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Class Information
Number: 438/696
Name: Semiconductor device manufacturing: process > Chemical etching > Combined with coating step > Coating of sidewall
Description: Processes wherein the chemical etching and material deposition is affected so that only vertically disposed surfaces remain coated with the deposited material.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8232205 Methods of manufacturing a honeycomb extrusion die Jul. 31, 2012
8232212 Within-sequence metrology based process tuning for adaptive self-aligned double patterning Jul. 31, 2012
8227348 Method for patterning nanowires on substrate using novel sacrificial layer material Jul. 24, 2012
8227354 Method of forming semiconductor device patterns Jul. 24, 2012
8220142 Method of forming a housing component Jul. 17, 2012
8222146 Semiconductor device with a line and method of fabrication thereof Jul. 17, 2012
8222159 Manufacturing method of semiconductor device Jul. 17, 2012
8216877 Phase-change memory and fabrication method thereof Jul. 10, 2012
8216942 Method for manufacturing semiconductor device Jul. 10, 2012
8216944 Methods of forming patterns in semiconductor devices Jul. 10, 2012
8211803 Spacer process for on pitch contacts and related structures Jul. 3, 2012
8211787 Semiconductor processing methods Jul. 3, 2012
8202757 Image sensor and method for manufacturing the same Jun. 19, 2012
8192641 Methods for fabricating non-planar electronic devices having sidewall spacers formed adjacent selected surfaces Jun. 5, 2012
8193093 Thru silicon enabled die stacking scheme Jun. 5, 2012
8183158 Semiconductor processing apparatus and method for using same May. 22, 2012
8183112 Method for fabricating semiconductor device with vertical channel May. 22, 2012
8183159 Device component forming method with a trim step prior to sidewall image transfer (SIT) processing May. 22, 2012
8178442 Method of forming patterns of semiconductor device May. 15, 2012
8173547 Silicon etch with passivation using plasma enhanced oxidation May. 8, 2012
8168542 Methods of forming tubular objects May. 1, 2012
8158522 Method of forming a deep trench in a substrate Apr. 17, 2012
8143167 Fabrication processes for forming dual depth trenches using a dry etch that deposits a polymer Mar. 27, 2012
8143132 Transistor including a high-K metal gate electrode structure formed on the basis of a simplified spacer regime Mar. 27, 2012
8138092 Spacer formation for array double patterning Mar. 20, 2012
8138082 Method for forming metal interconnects in a dielectric material Mar. 20, 2012
8138059 Semiconductor device manufacturing method Mar. 20, 2012
8123960 Sub-10 nm line features via rapid graphoepitaxial self-assembly of amphiphilic monolayers Feb. 28, 2012
8117744 Process for forming an isolated electrically conductive contact through a metal package Feb. 21, 2012
8119530 Pattern forming method and semiconductor device manufacturing method Feb. 21, 2012
8120137 Isolation trench structure Feb. 21, 2012
8105950 Method for forming fine patterns using etching slope of hard mask layer in semiconductor device Jan. 31, 2012
8105951 Method for fabricating device pattern Jan. 31, 2012
8105949 Substrate processing method Jan. 31, 2012
8093146 Method of fabricating gate electrode using a hard mask with spacers Jan. 10, 2012
8071484 Method of forming fine pattern employing self-aligned double patterning Dec. 6, 2011
8062980 Method of fabricating semiconductor device Nov. 22, 2011
8064071 Floating sheet measurement apparatus and method Nov. 22, 2011
8057692 Methods of forming fine patterns in the fabrication of semiconductor devices Nov. 15, 2011
8030218 Method for selectively modifying spacing between pitch multiplied structures Oct. 4, 2011
8030154 Method for forming a protection layer over metal semiconductor contact and structure formed thereon Oct. 4, 2011
8026173 Semiconductor structure, in particular phase change memory device having a uniform height heater Sep. 27, 2011
8026176 Film forming method, plasma film forming apparatus and storage medium Sep. 27, 2011
8026179 Patterning method and integrated circuit structure Sep. 27, 2011
8026136 Methods of forming low hydrogen concentration charge-trapping layer structures for non-volatile memory Sep. 27, 2011
8017027 Semiconductor fabricating process Sep. 13, 2011
8012811 Methods of forming features in integrated circuits Sep. 6, 2011
8008204 Method of manufacturing semiconductor device Aug. 30, 2011
8003518 Semiconductor device fabrication method Aug. 23, 2011
8003538 Method for producing a structure on the surface of a substrate Aug. 23, 2011

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