiconductor Oct. 26, 1993
5252520 Integrated circuit interlevel dielectric wherein the first and second dielectric layers are formed with different densities Oct. 12, 1993
5246884 CVD diamond or diamond-like carbon for chemical-mechanical polish etch stop Sep. 21, 1993
5227341 Method of manufacturing a semiconductor device using an isopropyl alcohol ashing step Jul. 13, 1993
5223081 Method for roughening a silicon or polysilicon surface for a semiconductor substrate Jun. 29, 1993
5200347 Method for improving the radiation hardness of an integrated circuit bipolar transistor Apr. 6, 1993
5194403 Method for the making of the electrode metallizations of a transistor Mar. 16, 1993
5186788 Fine pattern forming method Feb. 16, 1993
5169494 Fine pattern forming method Dec. 8, 1992
5164339 Fabrication of oxynitride frontside microstructures Nov. 17, 1992
5149676 Silicon layer having increased surface area and method for manufacturing Sep. 22, 1992
5134086 Method for manufacturing capacitor of highly integrated semiconductor memory device Jul. 28, 1992
5132252 Method for fabricating semiconductor devices that prevents pattern contamination Jul. 21, 1992
5132236 Method of semiconductor manufacture using an inverse self-aligned mask Jul. 21, 1992
5129982 Selective electrochemical etching Jul. 14, 1992
5128283 Method of forming mask alignment marks Jul. 7, 1992
5128006 Deposition of diamond films on semicondutor substrates Jul. 7, 1992
5124271 Process for fabricating a BiCMOS integrated circuit Jun. 23, 1992
5102830 Integrated circuit fabrication process for preventing overprocessing during a laser scan Apr. 7, 1992
5102688 Fine pattern forming process Apr. 7, 1992
5098866 Method for reducing hot-electron-induced degradation of device characteristics Mar. 24, 1992
5089433 Bipolar field-effect electrically erasable programmable read only memory cell and method of manufacture Feb. 18, 1992
5082522 Method for forming patterned diamond thin films Jan. 21, 1992
5074956 Pattern forming method Dec. 24, 1991
5071510 Process for anisotropic etching of silicon plates Dec. 10, 1991
5057022 Method of making a silicon integrated circuit waveguide Oct. 15, 1991
5045150 Plasma etching using a bilayer mask Sep. 3, 1991
5034351 Process for forming a feature on a substrate without recessing the surface of the substrate Jul. 23, 1991
5023197 Manufacturing process of mesa SOI MOS transistor Jun. 11, 1991
5023203 Method of patterning fine line width semiconductor topology using a spacer Jun. 11, 1991
5021365 Compound semiconductor interface control using cationic ingredient oxide to prevent fermi level pinning Jun. 4, 1991
5013689 Method of forming a passivation film May. 7, 1991
5008212 Selective asperity definition technique suitable for use in fabricating floating-gate transistor Apr. 16, 1991
4992394 Self aligned registration marks for integrated circuit fabrication Feb. 12, 1991
4988403 Method of forming patterned silicone rubber layer Jan. 29, 1991
4987101 Method for providing improved insulation in VLSI and ULSI circuits Jan. 22, 1991
4985114 Dry etching by alternately etching and depositing Jan. 15, 1991
4980307 Process for producing a semiconductor device having a silicon oxynitride insulative film Dec. 25, 1990
4976818 Fine pattern forming method Dec. 11, 1990
4971655 Protection of a refractory metal silicide during high-temperature processing using a dual-layer cap of silicon dioxide and silicon nitride Nov. 20, 1990
4954218 Method for etching a pattern Sep. 4, 1990
4954189 Silicon wafers for producing oxide layers of high breakdown strength and process for the production thereof Sep. 4, 1990
4929302 Process for the production of light microguides with low optical propagation losses by multicoating deposition May. 29, 1990
4927781 Method of making a silicon integrated circuit waveguide May. 22, 1990
4906328 Method for wafer treating Mar. 6, 1990
4902646 MESFET process employing dummy electrodes and resist reflow Feb. 20, 1990
4885262 Chemical modification of spin-on glass for improved performance in IC fabrication Dec. 5, 1989
4885261 Method for isolating a semiconductor element Dec. 5, 1989
4883768 Mesa fabrication in semiconductor structures Nov. 28, 1989

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