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Class Information
Number: 438/689
Name: Semiconductor device manufacturing: process > Chemical etching
Description: Processes having a step of removing material from a semiconductor substrate through the action of a chemical agent, wherein the intent is to use the electrical properties of the semiconductor for at least one of the purposes outlined in section I, C, of the class definition for this class (438).


Sub-classes under this class:

Class Number Class Name Patents
438/705 Altering etchability of substrate region by compositional or crystalline modification 366
438/694 Combined with coating step 967
438/690 Combined with the removal of material by nonchemical means (e.g., ablating, abrading, etc.) 526
438/704 Having liquid and vapor etching steps 452
438/745 Liquid phase etching 1,268
438/706 Vapor phase etching (i.e., dry etching) 1,483


Patents under this class:
1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16

Patent Number Title Of Patent Date Issued
7618898 Method and apparatus for forming contact hole Nov. 17, 2009
7615206 Methods of fabricating nanoscale-to-microscale structures Nov. 10, 2009
7616291 Lithographic processing cell and device manufacturing method Nov. 10, 2009
7611960 Method and system for wafer backside alignment Nov. 3, 2009
7608540 Composition for removing a photoresist, method of preparing the composition, method of removing a photoresist and method of manufacturing a semiconductor device using the composition Oct. 27, 2009
7608541 Method of forming fine pattern, liquid crystal display device having a fine pattern and fabricating method thereof Oct. 27, 2009
7608542 Large-size glass substrate for photomask and making method, computer-readable recording medium, and mother glass exposure method Oct. 27, 2009
7601643 Arrangement and method for fabricating a semiconductor wafer Oct. 13, 2009
7601641 Two step optical planarizing layer etch Oct. 13, 2009
7598173 Electro-optic displays, and components for use therein Oct. 6, 2009
7598174 Feature patterning methods Oct. 6, 2009
7598177 Methods of filling trenches using high-density plasma deposition (HDP) Oct. 6, 2009
7598178 Carbon precursors for use during silicon epitaxial film formation Oct. 6, 2009
7591806 High-aspect-ratio microdevices and methods for transdermal delivery and sampling of active substances Sep. 22, 2009
7592201 Adjustments of masks by re-flow Sep. 22, 2009
7592260 Method of manufacturing a semiconductor device Sep. 22, 2009
7585424 Pattern reversal process for self aligned imprint lithography and device Sep. 8, 2009
7582220 Etching method Sep. 1, 2009
7582532 Method for fabricating semiconductor device Sep. 1, 2009
7582564 Process and composition for conductive material removal by electrochemical mechanical polishing Sep. 1, 2009
7579278 Topography directed patterning Aug. 25, 2009
7579309 Methods for characterizing defects on silicon surfaces and etching composition and treatment process therefor Aug. 25, 2009
7572732 Method to modulate etch rate in SLAM Aug. 11, 2009
7569484 Plasma and electron beam etching device and method Aug. 4, 2009
7566665 Semiconductor device manufacturing method and manufacturing line thereof Jul. 28, 2009
7563382 Mask and method of fabricating the same, and method of machining material Jul. 21, 2009
7553775 Method for coating semiconductor surface, process for production of semiconductor particles using said method, and optical element using said semiconductor particles Jun. 30, 2009
7553767 Method for fabricating semiconductor device having taper type trench Jun. 30, 2009
7553679 Method of determining plasma ion density, wafer voltage, etch rate and wafer current from applied bias voltage and current Jun. 30, 2009
7544307 Metal polishing liquid and polishing method using it Jun. 9, 2009
7544620 Process for digging a deep trench in a semiconductor body and semiconductor body so obtained Jun. 9, 2009
7544625 Silicon oxide thin-films with embedded nanocrystalline silicon Jun. 9, 2009
7541286 Method for manufacturing semiconductor device using KrF light source Jun. 2, 2009
7541285 Substrate processing apparatus and substrate processing method Jun. 2, 2009
7541228 Semiconductor device, method of manufacturing the same, and method of designing the same Jun. 2, 2009
7537657 Silicon wafer and process for producing it May. 26, 2009
7537990 Method of manufacturing semiconductor devices May. 26, 2009
7531102 Simultaneous selective polymer deposition and etch pitch doubling for sub 50nm line/space patterning May. 12, 2009
7531470 Method and apparatus for electronic device manufacture using shadow masks May. 12, 2009
7527704 Method for preparing film structure comprising ferroelectric single crystal layer May. 5, 2009
7528076 Method for manufacturing gate oxide layer with different thicknesses May. 5, 2009
7526357 Pulse modulation laser writing system Apr. 28, 2009
7521362 Methods for the optimization of ion energy control in a plasma processing system Apr. 21, 2009
7517805 Method of in-situ ash strip to eliminate memory effect and reduce wafer damage Apr. 14, 2009
7514369 Method of producing porous silicon particles by stain-etching and silicon nanoparticles from stain-etched silicon powder Apr. 7, 2009
7510974 CMP process Mar. 31, 2009
7504326 Use of scanning theme implanters and annealers for selective implantation and annealing Mar. 17, 2009
7501069 Flexible structures for sensors and electronics Mar. 10, 2009
7501346 Gallium and chromium ions for oxide rate enhancement Mar. 10, 2009
7498209 Etching tape and method of fabricating array substrate for liquid crystal display using the same Mar. 3, 2009

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