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Class Information
Number: 438/695
Name: Semiconductor device manufacturing: process > Chemical etching > Combined with coating step > Simultaneous etching and coating
Description: Processes wherein the chemical etching and material deposition occur concurrently.










Patents under this class:
1 2 3 4 5 6 7 8 9 10 11

Patent Number Title Of Patent Date Issued
8709866 Methods of forming integrated circuit packages Apr. 29, 2014
8691698 Controlled gas mixing for smooth sidewall rapid alternating etch process Apr. 8, 2014
8691622 Memory cells and methods of forming memory cells Apr. 8, 2014
8684793 Oxidizing particles based slurry for nobel metal including ruthenium chemical mechanical planarization Apr. 1, 2014
8680586 Semiconductor light emitting device including GaAs substrate and method for manufacturing the same Mar. 25, 2014
8652342 Semiconductor fabrication apparatuses to perform semiconductor etching and deposition processes and methods of forming semiconductor device using the same Feb. 18, 2014
8642483 Substrate processing with shrink etching step Feb. 4, 2014
8628676 Plasma etching method Jan. 14, 2014
8609542 Profiling solid state samples Dec. 17, 2013
8598037 Silicon etch with passivation using plasma enhanced oxidation Dec. 3, 2013
8568877 Porous and non-porous nanostructures Oct. 29, 2013
8557706 Substrate processing method Oct. 15, 2013
8546265 Method, apparatus and program for manufacturing silicon structure Oct. 1, 2013
8530316 Method for fabricating a semiconductor device Sep. 10, 2013
8518282 Method of controlling etch microloading for a tungsten-containing layer Aug. 27, 2013
8513130 Semiconductor substrate and method of fabricating semiconductor device Aug. 20, 2013
8491799 Method for forming magnetic tunnel junction cell Jul. 23, 2013
8481411 Method of manufacturing a semiconductor substrate having a cavity Jul. 9, 2013
8476162 Methods of forming layers on substrates Jul. 2, 2013
8470713 Nitride etch for improved spacer uniformity Jun. 25, 2013
8466067 Post-planarization densification Jun. 18, 2013
8449731 Method and apparatus for increasing local plasma density in magnetically confined plasma May. 28, 2013
8435902 Invertable pattern loading with dry etch May. 7, 2013
8425789 Method and apparatus for anisotropic etching Apr. 23, 2013
8414787 Electron beam processing device and method using carbon nanotube emitter Apr. 9, 2013
8394720 Plasma processing method and resist pattern modifying method Mar. 12, 2013
8389410 Chemical mechanical polishing method Mar. 5, 2013
8387230 Method of making an ultrasonic transducer system Mar. 5, 2013
8383516 Semiconductor device and method for manufacturing the same Feb. 26, 2013
8377784 Method for fabricating a semiconductor device Feb. 19, 2013
8349740 Reduced topography-related irregularities during the patterning of two different stress-inducing layers in the contact level of a semiconductor device Jan. 8, 2013
8349145 Method of burying metal and apparatus of depositing metal in concave portion Jan. 8, 2013
8329587 Post-planarization densification Dec. 11, 2012
8300299 MEMS devices with multi-component sacrificial layers Oct. 30, 2012
8288287 Etching method and etching equipment Oct. 16, 2012
8278176 Selective epitaxial formation of semiconductor films Oct. 2, 2012
8263497 High-yield method of exposing and contacting through-silicon vias Sep. 11, 2012
8263472 Deep trench electrostatic discharge (ESD) protect diode for silicon-on-insulator (SOI) devices Sep. 11, 2012
8252698 Substrate processing method Aug. 28, 2012
8236667 Silicon on insulator (SOI) wafer and process for producing same Aug. 7, 2012
8222146 Semiconductor device with a line and method of fabrication thereof Jul. 17, 2012
8216482 Method of manufacturing inkjet printhead Jul. 10, 2012
8217495 High-frequency bridge suspended diode Jul. 10, 2012
8211804 Methods of forming a hole having a vertical profile and semiconductor devices having a vertical hole Jul. 3, 2012
8207532 Constant and reducible hole bottom CD in variable post-CMP thickness and after-development-inspection CD Jun. 26, 2012
8187975 Hydrochloric acid etch and low temperature epitaxy in a single chamber for raised source-drain fabrication May. 29, 2012
8183157 Method of forming capacitors, and methods of utilizing silicon dioxide-containing masking structures May. 22, 2012
8153527 Method for reducing sidewall etch residue Apr. 10, 2012
8143167 Fabrication processes for forming dual depth trenches using a dry etch that deposits a polymer Mar. 27, 2012
8119530 Pattern forming method and semiconductor device manufacturing method Feb. 21, 2012

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