 |
|
 |
| |
 |
|
Class Information
Number: 438/695
Name: Semiconductor device manufacturing: process > Chemical etching > Combined with coating step > Simultaneous etching and coating
Description: Processes wherein the chemical etching and material deposition occur concurrently.
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7371671 |
System and method for photolithography in semiconductor manufacturing |
May. 13, 2008 |
| 7358184 |
Method of forming a conductive via plug |
Apr. 15, 2008 |
| 7345002 |
Replication and transfer of microstructures and nanostructures |
Mar. 18, 2008 |
| 7300878 |
Gas switching during an etch process to modulate the characteristics of the etch |
Nov. 27, 2007 |
| 7297640 |
Method for reducing argon diffusion from high density plasma films |
Nov. 20, 2007 |
| 7294578 |
Use of a plasma source to form a layer during the formation of a semiconductor device |
Nov. 13, 2007 |
| 7291561 |
MEMS device integrated chip package, and method of making same |
Nov. 6, 2007 |
| 7279425 |
Polishing method |
Oct. 9, 2007 |
| 7271101 |
High density plasma chemical vapor deposition process |
Sep. 18, 2007 |
| 7256134 |
Selective etching of carbon-doped low-k dielectrics |
Aug. 14, 2007 |
| 7256121 |
Contact resistance reduction by new barrier stack process |
Aug. 14, 2007 |
| 7244679 |
Methods of forming silicon quantum dots and methods of fabricating semiconductor memory devices using the same |
Jul. 17, 2007 |
| 7235478 |
Polymer spacer formation |
Jun. 26, 2007 |
| 7226852 |
Preventing damage to low-k materials during resist stripping |
Jun. 5, 2007 |
| 7226869 |
Methods for protecting silicon or silicon carbide electrode surfaces from morphological modification during plasma etch processing |
Jun. 5, 2007 |
| 7217945 |
Method to selectively increase the top resistance of the lower programming electrode in a phase-change memory cell and structures obtained thereby |
May. 15, 2007 |
| 7205240 |
HDP-CVD multistep gapfill process |
Apr. 17, 2007 |
| 7199046 |
Structure comprising tunable anti-reflective coating and method of forming thereof |
Apr. 3, 2007 |
| 7192871 |
Semiconductor device with a line and method of fabrication thereof |
Mar. 20, 2007 |
| 7183171 |
Pyramid-shaped capacitor structure |
Feb. 27, 2007 |
| 7183214 |
High-density plasma (HDP) chemical vapor deposition (CVD) methods and methods of fabricating semiconductor devices employing the same |
Feb. 27, 2007 |
| 7179735 |
Method of manufacturing semiconductor device |
Feb. 20, 2007 |
| 7160810 |
Method for forming interlayer insulation film in semiconductor device |
Jan. 9, 2007 |
| 7160809 |
Process and device for the deposition of an at least partially crystalline silicium layer on a substrate |
Jan. 9, 2007 |
| 7157123 |
Plasma-enhanced film deposition |
Jan. 2, 2007 |
| 7153771 |
Method for forming metal contact in semiconductor device |
Dec. 26, 2006 |
| 7153778 |
Methods of forming openings, and methods of forming container capacitors |
Dec. 26, 2006 |
| 7141503 |
Methods for manufacturing a soft error and defect resistant pre-metal dielectric layer |
Nov. 28, 2006 |
| 7138336 |
Plasma enhanced atomic layer deposition (PEALD) equipment and method of forming a conducting thin film using the same thereof |
Nov. 21, 2006 |
| 7132134 |
Staggered in-situ deposition and etching of a dielectric layer for HDP CVD |
Nov. 7, 2006 |
| 7125804 |
Etching methods and apparatus and substrate assemblies produced therewith |
Oct. 24, 2006 |
| 7125496 |
Etching method using photoresist etch barrier |
Oct. 24, 2006 |
| 7115516 |
Method of depositing a material layer |
Oct. 3, 2006 |
| 7112243 |
Method for producing Group III nitride compound semiconductor |
Sep. 26, 2006 |
| 7109090 |
Pyramid-shaped capacitor structure |
Sep. 19, 2006 |
| 7105449 |
Method for cleaning substrate and method for producing semiconductor device |
Sep. 12, 2006 |
| 7091098 |
Semiconductor device with spacer having batch and non-batch layers |
Aug. 15, 2006 |
| 7087530 |
Aqueous dispersion for chemical mechanical polishing |
Aug. 8, 2006 |
| 7084059 |
CMP system for metal deposition |
Aug. 1, 2006 |
| 7078296 |
Self-aligned trench MOSFETs and methods for making the same |
Jul. 18, 2006 |
| 7078346 |
High density plasma chemical vapor deposition process |
Jul. 18, 2006 |
| 7074723 |
Method of plasma etching a deeply recessed feature in a substrate using a plasma source gas modulated etchant system |
Jul. 11, 2006 |
| 7071110 |
Process for the plasma etching of materials not containing silicon |
Jul. 4, 2006 |
| 7052552 |
Gas chemistry cycling to achieve high aspect ratio gapfill with HDP-CVD |
May. 30, 2006 |
| 7045450 |
Method of manufacturing semiconductor device |
May. 16, 2006 |
| 7037803 |
Manufacture of semiconductor device having STI and semiconductor device manufactured |
May. 2, 2006 |
| 7033943 |
Etching solution, etching method and method for manufacturing semiconductor device |
Apr. 25, 2006 |
| 7026244 |
Low resistance and reliable copper interconnects by variable doping |
Apr. 11, 2006 |
| 7022609 |
Manufacturing method of a semiconductor substrate provided with a through hole electrode |
Apr. 4, 2006 |
| 7018780 |
Methods for controlling and reducing profile variation in photoresist trimming |
Mar. 28, 2006 |
|
|
|
 |
|
 |
|
| |
Randomly Featured Patents |
|
