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Class Information
Number: 438/689
Name: Semiconductor device manufacturing: process > Chemical etching
Description: Processes having a step of removing material from a semiconductor substrate through the action of a chemical agent, wherein the intent is to use the electrical properties of the semiconductor for at least one of the purposes outlined in section I, C, of the class definition for this class (438).
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6127194 |
Package removal for FBGA devices |
Oct. 3, 2000 |
| 6121412 |
Preparation of fractionated novolak resins by a novel extraction technique |
Sep. 19, 2000 |
| 6117774 |
Method for manufacturing shadow mask and etching-resistant layer-coating apparatus |
Sep. 12, 2000 |
| 6117694 |
Flexible lead structures and methods of making same |
Sep. 12, 2000 |
| 6114221 |
Method and apparatus for interconnecting multiple circuit chips |
Sep. 5, 2000 |
| 6114226 |
Method of manufacturing electrostatic discharge protective circuit |
Sep. 5, 2000 |
| 6107110 |
Method and apparatus for aiming a spray etcher nozzle |
Aug. 22, 2000 |
| 6100183 |
Method for fabricating a via |
Aug. 8, 2000 |
| 6099598 |
Fabrication system and fabrication method |
Aug. 8, 2000 |
| 6096635 |
Method for creating via hole in chip |
Aug. 1, 2000 |
| 6096650 |
Treatment of a surface having exposed silica |
Aug. 1, 2000 |
| 6090711 |
Methods for controlling semiconductor workpiece surface exposure to processing liquids |
Jul. 18, 2000 |
| 6091130 |
Semiconductor device having structure suitable for CMP process |
Jul. 18, 2000 |
| 6074947 |
Process for improving uniform thickness of semiconductor substrates using plasma assisted chemical etching |
Jun. 13, 2000 |
| 6074948 |
Method for manufacturing thin semiconductor device |
Jun. 13, 2000 |
| 6074946 |
Integrated processing for an etch module using a hard mask technique |
Jun. 13, 2000 |
| 6071815 |
Method of patterning sidewalls of a trench in integrated circuit manufacturing |
Jun. 6, 2000 |
| 6066578 |
Method and system for providing inorganic vapor surface treatment for photoresist adhesion promotion |
May. 23, 2000 |
| 6066561 |
Apparatus and method for electrical determination of delamination at one or more interfaces within a semiconductor wafer |
May. 23, 2000 |
| 6063684 |
Method for eliminating residual oxygen contaminations from crucible-drawn silicon wafers |
May. 16, 2000 |
| 6063440 |
Method for aligning a wafer |
May. 16, 2000 |
| 6063299 |
Manufacture of a silicon waveguide structure |
May. 16, 2000 |
| 6060376 |
Integrated etch process for polysilicon/metal gate |
May. 9, 2000 |
| 6057243 |
Method for producing semiconductor device |
May. 2, 2000 |
| 6057241 |
Method of manufacturing a semiconductor integrated circuit device |
May. 2, 2000 |
| 6057240 |
Aqueous surfactant solution method for stripping metal plasma etch deposited oxidized metal impregnated polymer residue layers from patterned metal layers |
May. 2, 2000 |
| 6057239 |
Dual damascene process using sacrificial spin-on materials |
May. 2, 2000 |
| 6057230 |
Dry etching procedure and recipe for patterning of thin film copper layers |
May. 2, 2000 |
| 6049137 |
Readable alignment mark structure formed using enhanced chemical mechanical polishing |
Apr. 11, 2000 |
| 6046109 |
Creation of local semi-insulating regions on semiconductor substrates |
Apr. 4, 2000 |
| 6043154 |
Method for manufacturing charge storage electrode |
Mar. 28, 2000 |
| 6037270 |
Method of manufacturing semiconductor device and methods of processing, analyzing and manufacturing its substrate |
Mar. 14, 2000 |
| 6030667 |
Apparatus and method for applying RF power apparatus and method for generating plasma and apparatus and method for processing with plasma |
Feb. 29, 2000 |
| 6023319 |
Method for manufacturing a display device utilizing an etching end point detection part |
Feb. 8, 2000 |
| 6017820 |
Integrated vacuum and plating cluster system |
Jan. 25, 2000 |
| 6004396 |
Spherical shaped semiconductor integrated circuit |
Dec. 21, 1999 |
| 5994223 |
Method of manufacturing analog semiconductor device |
Nov. 30, 1999 |
| 5994222 |
Method of making chip mountings and assemblies |
Nov. 30, 1999 |
| 5994198 |
Fabrication method for fully landing subminimum features on minimum width lines |
Nov. 30, 1999 |
| 5990009 |
Maximization of low dielectric constant material between interconnect traces of a semiconductor circuit |
Nov. 23, 1999 |
| 5980766 |
Process optimization in gas phase dry etching |
Nov. 9, 1999 |
| 5976977 |
Process for DRAM capacitor formation |
Nov. 2, 1999 |
| 5968842 |
Techniques for reduced dishing in chemical mechanical polishing |
Oct. 19, 1999 |
| 5970376 |
Post via etch plasma treatment method for forming with attenuated lateral etching a residue free via through a silsesquioxane spin-on-glass (SOG) dielectric layer |
Oct. 19, 1999 |
| 5958793 |
Patterning silicon carbide films |
Sep. 28, 1999 |
| 5948204 |
Wafer carrier ring method and apparatus for chemical-mechanical planarization |
Sep. 7, 1999 |
| 5944970 |
Solid state electrochemical sensors |
Aug. 31, 1999 |
| 5939334 |
System and method of selectively cleaning copper substrate surfaces, in-situ, to remove copper oxides |
Aug. 17, 1999 |
| 5932484 |
Thin film semiconductor device for active matrix panel |
Aug. 3, 1999 |
| 5928961 |
Dishing inhibited shallow trench isolation |
Jul. 27, 1999 |
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