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Class Information
Number: 438/689
Name: Semiconductor device manufacturing: process > Chemical etching
Description: Processes having a step of removing material from a semiconductor substrate through the action of a chemical agent, wherein the intent is to use the electrical properties of the semiconductor for at least one of the purposes outlined in section I, C, of the class definition for this class (438).
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7022607 |
Mask and its manufacturing method, and method for manufacturing semiconductor device |
Apr. 4, 2006 |
| 7018575 |
Method for assembly of complementary-shaped receptacle site and device microstructures |
Mar. 28, 2006 |
| 7018925 |
Post high voltage gate oxide pattern high-vacuum outgas surface treatment |
Mar. 28, 2006 |
| 7015141 |
Semiconductor device and manufacturing method thereof |
Mar. 21, 2006 |
| 7014535 |
Carrier head having low-friction coating and planarizing machine using same |
Mar. 21, 2006 |
| 7015135 |
Method and system for reducing contact defects using non conventional contact formation method for semiconductor cells |
Mar. 21, 2006 |
| 7015142 |
Patterned thin film graphite devices and method for making same |
Mar. 21, 2006 |
| 7008551 |
Low loss optical waveguide device |
Mar. 7, 2006 |
| 7008547 |
Solid phase sensors |
Mar. 7, 2006 |
| 7005318 |
Mounted circuit substrate and method for fabricating the same for surface layer pads that can withstand pad erosion by molten solder applied over a plurality of times |
Feb. 28, 2006 |
| 7005381 |
Method for flat electrodes |
Feb. 28, 2006 |
| 7005380 |
Simultaneous formation of device and backside contacts on wafers having a buried insulator layer |
Feb. 28, 2006 |
| 6998349 |
System, method and apparatus for automatic control of an RF generator for maximum efficiency |
Feb. 14, 2006 |
| 6993814 |
Method of fabricating a capacitor having sidewall spacer protecting the dielectric layer |
Feb. 7, 2006 |
| 6992008 |
Method of making a substrate having buried structure and method for fabricating a display device including the substrate |
Jan. 31, 2006 |
| 6992007 |
Method of cleaning damascene structure of semiconductor wafer during fabrication of semiconductor device |
Jan. 31, 2006 |
| 6989330 |
Semiconductor device and method of manufacture thereof |
Jan. 24, 2006 |
| 6989058 |
Use of thin SOI to inhibit relaxation of SiGe layers |
Jan. 24, 2006 |
| 6984585 |
Method for removal of residue from a magneto-resistive random access memory (MRAM) film stack using a sacrificial mask layer |
Jan. 10, 2006 |
| 6984587 |
Integrated polishing and electroless deposition |
Jan. 10, 2006 |
| 6984613 |
Post chemical mechanical polishing cleaning solution for 2.45T CoFeNi structures of thin film magnetic heads |
Jan. 10, 2006 |
| 6984875 |
Semiconductor device with improved reliability and manufacturing method of the same |
Jan. 10, 2006 |
| 6982007 |
Divided pressure vessel apparatus for carbon dioxide based systems and methods of using same |
Jan. 3, 2006 |
| 6979648 |
Method for BARC over-etch time adjust with real-time process feedback |
Dec. 27, 2005 |
| 6977226 |
Semiconductor memory device and method for fabricating the same |
Dec. 20, 2005 |
| 6977209 |
Method of manufacturing non-volatile semiconductor memory device and method for controlling same |
Dec. 20, 2005 |
| 6974709 |
Method and device for providing a semiconductor etching end point and for detecting the end point |
Dec. 13, 2005 |
| 6974989 |
Structure and method for protecting memory cells from UV radiation damage and UV radiation-induced charging during backend processing |
Dec. 13, 2005 |
| 6972258 |
Method for selectively controlling damascene CD bias |
Dec. 6, 2005 |
| 6970053 |
Atomic layer deposition (ALD) high permeability layered magnetic films to reduce noise in high speed interconnection |
Nov. 29, 2005 |
| 6969681 |
Method for fabricating a semiconductor component using contact printing |
Nov. 29, 2005 |
| 6967165 |
Method for fabricating multilayer interconnect and method for checking the same |
Nov. 22, 2005 |
| 6967151 |
Method of manufacturing a semiconductor device |
Nov. 22, 2005 |
| 6964923 |
Selective polishing with slurries containing polyelectrolytes |
Nov. 15, 2005 |
| 6960526 |
Method of fabricating sub-100 nanometer field emitter tips comprising group III-nitride semiconductors |
Nov. 1, 2005 |
| 6960536 |
Method for producing integrated microsystems |
Nov. 1, 2005 |
| 6955980 |
Reducing the migration of grain boundaries |
Oct. 18, 2005 |
| 6955925 |
Annealing |
Oct. 18, 2005 |
| 6951817 |
Method of forming an insulator between features of a semiconductor device |
Oct. 4, 2005 |
| 6951826 |
Silicon carbide deposition for use as a low dielectric constant anti-reflective coating |
Oct. 4, 2005 |
| 6949465 |
Preparation process for semiconductor device |
Sep. 27, 2005 |
| 6949472 |
Method for high kinetic energy plasma barrier deposition |
Sep. 27, 2005 |
| 6946397 |
Chemical mechanical polishing process with reduced defects in a copper process |
Sep. 20, 2005 |
| 6946390 |
Photolithographic production of trenches in a substrate |
Sep. 20, 2005 |
| 6946396 |
Maleic acid and ethylene urea containing formulation for removing residue from semiconductor substrate and method for cleaning wafer |
Sep. 20, 2005 |
| 6936539 |
Antireflective coating for use during the manufacture of a semiconductor device |
Aug. 30, 2005 |
| 6933233 |
Liquid material supply system and method for semiconductor manufacturing |
Aug. 23, 2005 |
| 6933988 |
Active matrix substrate and method for producing the same |
Aug. 23, 2005 |
| 6929713 |
In-situ photoresist removal by an attachable chamber with light source |
Aug. 16, 2005 |
| 6930050 |
Multi-chamber system having compact installation set-up for an etching facility for semiconductor device manufacturing |
Aug. 16, 2005 |
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