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Class Information
Number: 438/694
Name: Semiconductor device manufacturing: process > Chemical etching > Combined with coating step
Description: Processes additionally having a step of depositing a material onto the semiconductive substrate.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5425846 |
Removal of substrate perimeter material |
Jun. 20, 1995 |
| 5420056 |
Junction contact process and structure for semiconductor technologies |
May. 30, 1995 |
| 5419807 |
Method of providing electrical interconnect between two layers within a silicon substrate, semiconductor apparatus, and method of forming apparatus for testing semiconductor circuitry for oper |
May. 30, 1995 |
| 5407867 |
Method of forming a thin film on surface of semiconductor substrate |
Apr. 18, 1995 |
| 5407869 |
Method of passivating group III-V surfaces |
Apr. 18, 1995 |
| 5405492 |
Method and apparatus for time-division plasma chopping in a multi-channel plasma processing equipment |
Apr. 11, 1995 |
| 5403436 |
Plasma treating method using hydrogen gas |
Apr. 4, 1995 |
| 5401356 |
Method and equipment for plasma processing |
Mar. 28, 1995 |
| 5401357 |
Dry etching method |
Mar. 28, 1995 |
| 5385636 |
Method of forming a metal contact on a projection on a semiconductor substrate |
Jan. 31, 1995 |
| 5384008 |
Process and apparatus for full wafer deposition |
Jan. 24, 1995 |
| 5380399 |
Method of treating semiconductor substrates |
Jan. 10, 1995 |
| 5378311 |
Method of producing semiconductor device |
Jan. 3, 1995 |
| 5376223 |
Plasma etch process |
Dec. 27, 1994 |
| 5366934 |
Method for sulfide surface passivation |
Nov. 22, 1994 |
| 5362685 |
Method for achieving a high quality thin oxide in integrated circuit devices |
Nov. 8, 1994 |
| 5352634 |
Process for fabricating an active matrix circuit |
Oct. 4, 1994 |
| 5350491 |
Oxide removal method for improvement of subsequently grown oxides for a twin-tub CMOS process |
Sep. 27, 1994 |
| 5350492 |
Oxide removal method for improvement of subsequently grown oxides |
Sep. 27, 1994 |
| 5346586 |
Method for selectively etching polysilicon to gate oxide using an insitu ozone photoresist strip |
Sep. 13, 1994 |
| 5344522 |
Pattern forming process and process for preparing semiconductor device utilizing said pattern forming process |
Sep. 6, 1994 |
| 5342808 |
Aperture size control for etched vias and metal contacts |
Aug. 30, 1994 |
| 5332697 |
Formation of silicon nitride by nitridation of porous silicon |
Jul. 26, 1994 |
| 5330616 |
Electric device provided with carbon pattern structure and manufacturing method for the same |
Jul. 19, 1994 |
| 5328871 |
Manufacturing process for semiconductor device |
Jul. 12, 1994 |
| 5316640 |
Fabricating method of micro lens |
May. 31, 1994 |
| 5306672 |
Method of manufacturing a semiconductor device wherein natural oxide film is removed from the surface of silicon substrate with HF gas |
Apr. 26, 1994 |
| 5302241 |
Post etching treatment of semiconductor devices |
Apr. 12, 1994 |
| 5294572 |
Method and apparatus for depositing a layer on a substrate |
Mar. 15, 1994 |
| 5284805 |
Rapid-switching rotating disk reactor |
Feb. 8, 1994 |
| 5283205 |
Method for manufacturing a semiconductor device on a substrate having an anisotropic expansion/contraction characteristic |
Feb. 1, 1994 |
| 5275692 |
Method for fabricating integrated circuits |
Jan. 4, 1994 |
| 5269879 |
Method of etching vias without sputtering of underlying electrically conductive layer |
Dec. 14, 1993 |
| 5259926 |
Method of manufacturing a thin-film pattern on a substrate |
Nov. 9, 1993 |
| 5238871 |
Method of manufacturing a semiconductor device |
Aug. 24, 1993 |
| 5234864 |
Method for interconnecting layers in a semiconductor device using two etching gases |
Aug. 10, 1993 |
| 5229334 |
Method of forming a gate insulating film involving a step of cleaning using an ammonia-peroxide solution |
Jul. 20, 1993 |
| 5229320 |
Method for forming quantum dots |
Jul. 20, 1993 |
| 5225036 |
Method of manufacturing semiconductor device |
Jul. 6, 1993 |
| 5223443 |
Method for determining wafer cleanliness |
Jun. 29, 1993 |
| 5213996 |
Method and apparatus for forming interconnection pattern and semiconductor device having such interconnection pattern |
May. 25, 1993 |
| 5211987 |
Method and apparatus for forming refractory metal films |
May. 18, 1993 |
| 5208066 |
Process of forming a patterned polyimide film and articles including such a film |
May. 4, 1993 |
| 5200347 |
Method for improving the radiation hardness of an integrated circuit bipolar transistor |
Apr. 6, 1993 |
| 5196376 |
Laser lithography for integrated circuit and integrated circuit interconnect manufacture |
Mar. 23, 1993 |
| 5188705 |
Method of semiconductor device manufacture |
Feb. 23, 1993 |
| 5188986 |
Hydrogen peroxide in basic solution to clean polycrystalline silicon after phosphorous diffusion |
Feb. 23, 1993 |
| 5185296 |
Method for forming a dielectric thin film or its pattern of high accuracy on a substrate |
Feb. 9, 1993 |
| 5177031 |
Method of passivating etched mirror facets of semiconductor laser diodes |
Jan. 5, 1993 |
| 5167762 |
Anisotropic etch method |
Dec. 1, 1992 |
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