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Class Information
Number: 438/696
Name: Semiconductor device manufacturing: process > Chemical etching > Combined with coating step > Coating of sidewall
Description: Processes wherein the chemical etching and material deposition is affected so that only vertically disposed surfaces remain coated with the deposited material.










Patents under this class:
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Patent Number Title Of Patent Date Issued
6300214 Semiconductor processing methods of forming capacitor arrays on a substrate Oct. 9, 2001
6297093 Method of making an electrically programmable memory cell Oct. 2, 2001
6294480 Method for forming an L-shaped spacer with a disposable organic top coating Sep. 25, 2001
6291354 Method of fabricating a semiconductive device Sep. 18, 2001
6291137 Sidewall formation for sidewall patterning of sub 100 nm structures Sep. 18, 2001
6287962 Method for making a novel graded silicon nitride/silicon oxide (SNO) hard mask for improved deep sub-micrometer semiconductor processing Sep. 11, 2001
6274936 Method for forming a contact during the formation of a semiconductor device Aug. 14, 2001
6271142 Process for manufacture of trench DRAM capacitor buried plates Aug. 7, 2001
6271113 Method for forming wiring in semiconductor device Aug. 7, 2001
6261968 Method of forming a self-aligned contact hole on a semiconductor wafer Jul. 17, 2001
6251470 Methods of forming insulating materials, and methods of forming insulating materials around a conductive component Jun. 26, 2001
6251789 Selective slurries for the formation of conductive structures Jun. 26, 2001
6245682 Removal of SiON ARC film after poly photo and etch Jun. 12, 2001
6242354 Semiconductor device with self aligned contacts having integrated silicide stringer removal and method thereof Jun. 5, 2001
6239042 Process for realizing an intermediate dielectric layer for enhancing the planarity in semiconductor electronic devices May. 29, 2001
6238936 Method of using critical dimension mapping to qualify a new integrated circuit fabrication etch process May. 29, 2001
6235638 Simplified etching technique for producing multiple undercut profiles May. 22, 2001
6235637 Method for marking a wafer without inducing flat edge particle problem May. 22, 2001
6228762 Methods for forming contact holes having sidewalls with smooth profiles May. 8, 2001
6227211 Uniformity improvement of high aspect ratio contact by stop layer May. 8, 2001
6225229 Removable photoresist spacers in CMOS transistor fabrication May. 1, 2001
6225228 Silicon oxide co-deposition/etching process May. 1, 2001
6221564 Method for forming a spacer out of photosensitive material Apr. 24, 2001
6221778 Method of fabricating a semiconductor device Apr. 24, 2001
6218275 Process for forming self-aligned contact of semiconductor device Apr. 17, 2001
6218251 Asymmetrical IGFET devices with spacers formed by HDP techniques Apr. 17, 2001
6210595 Method for producing structures having a high aspect ratio and structure having a high aspect ratio Apr. 3, 2001
6207544 Method of fabricating ultra thin nitride spacers and device incorporating same Mar. 27, 2001
6194325 Oxide etch process with high selectivity to nitride suitable for use on surfaces of uneven topography Feb. 27, 2001
6190961 Fabricating a square spacer Feb. 20, 2001
6191041 Method of fabricating semiconductor device Feb. 20, 2001
6180488 Method of forming separating region of semiconductor device Jan. 30, 2001
6180517 Method of forming submicron contacts and vias in an integrated circuit Jan. 30, 2001
6165883 Method for forming multilayer sidewalls on a polymetal stack gate electrode Dec. 26, 2000
6165913 Manufacturing method for spacer Dec. 26, 2000
6156663 Method and apparatus for plasma processing Dec. 5, 2000
6156662 Fabrication process of a liquid crystal display device with improved yield Dec. 5, 2000
6156664 Method of manufacturing liner insulating layer Dec. 5, 2000
6153527 Semiconductor processing method of making electrical contact to a node received within a mass of insulating dielectric material Nov. 28, 2000
6153478 STI process for eliminating kink effect Nov. 28, 2000
6150275 Micromechanical system fabrication method using (111) single crystalline silicon Nov. 21, 2000
6150273 Method of fabricating a kink-effect-free shallow trench isolations Nov. 21, 2000
6150276 Method for fabricating metal-oxide semiconductor transistor Nov. 21, 2000
6146913 Method for making enhanced performance field effect devices Nov. 14, 2000
6140168 Method of fabricating self-aligned contact window Oct. 31, 2000
6136716 Method for manufacturing a self-aligned stacked storage node DRAM cell Oct. 24, 2000
6136700 Method for enhancing the performance of a contact Oct. 24, 2000
6130165 Autoaligned etching process for realizing word lines in memory devices integrated semiconductor substrates Oct. 10, 2000
6124175 Rapid thermal anneal with a gaseous dopant species Sep. 26, 2000
6124208 Method of preventing bowing in a via formation process Sep. 26, 2000

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