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Class Information
Number: 438/691
Name: Semiconductor device manufacturing: process > Chemical etching > Combined with the removal of material by nonchemical means (e.g., ablating, abrading, etc.) > Combined mechanical and chemical material removal
Description: Processes wherein the nonchemical material removal is a mechanical (e.g., abrading, cutting, etc.) removal method.


Sub-classes under this class:

Class Number Class Name Patents
438/692 Simultaneous (e.g., chemical-mechanical polishing, etc.) 2,384


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16

Patent Number Title Of Patent Date Issued
7615475 Method for fabricating landing polysilicon contact structures for semiconductor devices Nov. 10, 2009
7611552 Semiconductor polishing composition Nov. 3, 2009
7601642 Method of processing silicon wafer Oct. 13, 2009
7597729 Polishing composition and polishing method using the same Oct. 6, 2009
7598175 Apparatus and method for confined area planarization Oct. 6, 2009
7589022 Method of chemical mechanical polishing and method of fabricating semiconductor device using the same Sep. 15, 2009
7589023 Method of manufacturing semiconductor wafer Sep. 15, 2009
7585341 Polishing material comprising diamond clusters Sep. 8, 2009
7582127 Polishing composition for a tungsten-containing substrate Sep. 1, 2009
7582221 Wafer manufacturing method, polishing apparatus, and wafer Sep. 1, 2009
7579279 Method to passivate conductive surfaces during semiconductor processing Aug. 25, 2009
7575615 Process for preparing a polishing composition Aug. 18, 2009
7572693 Methods for transistor formation using selective gate implantation Aug. 11, 2009
7563716 Polishing method Jul. 21, 2009
7557041 Apparatus and method for supplying chemicals Jul. 7, 2009
7556972 Detection and characterization of SiCOH-based dielectric materials during device fabrication Jul. 7, 2009
7553430 Polishing slurries and methods for chemical mechanical polishing Jun. 30, 2009
7553700 Chemical-enhanced package singulation process Jun. 30, 2009
7553768 Substrate and a method for polishing a substrate Jun. 30, 2009
7550020 Chemical mechanical polishing aqueous dispersion and chemical mechanical polishing method Jun. 23, 2009
7550092 Chemical mechanical polishing composition Jun. 23, 2009
7550387 Semiconductor wafer processing method Jun. 23, 2009
7544617 Die scale control of chemical mechanical polishing Jun. 9, 2009
7544618 Two-step chemical mechanical polishing process Jun. 9, 2009
7544606 Method to implement stress free polishing Jun. 9, 2009
7541287 Method for machining a semiconductor wafer on both sides in a carrier, carrier, and a semiconductor wafer produced by the method Jun. 2, 2009
7538028 Barrier layer, IC via, and IC line forming methods May. 26, 2009
7534719 Method for reduction in metal dishing after CMP May. 19, 2009
7534277 Slurry composition for secondary polishing of silicon wafer May. 19, 2009
7524347 CMP composition comprising surfactant Apr. 28, 2009
7521363 MEMS device with non-standard profile Apr. 21, 2009
7514363 Chemical-mechanical planarization composition having benzenesulfonic acid and per-compound oxidizing agents, and associated method for use Apr. 7, 2009
7513920 Free radical-forming activator attached to solid and used to enhance CMP formulations Apr. 7, 2009
7510973 Method for forming fine pattern in semiconductor device Mar. 31, 2009
7510972 Method of processing substrate, post-chemical mechanical polishing cleaning method, and method of and program for manufacturing electronic device Mar. 31, 2009
7510970 Process for manufacturing semiconductor integrated circuit device Mar. 31, 2009
7504337 IC chip uniform delayering methods Mar. 17, 2009
7501035 Method of manufacturing replica diffraction grating Mar. 10, 2009
7501051 Electropolishing electrolyte and method for planarizing a metal layer using the same Mar. 10, 2009
7498263 Method of planarizing an inter-metal insulation film Mar. 3, 2009
7485162 Polishing composition Feb. 3, 2009
7476613 Method of forming an electrical contact in a semiconductor device using an improved self-aligned contact (SAC) process Jan. 13, 2009
7475368 Deflection analysis system and method for circuit design Jan. 6, 2009
7456106 Method for producing a silicon wafer Nov. 25, 2008
7452816 Semiconductor processing method and chemical mechanical polishing methods Nov. 18, 2008
7452481 Polishing slurry and method of reclaiming wafers Nov. 18, 2008
7446020 Wafer dividing method and dividing apparatus Nov. 4, 2008
7446039 Integrated circuit system with dummy region Nov. 4, 2008
7446045 Method of manufacturing nitride substrate for semiconductors Nov. 4, 2008
7442646 Slurry, chemical mechanical polishing method using the slurry, and method of forming metal wiring using the slurry Oct. 28, 2008

1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16


 
 
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