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Class Information
Number: 438/689
Name: Semiconductor device manufacturing: process > Chemical etching
Description: Processes having a step of removing material from a semiconductor substrate through the action of a chemical agent, wherein the intent is to use the electrical properties of the semiconductor for at least one of the purposes outlined in section I, C, of the class definition for this class (438).
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 5925212 |
Apparatus and method for attaining repeatable temperature versus time profiles for plasma heated interactive parts used in mass production plasma processing |
Jul. 20, 1999 |
| 5906948 |
Method for etching high aspect-ratio multilevel contacts |
May. 25, 1999 |
| 5904566 |
Reactive ion etch method for forming vias through nitrogenated silicon oxide layers |
May. 18, 1999 |
| 5904567 |
Layer member forming method |
May. 18, 1999 |
| 5895530 |
Method and apparatus for directing fluid through a semiconductor processing chamber |
Apr. 20, 1999 |
| 5869398 |
Etching of indium phosphide materials for microelectronics fabrication |
Feb. 9, 1999 |
| 5858863 |
Fabrication system and method having inter-apparatus transporter |
Jan. 12, 1999 |
| 5843250 |
Method of forming an image pattern on a die plate |
Dec. 1, 1998 |
| 5837610 |
Chemical mechanical polishing (CMP) apparatus and CMP method using the same |
Nov. 17, 1998 |
| 5789322 |
Low volume gas distribution assembly for a chemical downstream etch tool |
Aug. 4, 1998 |
| 5780313 |
Method of fabricating semiconductor device |
Jul. 14, 1998 |
| 5776826 |
Crack stop formation for high-productivity processes |
Jul. 7, 1998 |
| 5733468 |
Pattern plating method for fabricating printed circuit boards |
Mar. 31, 1998 |
| 5730798 |
Masking methods during semiconductor device fabrication |
Mar. 24, 1998 |
| 5723384 |
Method for manufacturing a capacitor in a semiconductor device using selective tungsten nitride thin film |
Mar. 3, 1998 |
| 5714039 |
Method for making sub-lithographic images by etching the intersection of two spacers |
Feb. 3, 1998 |
| 5702567 |
Plurality of photolithographic alignment marks with shape, size and spacing based on circuit pattern features |
Dec. 30, 1997 |
| 5647999 |
Method for fine patterning of a polymeric film |
Jul. 15, 1997 |
| 5601686 |
Wafer transport method |
Feb. 11, 1997 |
| 5259926 |
Method of manufacturing a thin-film pattern on a substrate |
Nov. 9, 1993 |
| 4875971 |
Fabrication of customized integrated circuits |
Oct. 24, 1989 |
| 4845053 |
Flame ashing process for stripping photoresist |
Jul. 4, 1989 |
| 4544446 |
VLSI chemical reactor |
Oct. 1, 1985 |
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