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Class Information
Number: 438/694
Name: Semiconductor device manufacturing: process > Chemical etching > Combined with coating step
Description: Processes additionally having a step of depositing a material onto the semiconductive substrate.
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5707888 |
Oxide formed in semiconductor substrate by implantation of substrate with a noble gas prior to oxidation |
Jan. 13, 1998 |
| 5705025 |
Method for dry etching of a semiconductor substrate |
Jan. 6, 1998 |
| 5702566 |
Conductive photoresist to mitigate antenna effect |
Dec. 30, 1997 |
| 5696014 |
Method for increasing capacitance of an HSG rugged capacitor using a phosphine rich oxidation and subsequent wet etch |
Dec. 9, 1997 |
| 5688723 |
Method of forming fine patterns |
Nov. 18, 1997 |
| 5688365 |
Method of making semiconductor device |
Nov. 18, 1997 |
| 5685949 |
Plasma treatment apparatus and method |
Nov. 11, 1997 |
| 5676853 |
Mask for forming features on a semiconductor substrate and a method for forming the mask |
Oct. 14, 1997 |
| 5674356 |
Method for forming a semiconductor device in which an anti reflective layer is formed by varying the composition thereof |
Oct. 7, 1997 |
| 5674409 |
Nanolithographic method of forming fine lines |
Oct. 7, 1997 |
| 5667941 |
Process for fabricating semiconductor integrated circuit device, and exposing system and mask inspecting method to be used in the process |
Sep. 16, 1997 |
| 5665200 |
Substrate processing method and substrate processing apparatus |
Sep. 9, 1997 |
| 5652175 |
Method for manufacturing a fuse structure |
Jul. 29, 1997 |
| 5643834 |
Process for manufacturing a semiconductor substrate comprising laminated copper, silicon oxide and silicon nitride layers |
Jul. 1, 1997 |
| 5641715 |
Semiconductor IC device fabricating method |
Jun. 24, 1997 |
| 5639341 |
Dry etching with less particles |
Jun. 17, 1997 |
| 5628869 |
Plasma enhanced chemical vapor reactor with shaped electrodes |
May. 13, 1997 |
| 5609772 |
Cube maskless lead open process using chemical mechanical polish/lead-tip expose process |
Mar. 11, 1997 |
| 5610104 |
Method of providing a mark for identification on a silicon surface |
Mar. 11, 1997 |
| 5605602 |
Method and device for removing a thin film from a wafer backside surface |
Feb. 25, 1997 |
| 5604154 |
Method of manufacturing coulamb blockade element using thermal oxidation |
Feb. 18, 1997 |
| 5601686 |
Wafer transport method |
Feb. 11, 1997 |
| 5599748 |
Method of passivating group III-V surfaces |
Feb. 4, 1997 |
| 5593813 |
Method for forming submicroscopic patterns |
Jan. 14, 1997 |
| RE35420 |
Method of increasing capacitance by surface roughening in semiconductor wafer processing |
Jan. 7, 1997 |
| 5589422 |
Controlled, gas phase process for removal of trace metal contamination and for removal of a semiconductor layer |
Dec. 31, 1996 |
| 5567659 |
Method of etching patterns in III-V material with accurate depth control |
Oct. 22, 1996 |
| 5565370 |
Method of enhancing the current gain of bipolar junction transistors |
Oct. 15, 1996 |
| 5561076 |
Method of fabricating an isolation region for a semiconductor device using liquid phase deposition |
Oct. 1, 1996 |
| 5550007 |
Surface-imaging technique for lithographic processes for device fabrication |
Aug. 27, 1996 |
| 5545289 |
Passivating, stripping and corrosion inhibition of semiconductor substrates |
Aug. 13, 1996 |
| 5522957 |
Method for leak detection in etching chambers |
Jun. 4, 1996 |
| 5523261 |
Method of cleaning high density inductively coupled plasma chamber using capacitive coupling |
Jun. 4, 1996 |
| 5514246 |
Plasma reactors and method of cleaning a plasma reactor |
May. 7, 1996 |
| 5508234 |
Microcavity structures, fabrication processes, and applications thereof |
Apr. 16, 1996 |
| 5506172 |
Semiconductor processing method of forming an electrical interconnection between an outer layer and an inner layer |
Apr. 9, 1996 |
| 5502008 |
Method for forming metal plug and/or wiring metal layer |
Mar. 26, 1996 |
| 5492854 |
Method of manufacturing semiconductor device |
Feb. 20, 1996 |
| 5491112 |
Method and arrangement for treating silicon plates |
Feb. 13, 1996 |
| 5486267 |
Method for applying photoresist |
Jan. 23, 1996 |
| 5484687 |
Polysilphenylenesiloxane, production process thereof, and resist material and semiconductor device formed thereof |
Jan. 16, 1996 |
| 5474641 |
Processing method and apparatus thereof |
Dec. 12, 1995 |
| 5468685 |
Method for producing a semiconductor integrated circuit |
Nov. 21, 1995 |
| 5454915 |
Method of fabricating porous silicon carbide (SiC) |
Oct. 3, 1995 |
| 5439847 |
Integrated circuit fabrication with a raised feature as mask |
Aug. 8, 1995 |
| 5437961 |
Method of manufacturing semiconductor device |
Aug. 1, 1995 |
| 5431778 |
Dry etch method using non-halocarbon source gases |
Jul. 11, 1995 |
| 5426073 |
Method of fabricating semiconductor devices using an intermediate grinding step |
Jun. 20, 1995 |
| 5425842 |
Method of manufacturing a semiconductor device using a chemical vapour deposition process with plasma cleaning of the reactor chamber |
Jun. 20, 1995 |
| 5425843 |
Process for semiconductor device etch damage reduction using hydrogen-containing plasma |
Jun. 20, 1995 |
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