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Class Information
Number: 438/702
Name: Semiconductor device manufacturing: process > Chemical etching > Combined with coating step > Formation of groove or trench > Plural coating steps
Description: Processes wherein the viahole or trench is formed by a process having multiple material deposition steps.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7615480 |
Methods of post-contact back end of the line through-hole via integration |
Nov. 10, 2009 |
| 7611980 |
Single spacer process for multiplying pitch by a factor greater than two and related intermediate IC structures |
Nov. 3, 2009 |
| 7605086 |
Corrosion resistant component of semiconductor processing equipment and method of manufacture thereof |
Oct. 20, 2009 |
| 7601586 |
Methods of forming buried bit line DRAM circuitry |
Oct. 13, 2009 |
| 7582560 |
Method for fabricating semiconductor device |
Sep. 1, 2009 |
| 7579255 |
Semiconductor device and method for isolating the same |
Aug. 25, 2009 |
| 7576008 |
Method for forming buried contact electrode of semiconductor device having pn junction and optoelectronic semiconductor device using the same |
Aug. 18, 2009 |
| 7576010 |
Method of forming pattern using fine pitch hard mask |
Aug. 18, 2009 |
| 7572734 |
Etch depth control for dual damascene fabrication process |
Aug. 11, 2009 |
| 7572729 |
Method of manufacturing semiconductor device |
Aug. 11, 2009 |
| 7569486 |
Spin on glass (SOG) etch improvement method |
Aug. 4, 2009 |
| 7560391 |
Forming of trenches or wells having different destinations in a semiconductor substrate |
Jul. 14, 2009 |
| 7560388 |
Self-aligned pitch reduction |
Jul. 14, 2009 |
| 7560387 |
Opening hard mask and SOI substrate in single process chamber |
Jul. 14, 2009 |
| 7553760 |
Sub-lithographic nano interconnect structures, and method for forming same |
Jun. 30, 2009 |
| 7544623 |
Method for fabricating a contact hole |
Jun. 9, 2009 |
| 7541291 |
Reduction of feature critical dimensions |
Jun. 2, 2009 |
| 7538009 |
Method for fabricating STI gap fill oxide layer in semiconductor devices |
May. 26, 2009 |
| 7538037 |
Method for manufacturing semiconductor device |
May. 26, 2009 |
| 7531450 |
Method of fabricating semiconductor device having contact hole with high aspect-ratio |
May. 12, 2009 |
| 7528066 |
Structure and method for metal integration |
May. 5, 2009 |
| 7514365 |
Method of fabricating opening and plug |
Apr. 7, 2009 |
| 7510952 |
Single crystalline structure, method of forming the same, semiconductor device having the single crystalline structure, and method of manufacturing the semiconductor device |
Mar. 31, 2009 |
| 7510973 |
Method for forming fine pattern in semiconductor device |
Mar. 31, 2009 |
| 7504339 |
Method to form shallow trench isolation with rounded upper corner for advanced semiconductor circuits |
Mar. 17, 2009 |
| 7501347 |
Semiconductor device and manufacturing method of the same |
Mar. 10, 2009 |
| 7482275 |
Plasma treatment method and method of manufacturing semiconductor device |
Jan. 27, 2009 |
| 7476626 |
Etch stop layer for a metallization layer with enhanced etch selectivity and hermeticity |
Jan. 13, 2009 |
| 7468302 |
Method of forming trench type isolation film of semiconductor device |
Dec. 23, 2008 |
| 7456108 |
Manufacturing method for a semiconductor device |
Nov. 25, 2008 |
| 7452814 |
Method of polishing GaN substrate |
Nov. 18, 2008 |
| 7446041 |
Full sequence metal and barrier layer electrochemical mechanical processing |
Nov. 4, 2008 |
| 7442647 |
Structure and method for formation of cladded interconnects for MRAMs |
Oct. 28, 2008 |
| 7435687 |
Plasma processing method and plasma processing device |
Oct. 14, 2008 |
| 7427515 |
Electronic element including ferroelectric substance film and method of manufacturing the same |
Sep. 23, 2008 |
| 7416984 |
Method of producing a MEMS device |
Aug. 26, 2008 |
| 7410901 |
Submicron device fabrication |
Aug. 12, 2008 |
| 7410905 |
Method for fabricating thin film pattern, device and fabricating method therefor, method for fabricating liquid crystal display, liquid crystal display, method for fabricating active matrix su |
Aug. 12, 2008 |
| 7399707 |
In situ application of etch back for improved deposition into high-aspect-ratio features |
Jul. 15, 2008 |
| 7393780 |
Dual layer barrier film techniques to prevent resist poisoning |
Jul. 1, 2008 |
| 7390749 |
Self-aligned pitch reduction |
Jun. 24, 2008 |
| 7391342 |
Low-cost keypad encoding circuit |
Jun. 24, 2008 |
| 7387966 |
Manufacturing method for a semiconductor device |
Jun. 17, 2008 |
| 7381652 |
Method of manufacturing flash memory device |
Jun. 3, 2008 |
| 7375018 |
Method of manufacturing semiconductor device |
May. 20, 2008 |
| 7354523 |
Methods for sidewall etching and etching during filling of a trench |
Apr. 8, 2008 |
| 7344974 |
Metallization method of semiconductor device |
Mar. 18, 2008 |
| 7344995 |
Method for preparing a structure with high aspect ratio |
Mar. 18, 2008 |
| 7341950 |
Method for controlling a thickness of a first layer and method for adjusting the thickness of different first layers |
Mar. 11, 2008 |
| 7332409 |
Methods of forming trench isolation layers using high density plasma chemical vapor deposition |
Feb. 19, 2008 |
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