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Class Information
Number: 438/691
Name: Semiconductor device manufacturing: process > Chemical etching > Combined with the removal of material by nonchemical means (e.g., ablating, abrading, etc.) > Combined mechanical and chemical material removal
Description: Processes wherein the nonchemical material removal is a mechanical (e.g., abrading, cutting, etc.) removal method.










Sub-classes under this class:

Class Number Class Name Patents
438/692 Simultaneous (e.g., chemical-mechanical polishing, etc.) 2,959


Patents under this class:

Patent Number Title Of Patent Date Issued
8703004 Method for chemical planarization and chemical planarization apparatus Apr. 22, 2014
8685270 Method for producing a semiconductor wafer Apr. 1, 2014
8681307 Insulated gate transistor, active matrix substrate, liquid crystal display device, and method for producing the same Mar. 25, 2014
8679980 Aqueous metal polishing agent comprising a polymeric abrasiv containing pendant functional groups and its use in a CMP process Mar. 25, 2014
8679355 MEMS element Mar. 25, 2014
8673784 Method for producing silicon epitaxial wafer Mar. 18, 2014
8673783 Metal conductor chemical mechanical polish Mar. 18, 2014
8673781 Plasma etching method Mar. 18, 2014
8673660 Method of producing liquid ejection head Mar. 18, 2014
8669184 Method for improving flatness of a layer deposited on polycrystalline layer Mar. 11, 2014
8652967 Adjuvant for controlling polishing selectivity and chemical mechanical polishing slurry comprising the same Feb. 18, 2014
8647985 Method for polishing a substrate composed of semiconductor material Feb. 11, 2014
8642445 Method and apparatus for reducing package warpage Feb. 4, 2014
8641920 Polishing composition for planarizing metal layer Feb. 4, 2014
8629064 Multiple patterning lithography using spacer and self-aligned assist patterns Jan. 14, 2014
8629063 Forming features on a substrate having varying feature densities Jan. 14, 2014
8617994 Polishing liquid composition Dec. 31, 2013
8609480 Methods of forming isolation structures on FinFET semiconductor devices Dec. 17, 2013
8592313 Polishing method and polishing apparatus Nov. 26, 2013
8586481 Chemical planarization of copper wafer polishing Nov. 19, 2013
8563436 Chemical mechanical polishing composition and methods relating thereto Oct. 22, 2013
8563361 Packaging method of molded wafer level chip scale package (WLCSP) Oct. 22, 2013
8552510 Semiconductor device having ring-shaped gate electrode, design apparatus, and program Oct. 8, 2013
8546261 Slurry for polishing and planarization method of insulating layer using the same Oct. 1, 2013
8546260 Fabric containing non-crimped fibers and methods of manufacture Oct. 1, 2013
8541309 Processing assembly for semiconductor workpiece and methods of processing same Sep. 24, 2013
8540894 Polishing composition Sep. 24, 2013
8529778 Large area patterning of nano-sized shapes Sep. 10, 2013
8524604 Method for forming fine pattern of semiconductor device Sep. 3, 2013
8524587 Non-uniformity reduction in semiconductor planarization Sep. 3, 2013
8518297 Polishing composition and polishing method using the same Aug. 27, 2013
8518296 Slurries and methods for polishing phase change materials Aug. 27, 2013
8518135 Polishing composition containing hybrid abrasive for nickel-phosphorous coated memory disks Aug. 27, 2013
8513127 Chemical mechanical planarization processes for fabrication of FinFET devices Aug. 20, 2013
8513126 Slurry composition having tunable dielectric polishing selectivity and method of polishing a substrate Aug. 20, 2013
8506832 Wafer dividing apparatus and methods Aug. 13, 2013
8501625 Polishing liquid for metal film and polishing method Aug. 6, 2013
8501579 Process of fabricating chip Aug. 6, 2013
8501028 Method for grinding a semiconductor wafer Aug. 6, 2013
8497210 Shallow trench isolation chemical mechanical planarization Jul. 30, 2013
8496843 Method of polishing a substrate comprising polysilicon and at least one of silicon oxide and silicon nitride Jul. 30, 2013
8492277 Method of polishing a substrate comprising polysilicon and at least one of silicon oxide and silicon nitride Jul. 23, 2013
8492276 Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method Jul. 23, 2013
8491808 Method of polishing a substrate comprising polysilicon, silicon oxide and silicon nitride Jul. 23, 2013
8486837 Polishing slurry for metal, and polishing method Jul. 16, 2013
8481428 Polishing slurry and polishing method Jul. 9, 2013
8480920 Chemical mechanical polishing aqueous dispersion, method of preparing the same, chemical mechanical polishing aqueous dispersion preparation kit, and chemical mechanical polishing method Jul. 9, 2013
8480454 Glass substrate for information recording medium and method for manufacturing the same Jul. 9, 2013
8455362 Chemical mechanical polishing method Jun. 4, 2013
8454852 Chamfering apparatus for silicon wafer, method for producing silicon wafer, and etched silicon wafer Jun. 4, 2013











 
 
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