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Class Information
Number: 438/702
Name: Semiconductor device manufacturing: process > Chemical etching > Combined with coating step > Formation of groove or trench > Plural coating steps
Description: Processes wherein the viahole or trench is formed by a process having multiple material deposition steps.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6784068 |
Capacitor fabrication method |
Aug. 31, 2004 |
| 6784082 |
Methods of fabricating single electron transistors in which the thickness of an insulating layer defines spacing between electrodes |
Aug. 31, 2004 |
| 6784074 |
Defect-free semiconductor templates for epitaxial growth and method of making same |
Aug. 31, 2004 |
| 6780337 |
Method for trench etching |
Aug. 24, 2004 |
| 6774005 |
Method for fabricating a metal carbide layer and method for fabricating a trench capacitor containing a metal carbide |
Aug. 10, 2004 |
| 6774045 |
Residual halogen reduction with microwave stripper |
Aug. 10, 2004 |
| 6774042 |
Planarization method for deep sub micron shallow trench isolation process |
Aug. 10, 2004 |
| 6770563 |
Process of forming a bottle-shaped trench |
Aug. 3, 2004 |
| 6770575 |
Method for improving thermal stability of fluorinated amorphous carbon low dielectric constant materials |
Aug. 3, 2004 |
| 6762128 |
Apparatus and method for manufacturing a semiconductor circuit |
Jul. 13, 2004 |
| 6762127 |
Etch process for dielectric materials comprising oxidized organo silane materials |
Jul. 13, 2004 |
| 6759332 |
Method for producing dual damascene interconnections and structure produced thereby |
Jul. 6, 2004 |
| 6753259 |
Method of improving the bondability between Au wires and Cu bonding pads |
Jun. 22, 2004 |
| 6753260 |
Composite etching stop in semiconductor process integration |
Jun. 22, 2004 |
| 6743728 |
Method for forming shallow trench isolation |
Jun. 1, 2004 |
| 6743713 |
Method of forming dual damascene pattern using dual bottom anti-reflective coatings (BARC) |
Jun. 1, 2004 |
| 6743727 |
Method of etching high aspect ratio openings |
Jun. 1, 2004 |
| 6737357 |
Method for manufacturing a semiconductor device |
May. 18, 2004 |
| 6737356 |
Method of fabricating a semiconductor work object |
May. 18, 2004 |
| 6732550 |
Method for performing a deep trench etch for a planar lightwave circuit |
May. 11, 2004 |
| 6734090 |
Method of making an edge seal for a semiconductor device |
May. 11, 2004 |
| 6723648 |
Fabricating ferroelectric memory device |
Apr. 20, 2004 |
| 6716757 |
Method for forming bottle trenches |
Apr. 6, 2004 |
| 6706635 |
Innovative method to build a high precision analog capacitor with low voltage coefficient and hysteresis |
Mar. 16, 2004 |
| 6696344 |
Method for forming a bottle-shaped trench |
Feb. 24, 2004 |
| 6693041 |
Self-aligned STI for narrow trenches |
Feb. 17, 2004 |
| 6690093 |
Metal contact structure in semiconductor device and method for forming the same |
Feb. 10, 2004 |
| 6689696 |
Method for manufacturing semiconductor device employing dielectric layer used to form conductive layer into three dimensional shape |
Feb. 10, 2004 |
| 6686285 |
Semiconductor device manufacture method preventing dishing and erosion during chemical mechanical polishing |
Feb. 3, 2004 |
| 6685847 |
Method for observing cross-sectional structure of sample |
Feb. 3, 2004 |
| 6680232 |
Trench etch with incremental oxygen flow |
Jan. 20, 2004 |
| 6680254 |
Method of fabricating bit line and bit line contact plug of a memory cell |
Jan. 20, 2004 |
| 6664180 |
Method of forming smaller trench line width using a spacer hard mask |
Dec. 16, 2003 |
| 6664026 |
Method of manufacturing high aspect ratio photolithographic features |
Dec. 16, 2003 |
| 6653239 |
Thermal isolation using vertical structures |
Nov. 25, 2003 |
| 6653238 |
Method for forming semiconductor device having high-density contacts |
Nov. 25, 2003 |
| 6649498 |
Metal film protection of the surface of a structure formed on a semiconductor substrate during etching of the substrate by a KOH etchant |
Nov. 18, 2003 |
| 6645868 |
Method of forming shallow trench isolation using antireflection layer |
Nov. 11, 2003 |
| 6638869 |
Process for manufacturing reflective TFT-LCD with rough diffuser |
Oct. 28, 2003 |
| 6635583 |
Silicon carbide deposition for use as a low-dielectric constant anti-reflective coating |
Oct. 21, 2003 |
| 6624079 |
Method for forming high resistance resistor with integrated high voltage device process |
Sep. 23, 2003 |
| 6617254 |
Method for manufacturing cathode electrodes of electroluminescent display device |
Sep. 9, 2003 |
| 6617253 |
Plasma etching method using polymer deposition and method of forming contact hole using the plasma etching method |
Sep. 9, 2003 |
| 6589870 |
Inter-layer connection structure, multilayer printed circuit board and production processes therefor |
Jul. 8, 2003 |
| 6589876 |
Methods of forming conductive capacitor plugs, methods of forming capacitor contact openings, and methods of forming memory arrays |
Jul. 8, 2003 |
| 6589864 |
Method for defining windows with different etching depths simultaneously |
Jul. 8, 2003 |
| 6583061 |
Method for creating an anti-blooming structure in a charge coupled device |
Jun. 24, 2003 |
| 6576556 |
Method of manufacturing semiconductor device and method of manufacturing infrared image sensor |
Jun. 10, 2003 |
| 6576555 |
Method of making upper conductive line in dual damascene having lower copper lines |
Jun. 10, 2003 |
| 6569760 |
Method to prevent poison via |
May. 27, 2003 |
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