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Class Information
Number: 438/689
Name: Semiconductor device manufacturing: process > Chemical etching
Description: Processes having a step of removing material from a semiconductor substrate through the action of a chemical agent, wherein the intent is to use the electrical properties of the semiconductor for at least one of the purposes outlined in section I, C, of the class definition for this class (438).
Sub-classes under this class:
Patents under this class:
| Patent Number |
Title Of Patent |
Date Issued |
| 7371684 |
Process for preparing electronics structures using a sacrificial multilayer hardmask scheme |
May. 13, 2008 |
| 7368396 |
Dry etching methods |
May. 6, 2008 |
| 7368392 |
Method of fabricating a gate structure of a field effect transistor having a metal-containing gate electrode |
May. 6, 2008 |
| 7368385 |
Method for producing a structure on the surface of a substrate |
May. 6, 2008 |
| 7368384 |
Film formation apparatus and method of using the same |
May. 6, 2008 |
| 7368066 |
Gold CMP composition and method |
May. 6, 2008 |
| 7365012 |
Etching method, a method of forming a trench isolation structure, a semiconductor substrate and a semiconductor apparatus |
Apr. 29, 2008 |
| 7362488 |
Tiltable-body apparatus, and method of fabricating the same |
Apr. 22, 2008 |
| 7361598 |
Method for fabricating semiconductor device capable of preventing scratch |
Apr. 22, 2008 |
| 7361599 |
Integrated circuit and method |
Apr. 22, 2008 |
| 7361600 |
Semiconductor manufacturing apparatus having a built-in inspection apparatus and a device manufacturing method using said manufacturing apparatus |
Apr. 22, 2008 |
| 7358184 |
Method of forming a conductive via plug |
Apr. 15, 2008 |
| 7357876 |
Eliminating printability of sub-resolution defects in imprint lithography |
Apr. 15, 2008 |
| 7354860 |
Manufacturing method of mask blank and manufacturing method of transfer mask |
Apr. 8, 2008 |
| 7351643 |
Method of manufacturing a semiconductor device |
Apr. 1, 2008 |
| 7351660 |
Process for producing high performance interconnects |
Apr. 1, 2008 |
| 7351661 |
Semiconductor device having trench isolation layer and a method of forming the same |
Apr. 1, 2008 |
| 7351667 |
Etching solution for silicon oxide method of manufacturing a semiconductor device using the same |
Apr. 1, 2008 |
| 7346981 |
Method for fabricating microelectromechanical system (MEMS) devices |
Mar. 25, 2008 |
| 7348275 |
Processing method for semiconductor wafer |
Mar. 25, 2008 |
| 7344989 |
CMP wafer contamination reduced by insitu clean |
Mar. 18, 2008 |
| 7344987 |
Method for CMP with variable down-force adjustment |
Mar. 18, 2008 |
| 7344965 |
Method of etching dual pre-doped polysilicon gate stacks using carbon-containing gaseous additions |
Mar. 18, 2008 |
| 7341949 |
Process for forming lead-free bump on electronic component |
Mar. 11, 2008 |
| 7341951 |
Methods of forming semiconductor constructions |
Mar. 11, 2008 |
| 7335586 |
Sealing porous dielectric material using plasma-induced surface polymerization |
Feb. 26, 2008 |
| 7335593 |
Method of fabricating semiconductor device |
Feb. 26, 2008 |
| 7335597 |
Semiconductor device and method of manufacturing the same |
Feb. 26, 2008 |
| 7332436 |
Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition |
Feb. 19, 2008 |
| 7332443 |
Method for fabricating a semiconductor device |
Feb. 19, 2008 |
| 7329608 |
Method of processing a substrate |
Feb. 12, 2008 |
| 7329365 |
Etchant composition for indium oxide layer and etching method using the same |
Feb. 12, 2008 |
| 7326635 |
Method and apparatus for stripping photo-resist |
Feb. 5, 2008 |
| 7323111 |
Angle control of multi-cavity molded components for MEMS and NEMS group assembly |
Jan. 29, 2008 |
| 7323114 |
Method of making optical elements for an optical disc system |
Jan. 29, 2008 |
| 7323115 |
Substrate processing method and ink jet recording head substrate manufacturing method |
Jan. 29, 2008 |
| 7323414 |
Method for polishing a substrate surface |
Jan. 29, 2008 |
| 7323416 |
Method and composition for polishing a substrate |
Jan. 29, 2008 |
| 7323413 |
Method for stripping silicon nitride |
Jan. 29, 2008 |
| 7316975 |
Method of forming sidewall spacers |
Jan. 8, 2008 |
| 7314803 |
Method for producing a semiconductor structure |
Jan. 1, 2008 |
| 7313863 |
Method to form a cavity having inner walls of varying slope |
Jan. 1, 2008 |
| 7312162 |
Low temperature plasma deposition process for carbon layer deposition |
Dec. 25, 2007 |
| 7312152 |
Lactate-containing corrosion inhibitor |
Dec. 25, 2007 |
| 7309652 |
Method for removing photoresist layer and method for forming metal line in semiconductor device using the same |
Dec. 18, 2007 |
| 7307019 |
Method for supercritical carbon dioxide processing of fluoro-carbon films |
Dec. 11, 2007 |
| 7307020 |
Membrane 3D IC fabrication |
Dec. 11, 2007 |
| 7300874 |
Chemical mechanical polishing compositions and methods relating thereto |
Nov. 27, 2007 |
| 7297287 |
Method and apparatus for endpoint detection using partial least squares |
Nov. 20, 2007 |
| 7297636 |
Methods for fabricating device features having small dimensions |
Nov. 20, 2007 |
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