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Class Information
Number: 438/7
Name: Semiconductor device manufacturing: process > Including control responsive to sensed condition > Optical characteristic sensed
Description: Process wherein the sensed condition is an optical property of the device or an optical property of the process.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7615721 |
Laser processing method and laser processing apparatus |
Nov. 10, 2009 |
| 7616290 |
Exposure apparatus and method |
Nov. 10, 2009 |
| 7612895 |
Apparatus and method for in-situ monitoring of wafer bonding time |
Nov. 3, 2009 |
| 7605008 |
Plasma ignition and complete faraday shielding of capacitive coupling for an inductively-coupled plasma |
Oct. 20, 2009 |
| 7601549 |
Method of processing semiconductor wafers |
Oct. 13, 2009 |
| 7598098 |
Monitoring the reduction in thickness as material is removed from a wafer composite and test structure for monitoring removal of material |
Oct. 6, 2009 |
| 7586608 |
Wafer-level testing of optical and optoelectronic chips |
Sep. 8, 2009 |
| 7572648 |
Method of manufacturing optical sensor |
Aug. 11, 2009 |
| 7568379 |
Method of measuring porosity by means of ellipsometry and device for implementing one such method |
Aug. 4, 2009 |
| 7566181 |
Controlling critical dimensions of structures formed on a wafer in semiconductor processing |
Jul. 28, 2009 |
| 7563626 |
Manufacturing method of complementary metal oxide silicon image sensor |
Jul. 21, 2009 |
| 7556972 |
Detection and characterization of SiCOH-based dielectric materials during device fabrication |
Jul. 7, 2009 |
| 7553678 |
Method for detecting semiconductor manufacturing conditions |
Jun. 30, 2009 |
| 7544619 |
Method of fabricating semiconductor device |
Jun. 9, 2009 |
| 7541201 |
Apparatus and methods for determining overlay of structures having rotational or mirror symmetry |
Jun. 2, 2009 |
| 7541230 |
Method and apparatus for crystallizing semiconductor with laser beams |
Jun. 2, 2009 |
| 7537941 |
Variable overlap of dummy shapes for improved rapid thermal anneal uniformity |
May. 26, 2009 |
| 7517705 |
Phosphorus-containing polymers for optical signal transducers |
Apr. 14, 2009 |
| 7514277 |
Etching method and apparatus |
Apr. 7, 2009 |
| 7514940 |
System and method for determining effective channel dimensions of metal oxide semiconductor devices |
Apr. 7, 2009 |
| 7498106 |
Method and apparatus for controlling etch processes during fabrication of semiconductor devices |
Mar. 3, 2009 |
| 7493713 |
Image sensor and related method of fabrication |
Feb. 24, 2009 |
| 7482177 |
Method for manufacturing optical device, and optical device wafer |
Jan. 27, 2009 |
| 7457736 |
Automated creation of metrology recipes |
Nov. 25, 2008 |
| 7449348 |
Feedback control of imprint mask feature profile using scatterometry and spacer etchback |
Nov. 11, 2008 |
| 7446868 |
Micro defects in semi-conductors |
Nov. 4, 2008 |
| 7427518 |
Semiconductor device fabrication method and fabrication apparatus |
Sep. 23, 2008 |
| 7427764 |
Laser crystallization apparatus and laser crystallization method |
Sep. 23, 2008 |
| 7410815 |
Apparatus and method for non-contact assessment of a constituent in semiconductor substrates |
Aug. 12, 2008 |
| 7407821 |
Substrate processing method |
Aug. 5, 2008 |
| 7409260 |
Substrate thickness measuring during polishing |
Aug. 5, 2008 |
| 7405097 |
CMOS image sensor and method for manufacturing the same |
Jul. 29, 2008 |
| 7399711 |
Method for controlling a recess etch process |
Jul. 15, 2008 |
| 7399647 |
Multi beam scanning with bright/dark field imaging |
Jul. 15, 2008 |
| 7381654 |
Method for fabricating right-angle holes in a substrate |
Jun. 3, 2008 |
| 7344900 |
Laser scribe on front side of semiconductor wafer |
Mar. 18, 2008 |
| 7335315 |
Method and device for measuring wafer potential or temperature |
Feb. 26, 2008 |
| 7332438 |
Methods and systems for monitoring a parameter of a measurement device during polishing, damage to a specimen during polishing, or a characteristic of a polishing pad or tool |
Feb. 19, 2008 |
| 7326580 |
Method of observing monolayer ultraviolet decomposition process, method of controlling degree of surface decomposition, and patterning method |
Feb. 5, 2008 |
| 7319944 |
Method for a predicting a pattern shape by using an actual measured dissolution rate of a photosensitive resist |
Jan. 15, 2008 |
| 7316934 |
Personalized hardware |
Jan. 8, 2008 |
| 7316982 |
Controlling carbon nanotubes using optical traps |
Jan. 8, 2008 |
| 7314766 |
Semiconductor wafer treatment method, semiconductor wafer inspection method, semiconductor device development method and semiconductor wafer treatment apparatus |
Jan. 1, 2008 |
| 7311738 |
Positioning apparatus |
Dec. 25, 2007 |
| 7306696 |
Interferometric endpoint determination in a substrate etching process |
Dec. 11, 2007 |
| 7306959 |
Methods of fabricating integrated optoelectronic devices |
Dec. 11, 2007 |
| 7303928 |
Process monitor and system for producing semiconductor |
Dec. 4, 2007 |
| 7297287 |
Method and apparatus for endpoint detection using partial least squares |
Nov. 20, 2007 |
| 7296103 |
Method and system for dynamically selecting wafer lots for metrology processing |
Nov. 13, 2007 |
| 7282374 |
Method and apparatus for comparing device and non-device structures |
Oct. 16, 2007 |
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