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Class Information
Number: 438/696
Name: Semiconductor device manufacturing: process > Chemical etching > Combined with coating step > Coating of sidewall
Description: Processes wherein the chemical etching and material deposition is affected so that only vertically disposed surfaces remain coated with the deposited material.










Patents under this class:
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Patent Number Title Of Patent Date Issued
8481431 Method for opening one-side contact region of vertical transistor and method for fabricating one-side junction region using the same Jul. 9, 2013
8466066 Method for forming micro-pattern in semiconductor device Jun. 18, 2013
8461048 Fabrication method of minute pattern Jun. 11, 2013
8461049 Method for fabricating semiconductor device Jun. 11, 2013
8455268 Gate replacement with top oxide regrowth for the top oxide improvement Jun. 4, 2013
8455364 Sidewall image transfer using the lithographic stack as the mandrel Jun. 4, 2013
8450212 Method of reducing critical dimension process bias differences between narrow and wide damascene wires May. 28, 2013
8450175 Methods of forming a vertical transistor and at least a conductive line electrically coupled therewith May. 28, 2013
8445381 Oxide-nitride stack gate dielectric May. 21, 2013
8435900 Method for manufacturing a transistor May. 7, 2013
8431492 Memory cell that includes a sidewall collar for pillar isolation and methods of forming the same Apr. 30, 2013
8425789 Method and apparatus for anisotropic etching Apr. 23, 2013
8414785 Methods for fabrication of microfluidic systems on printed circuit boards Apr. 9, 2013
8372751 Method for fabricating side contact in semiconductor device Feb. 12, 2013
8361905 Methods of forming patterns for semiconductor devices Jan. 29, 2013
8361832 Contact for memory cell Jan. 29, 2013
8358010 Method for realizing a nanometric circuit architecture between standard electronic components and semiconductor device obtained with said method Jan. 22, 2013
8354345 Method for forming side contact in semiconductor device through self-aligned damascene process Jan. 15, 2013
8349145 Method of burying metal and apparatus of depositing metal in concave portion Jan. 8, 2013
8349639 Method for manufacturing image sensor Jan. 8, 2013
8349740 Reduced topography-related irregularities during the patterning of two different stress-inducing layers in the contact level of a semiconductor device Jan. 8, 2013
8343875 Methods of forming an integrated circuit with self-aligned trench formation Jan. 1, 2013
8338304 Methods to reduce the critical dimension of semiconductor devices and related semiconductor devices Dec. 25, 2012
8334212 Method of manufacturing a semiconductor device Dec. 18, 2012
8334211 Process for improving critical dimension uniformity of integrated circuit arrays Dec. 18, 2012
8329050 Substrate processing method Dec. 11, 2012
8329585 Method for reducing line width roughness with plasma pre-etch treatment on photoresist Dec. 11, 2012
8324094 Semiconductor device and manufacturing method thereof Dec. 4, 2012
8324110 Field effect transistor (FET) and method of forming the FET without damaging the wafer surface Dec. 4, 2012
8309462 Double spacer quadruple patterning with self-connected hook-up Nov. 13, 2012
8298951 Footing reduction using etch-selective layer Oct. 30, 2012
8298950 Method of etching sacrificial layer Oct. 30, 2012
8298949 Profile and CD uniformity control by plasma oxidation treatment Oct. 30, 2012
8288272 Semiconductor device and manufacturing method thereof Oct. 16, 2012
8283253 Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus Oct. 9, 2012
8273663 Process for anisotropic etching of semiconductors Sep. 25, 2012
8273661 Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus Sep. 25, 2012
8268727 Methods for fabricating FinFET semiconductor devices using planarized spacers Sep. 18, 2012
8263498 Semiconductor device fabricating method, plasma processing system and storage medium Sep. 11, 2012
8263459 Method for forming a floating gate non-volatile memory cell Sep. 11, 2012
8263472 Deep trench electrostatic discharge (ESD) protect diode for silicon-on-insulator (SOI) devices Sep. 11, 2012
8263487 Method of forming patterns of semiconductor device Sep. 11, 2012
8252691 Method of forming semiconductor patterns Aug. 28, 2012
8252681 Methods of forming integrated circuit devices having electrically conductive layers therein with partially nitridated sidewalls Aug. 28, 2012
8252692 Semiconductor device and method of fabricating the same Aug. 28, 2012
8242022 Method for forming fine pattern using quadruple patterning in semiconductor device Aug. 14, 2012
8241511 Substrate processing method Aug. 14, 2012
8242021 Method for manufacturing semiconductor device Aug. 14, 2012
8236696 Transistor and method for fabricating the same Aug. 7, 2012
8236697 Method for manufacturing semiconductor device Aug. 7, 2012

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