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Class Information
Number: 438/689
Name: Semiconductor device manufacturing: process > Chemical etching
Description: Processes having a step of removing material from a semiconductor substrate through the action of a chemical agent, wherein the intent is to use the electrical properties of the semiconductor for at least one of the purposes outlined in section I, C, of the class definition for this class (438).
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 6287477 |
Solvents for processing silsesquioxane and siloxane resins |
Sep. 11, 2001 |
| 6288648 |
Apparatus and method for determining a need to change a polishing pad conditioning wheel |
Sep. 11, 2001 |
| 6284721 |
Cleaning and etching compositions |
Sep. 4, 2001 |
| 6284660 |
Method for improving CMP processing |
Sep. 4, 2001 |
| 6281589 |
System of selectively cleaning copper substrate surfaces, in-situ, to remove copper oxides |
Aug. 28, 2001 |
| 6281120 |
Temperature control structure for integrated circuit |
Aug. 28, 2001 |
| 6277749 |
Method of manufacturing a semiconductor integrated circuit device |
Aug. 21, 2001 |
| 6277747 |
Method for removal of etch residue immediately after etching a SOG layer |
Aug. 21, 2001 |
| 6277748 |
Method for manufacturing a planar reflective light valve backplane |
Aug. 21, 2001 |
| 6277716 |
Method of reduce gate oxide damage by using a multi-step etch process with a predictable premature endpoint system |
Aug. 21, 2001 |
| 6277750 |
Composition for bottom reflection preventive film and novel polymeric dye for use in the same |
Aug. 21, 2001 |
| 6268291 |
Method for forming electromigration-resistant structures by doping |
Jul. 31, 2001 |
| 6265309 |
Cleaning agent for use in producing semiconductor devices and process for producing semiconductor devices using the same |
Jul. 24, 2001 |
| 6261956 |
Modified product mask for bridging detection |
Jul. 17, 2001 |
| 6258720 |
Method of formation of conductive lines on integrated circuits |
Jul. 10, 2001 |
| 6258734 |
Method for patterning semiconductor devices on a silicon substrate using oxynitride film |
Jul. 10, 2001 |
| 6251782 |
Specimen preparation by focused ion beam technique |
Jun. 26, 2001 |
| 6251191 |
Processing apparatus and processing system |
Jun. 26, 2001 |
| 6248666 |
Process of manufacturing a semiconductor device including a buried channel field effect transistor |
Jun. 19, 2001 |
| 6245678 |
Method for manufacturing semiconductor wafers |
Jun. 12, 2001 |
| 6245581 |
Method and apparatus for control of critical dimension using feedback etch control |
Jun. 12, 2001 |
| 6242356 |
Etchback method for forming microelectronic layer with enhanced surface smoothness |
Jun. 5, 2001 |
| 6239039 |
Semiconductor wafers processing method and semiconductor wafers produced by the same |
May. 29, 2001 |
| 6235636 |
Resist removal by polishing |
May. 22, 2001 |
| 6228439 |
Thin film deposition apparatus |
May. 8, 2001 |
| 6228661 |
Method to determine the dark-to-clear exposure dose for the swing curve |
May. 8, 2001 |
| 6227955 |
Carrier heads, planarizing machines and methods for mechanical or chemical-mechanical planarization of microelectronic-device substrate assemblies |
May. 8, 2001 |
| 6225228 |
Silicon oxide co-deposition/etching process |
May. 1, 2001 |
| 6221772 |
Method of cleaning the polymer from within holes on a semiconductor wafer |
Apr. 24, 2001 |
| 6218196 |
Etching apparatus, etching method, manufacturing method of a semiconductor device, and semiconductor device |
Apr. 17, 2001 |
| 6211089 |
Method for fabricating GaN substrate |
Apr. 3, 2001 |
| 6211055 |
Wet-dry-wet process in wet station |
Apr. 3, 2001 |
| 6207565 |
Integrated process for ashing resist and treating silicon after masked spacer etch |
Mar. 27, 2001 |
| 6204169 |
Processing for polishing dissimilar conductive layers in a semiconductor device |
Mar. 20, 2001 |
| 6204180 |
Apparatus and process for manufacturing semiconductor devices, products and precursor structures utilizing sorbent-based fluid storage and dispensing system for reagent delivery |
Mar. 20, 2001 |
| 6194365 |
Composition for cleaning and etching electronic display and substrate |
Feb. 27, 2001 |
| 6194128 |
Method of dual damascene etching |
Feb. 27, 2001 |
| 6191036 |
Use of photoresist focus exposure matrix array as via etch monitor |
Feb. 20, 2001 |
| 6188461 |
Method for manufacturing a liquid crystal display utilizing an etching end point detection part in a non-display area of the substrate |
Feb. 13, 2001 |
| 6180527 |
Method and apparatus for thinning article, and article |
Jan. 30, 2001 |
| 6156629 |
Method for patterning a polysilicon gate in deep submicron technology |
Dec. 5, 2000 |
| 6153533 |
Method of using a compliant process cassette |
Nov. 28, 2000 |
| 6149828 |
Supercritical etching compositions and method of using same |
Nov. 21, 2000 |
| 6143661 |
Method of processing semiconductor device with laser |
Nov. 7, 2000 |
| 6143660 |
Method of producing a contact between a metallizing layer and a semiconductor material |
Nov. 7, 2000 |
| 6136700 |
Method for enhancing the performance of a contact |
Oct. 24, 2000 |
| 6132522 |
Wet processing methods for the manufacture of electronic components using sequential chemical processing |
Oct. 17, 2000 |
| 6133157 |
Dry etching method of a silicon thin film |
Oct. 17, 2000 |
| 6127238 |
Plasma enhanced chemical vapor deposited (PECVD) silicon nitride barrier layer for high density plasma chemical vapor deposited (HDP-CVD) dielectric layer |
Oct. 3, 2000 |
| 6127194 |
Package removal for FBGA devices |
Oct. 3, 2000 |
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